Utah-94-721002-System-Manual.pdf - 第111页

System Manual lñÑçêÇ=fåëíêìãÉåíë=mä~ëã~=qÉ ÅÜåçäçÖó== mä~ëã~ä~Ä póëíÉãNMM RKUKS= iÉ~â=ÇÉíÉÅíáçå=é~ÖÉ= Fig 5.17: Leak detection page The leak detection page, accessed fro m the Chamber 1 process page by sele cting the Lea…

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Process gas pod

mimic

Displays a mimic of the gas lines installed in the gas pod.

Enter the required gas flow in sccm for each gas line. Click on the Gas

Name in an MFC mimic to edit the associated Gas Factors; the

following dialogue is displayed.

It is recommended to keep the Gas Factor as 1, and to put the full

scale of the MFC

for the gas used in the Mass Flow field.

For example, if Argon is used with a 100 sccm N

MFC. Put gas factor 1

and Mass Flow 141 sccm.

Operating Instructions

UC Davis 94-721001 Issue 1: March 06 Page 5-44 of 52 Printed: 22-Mar-06, 10:42

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Fig 5.17: Leak detection page

The leak detection page, accessed from the Chamber 1 process page by selecting the Leak

Detection button, allows you to perform automatic or manual leak detection runs.

The Leak Detection page for a process chamber can be used to check the rate-of-pressure rise

in a sealed chamber. The chamber is first pumped (either for a fixed time, or to a given

pressure). The chamber then seals and the pressure rise rate is calculated. A graph of the

chamber pressure against time is plotted. The test stops either when a test time elapses, or

when the pressure gauge reaches full scale. The chamber is returned to pumping at the end

of the test.

The rate-of-pressure rise will depend on:

a) The leak rate from atmosphere. Leaks are not improved by more pumping.

b) The outgassing rate from all surfaces.

c) The ‘virtual leak’ rate from parts of the system furthest from the vacuum pump,

especially gas feed pipes.

Outgassing and virtual leaks are reduced by more pumping. Outgassing is increased if the

temperature of the whole system is raised.

The facilities available on this page are:

Page function

title field

Displays the current function of the page, i.e. Leak Detection

Process chamber

message field

Displays context related messages about the process chamber.

Operating Instructions

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Transfer status/

Log Comment

message field

Displays context related messages about wafer transfer status. This

field is also used to enter comments about the current process run

which can be viewed on the log viewer page.

Wafer status

field

Displays context related messages about the currently selected wafer.

Log Comment

button

Allows comments about the current process to be entered in the

Transfer status/Log Comment message field. While entering a

comment, the button title changes to OK to allow the comment to be

accepted.

Return to

Process button

Select to return to the Chamber 1 or Chamber 2 process page.

Start button

Select to commence a leak detection test.

Stop button

Select to halt a leak detection test and return to pumping.

Recipe message

field

Displays information about the current recipe, step, loaded wafer

identity etc.

Step Time fields

Enter the required step time (in hours:minutes:seconds) for the

duration of the pressure-rise test. While a process is running, the

adjacent field displays the time remaining to the end of the step.

Log Interval

fields

Enter the sampling rate for the datalogging log file (in

hours:minutes:seconds).

If set to zero, no data log will be made.

Pump to

Pressure

checkbox

Select to cause the initial pumpdown to continue until a given

pressure is reached. The step will remain active until this condition is

met. (9Indicates selected). All setpoints are automatically set to zero,

except for base pressure. See the NOTE at the end of this sub-section.

Pressure fields

Enter the required Process Chamber target pressure. The measured

pressure is displayed in the adjacent field.

Pump to time

checkbox

Select to give the initial pumpdown a fixed duration. See the NOTE at

the end of this sub-section.

Pump Time

Duration of initial pumpdown (in hours:minutes:seconds).

Gas pod and

process chamber

mimic

Displays a mimic of the gas pod, process chamber and vacuum system.

The pressures read by the chamber Penning and CM gauges are also

displayed.

Mass Flow

Calibration

button

Select to calibrate the MFCs. Calibration is carried out by clicking on

each MFC mimic, then entering the Gas Name, Gas Factor and Mass

Flow.

NOTE:

If both ‘Pump to pressure’ and ‘Pump to time’ are selected, then

‘Pump to time’ takes precedence.

Operating Instructions

UC Davis 94-721001 Issue 1: March 06 Page 5-46 of 52 Printed: 22-Mar-06, 10:42