Utah-94-721002-System-Manual.pdf - 第171页

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Roughing pump A secondary pump, which reduces the chamber pressure from atmospheric to a
point at which the high vacuum (or main) pump takes over for a further
reduction of pressure. (See also rotary pump)
Roughing valve The valve which, when open, allows the roughing pump to pump gas from the
chamber.
Sample See Substrate
Shower head A form of top electrode having perforations through which the process gas is
introduced into the chamber.
Silane A process gas, SiH
4
, which is commonly used in deposition processes. It is
extremely toxic, pyrophoric, and, under certain conditions, explosive.
Slit valve A two-position gate valve used to seal the apertures between chambers.
SMC valve SMC is the manufacturer of commonly used solenoid operated pneumatic
valves. The valves are normally closed, and on receipt of an electrical signal, the
pneumatic valve opens. In some cases, the opposite action is used, for example
to vent a turbo pump if system power is lost.
Specimen See substrate.
Substrate / wafer /
specimen / sample
The item to be processed in the vacuum chamber.
TEOS Abbreviation for Tetra Ethoxy Silane. TEOS is a liquid at normal temperature
and pressure. In gaseous form it is used in PECVD processes. It is a replacement
for silane in silicon oxide deposition.
Throttling valve An adjustable valve.
Torr Unit of pressure; 1/760 of one atmosphere or bar.
Turbo pump Short for turbomolecular pump, this being a multistage axial flow fan rotating
at very high speed. Base pressure approximately 10
-9
Torr.
Wafer See Substrate.
Vent Introduce high purity nitrogen into a chamber or pump to raise it to
atmospheric pressure.
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NOTES:
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UK
Oxford Instruments Plasma Technolgy
North End, Yatton,
Bristol, BS49 4AP
Tel: +44(0)1934 837000
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