IPC-TM-650 EN 2022 试验方法.pdf - 第146页

1 Scope This test method provides a standard method for evaluating the effect of established processing operations used in the manufacture of PWBs on materials that are con- sidered for use in the manufacture of PWBs. Sp…

100%1 / 824
Where:
V
is the volume, in ml, of alkali used (tetrabutyl ammonium
hydroxide for Method A, potassium hydroxide for Method B).
M is the molarity of the alkali used.
m is the mass, in grams, of the sample taken.
S is the percentage nonvolatile matter, expressed as a frac-
tion, determined as described in IPC-TM-650, Test Method
2.3.34.
5.3.2
The
acid value of the flux under test is calculated as
the mean of the results obtained on each of the three test
samples.
6
Notes
6.1 Safety
Observe
all appropriate precautions on MSDS
for chemicals involved in this test method.
IPC-TM-650
Number
2.3.13
Subject
Determination
of Acid Value of Liquid Solder Flux -
Potentiometric and Visual Titration Methods
Date
06/04
Revision
A
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1
Scope
This
test method provides a standard method for
evaluating the effect of established processing operations
used in the manufacture of PWBs on materials that are con-
sidered for use in the manufacture of PWBs. Specific criteria
for the acceptability are based on copper foil adhesion and
visual surface condition of the base laminate.
2
Applicable Documents
IPC-TM-650 Test Methods Manual
2.4.8
Peel Strength of Metallic Clad Laminates
MIL-P-13949
3
Test Specimens
3.1
Copper-clad
epoxy glass laminate materials ranging
from 0.8 mm to 6.5 mm thick, clad on one or both sides.
3.2
Three
specimens shall be tested from each material,
except in the case where the material is clad on both sides,
and then six specimens shall be processed for each material.
Each specimen will have four readings for peel strength (see
IPC-TM-650, Method 2.4.8).
4
Equipment/Apparatus
4.1 Etching
Typical
production printing, etching, and plat-
ing equipment and materials
4.2
Tester
For
peel strength equipment (see IPC-TM-650,
Method 2.4.8)
5
Procedure
5.1 Print and Etch
5.1.1
Sand
the edges of the test specimens to remove
burrs, allowing close contact between the specimen, nega-
tive, and frame glass, resulting in a better defined etched pat-
tern.
5.1.2 Scrub
the copper surface(s) with FFF pumice and a
brush to remove any contamination on the surface of the
specimen until it passes a water break test.
5.1.3
Dry
the specimens using compressed filtered air.
5.1.4
Dip
the specimens in the following photoresist solution
at room temperature:
One part by volume KPR III
One part by volume toluene
One part by volume acetone
The specific gravity of the solution is 0.920.
5.1.5
Hold
the specimen by one corner when dipping. Allow
excess solution to drain until dripping stops.
5.1.6
Put
the specimens on rack (after draining) into 80°C
oven from three to five minutes to dry and harden KPR.
5.1.7
Remove
the rack from the oven and allow the speci-
mens to cool to room temperature.
5.1.8
Place
the specimens upon the negative in the printing
frame with the copper side against the negative.
5.1.9
Expose
the mounted specimen 76 mm from the fluo-
rescent black light for seven minutes.
5.1.10
Develop
in trichlorethylene vapor for 15 seconds. It
may require two to six cycles until the pattern is clear. Air-dry
the specimen after developing.
Note: Use the test pattern in Method 2.4.8.
5.2
Etching Process and Etchant Removal
5.2.1 Method A
5.2.1.1
Etch
the specimens with vigorous aeration for the
minimum time (the time to produce a clean pattern with a
minimum of undercutting is approximately seven minutes for
34 mm and 15 minutes for 69 mm copper, using fresh ferric
chloride solution) in 42° Baume (be) ferric chloride solution
maintained at 24°C to 38°C. The etching solution shall be
renewed when the etching time exceeds 15 minutes for 34
mm copper or 30 minutes for 69 mm copper.
5.2.1.2
After
removal of the copper, immediately wash the
specimens with running tap water at 16°C to 32°C for two to
five minutes. Thereafter, keep the specimens from drying until
reaching step 5.2.1.7.
The
Institute for Interconnecting and Packaging Electronic Circuits
2215 Sanders Road Northbrook, IL 60062-6135
IPC-TM-650
TEST
METHODS MANUAL
Number
2.3.14
Subject
Print,
Etch, and Plate Test
Date
4/73
Revision
Originating Task Group
N/A
Material
in this Test Methods Manual was voluntarily established by Technical Committees of the IPC. This material is advisory only
and its use or adaptation is entirely voluntary. IPC disclaims all liability of any kind as to the use, application, or adaptation of this
material. Users are also wholly responsible for protecting themselves against all claims or liabilities for patent infringement.
Equipment referenced is for the convenience of the user and does not imply endorsement by the IPC.
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5.2.1.3
Immerse
the specimens in a 10% solution of oxalic
acid in water at 16°C to 32°C for 15 to 20 minutes. Provide
gentle circulation of the oxalic acid solution during this period.
Flush the specimens with running tap water at 16°C to 32°C.
Caution: Oxalic acid is toxic.
5.2.1.4
Scrub
the specimens with Grade FFF pumice to
remove resist, or wipe off the resist with a lint-free cloth moist-
ened with a suitable solvent (i.e., methylethyl ketone, trichlor-
ethylene, or toluol). In cleaning the specimens, care must be
exercised to avoid abrading the adhesive layer with the pum-
ice or attacking the adhesive or laminate with the solvent.
Specimens not involving the use of resist need not be
scrubbed.
5.2.1.5
Scrub
the specimens with a plastic-bristled brush
under running tap water at 16°C to 32°C and rinse for 30
minutes.
5.2.1.6
Rinse
the specimen in distilled water.
5.2.1.7
Dry
the specimens for one hour in an oven at 80°C
± 3°C. If specimens are for electrical tests, handle only with
rubber or polyethylene gloves.
5.2.2
Method B
5.2.2.1
Remove
foil from the specimen using a solution
containing 298g±10perliter of ammonium persulfate and
15.5 mL ± 1.0 per liter of sulfuric acid, specific gravity 1.836
(66°Be). The temperature shall be 43°C ± 3°C.
5.2.2.2
Rinse
the specimens thoroughly in running water
and dry with a clean air blast.
5.2.2.3
Dry
the specimens in an oven at 80°C ± 3°C for one
hour and allow the specimens to cool.
5.3
Petrolatum Evaluation
5.3.1
Drill
1.5 mm holes in the pads of the 3 mm lines with
good fabricating practice.
5.3.2
Remove
the developed KPR by rubbing the pattern
lightly with cold trichlorethylene liquid. Rinse in water. Scrub
the specimens with FFF pumice and water with a strong
bristle brush.
5.3.3
Plate
per MIL-P-13949. Deoxidize by dipping in 10%
hydrochloric acid for two minutes and wash in running water
for five minutes. Dry 30 minutes, minimum, at 105°C to
110°C.
5.3.4 Coat
the etched copper surface with white petrola-
tum. Specimens shall be immersed horizontally in solder
6.5mm below the surface for 20 ± 1 seconds at 260°C +5°C/-
0°C) measured 25 mm below the surface.
5.3.5
Remove
the petrolatum from the surface of the speci-
men with a two minute scrub in cold trichlorethylene, followed
by a one minute rinse in hot trichlorethylene.
5.3.6
Inspect
the surface for weave exposure, measling,
crazing, resin loss, delamination and blistering.
5.3.7
Test
four 0.8 mm lines on the specimen for peel
strength and report the average value for the four lines. This
test shall be performed in accordance with Method 2.4.8.
5.4
Report
5.4.1
The
results of the testing by this test method shall be
reported in a written report, which contains the following as a
minimum:
1. Certification that the test was performed in accordance
with this test method
2. Identification of specimens tested
3. Test results for each of the specimens tested, including the
results of the visual inspections and peel tests
IPC-TM-650
Number
2.3.14
Subject
Print,
Etch, and Plate Test
Date
4/73
Revision
P
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