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SEMI 30.1-0200 © SEMI 1998, 2000 40 When equipment shall locate a particular s ite on a substrate bas ed on the expected or design-bas ed location, then the location of a site or feat ure on an actual substrate is furth …

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SEMI 30.1-0200 © SEMI 1998, 200039
RELATED INFORMATION 1
NOTE: This related information is not an official part of
SEMI E30.1 and was approved for publication by full letter
ballot procedures on September 3, 1999.
R1-1 Defect Classification Code Management
The purpose of this section is to provide a method and
specific formats to define, identify, and communicate
coordinate systems and site locations on substrates for
alignment sites, anomaly locations, and other sites used
by the ISEM equipment.
R1-1.1 Classification Codes and Defect Classification
— One function of review equipment is to view
previously identified anomalies and to associate a
defect classification code with each anomaly. A
classification code is an identifier for a classification
description.
Typically, the review equipment has a set of defect
classification codes and their descriptions available to
the operator. Then, for each anomaly, the operator
selects a particular code to be associated with that
anomaly. This action is defect classification.
The set of valid classification codes and their
descriptions may change from one run to another. For
example, the same main process program could be used
with different substrate levels, and each level may use a
different set of classification codes. The purpose of this
section is to provide the requirements so that a user can
both define several sets of classification codes and their
descriptions and can also manage these sets on ISEM
equipment.
R1-1.2 Requirements
• Each set of classification codes and their
descriptions shall have an identifier, known as a
classification code set ID.
• Review equipment shall provide a means for the
user (the host or the operator) to define a
classification code set, consisting of (a) the
classification code set ID and (b) the list of
classification codes and their descriptions.
• Equipment shall provide a means to manage the
various classification code sets.
• A main process program shall include a process
program variable that specifies the particular
classification code set ID to be used.
• Equipment vendor shall provide documentation to
the user regarding how to define and manage
classification code sets.
Comment: In one implementation, the equipment
considers a classification code set to be a sub-process
program or an ISEM table. This would allow the user to
identify a classification code set by name (using a
PPID) or a table name and thereby managing this sub-
process program with the SEMI E30 Process Program
Capability or with SEMI E58 ARAMS tables.
R1-2 Reporting Coordinates and Coordinate
Systems
The purpose of this section is to provide a method and
specific formats to define, identify, and communicate
coordinate systems and site locations on substrates for
alignment sites, anomaly locations, and other sites used
by ISEM equipment.
The ISEM-required formats are intended to minimize
the number and type of site location format
transformations needing to be supported by both
equipment suppliers and users.
All ISEM-required site location formats involve the use
of an ISEM-defined right-handed Cartesian coordinate
system, established on substrates in an ISEM-defined
manner. The scope of the detailed methods in this
section are specific to unpatterned and patterned wafers
in this release, but the section is intended to be general
enough in methodology so that it can be extended to
other substrate types in future revisions of ISEM, if
required.
The purpose of inspection and review equipment is to
locate, evaluate, classify, and report anomalies on
substrates. ISEM equipment may deal with either
unpatterned or patterned substrates or both. In most
cases, the anomaly location is part of the information
reported and/or used by ISEM equipment. An anomaly
location is reported at a particular site with x,y
coordinates in a particular coordinate system. Site
coordinates are also used by ISEM equipment for the
alignment sites for defining a coordinate system on a
substrate. A standard method is needed to define a
coordinate system and to report site coordinates for
both alignment sites, anomaly locations, and any other
reference sites needed by ISEM equipment. A standard
method is essential in order to transfer the anomaly site
information from one equipment to another.
R1-2.1 Site Location Accuracy — Each equipment has
an accuracy with which it can define or locate a site as
being within a certain area. This area associated with a
site is determined by the equipment accuracy, based on
the accuracy of its motion and imaging systems to
locate a site, as well as on the accuracy with which it
can define the coordinate system on the substrate.
SEMI 30.1-0200 © SEMI 1998, 2000 40
When equipment shall locate a particular site on a
substrate based on the expected or design-based
location, then the location of a site or feature on an
actual substrate is further affected by the accuracy of
the equipment which placed the pattern on the
substrate.
R1-2.2 Expected or Designed Locations vs. Actual
Locations — The placement of patterns, sites, and
coordinate systems is designed to be at certain
mathematically described locations relative to one
another and to an ideal substrate. These are the
expected or designed locations. When a pattern is
written by equipment onto a specific substrate, the
actual placement of the pattern, the pattern-elements,
and their features may differ from the expected
locations, due to variations in equipment performance
and variations in substrate shape and dimensions.
R1-2.3 Substrate Coordinate Systems (Unpatterned) —
A substrate coordinate system is a coordinate system
which has both origin and axes defined by the shape
and dimensions of the substrate and which does not
depend on whether there is a pattern on the substrate or
whether it is unpatterned. This coordinate system is
used to locate or define sites relative to the substrate.
R1-2.4 Substrate Pattern Coordinate System — A
substrate pattern coordinate system is a coordinate
system which has its origin and axes defined by the
pattern as a whole on the substrate. This coordinate
system is used to locate or to define sites relative to the
pattern on the substrate. The expected or designed
location of the pattern on the substrate can be defined in
terms of the placement of the origin and axes of the
substrate pattern coordinate system relative to those of
the substrate coordinate system. The actual location of a
pattern on a substrate may differ from the expected
location. The actual location is determined by locating
two or more alignment sites on the patterned substrate.
The alignment sites are specific points of certain
features in the pattern. The coordinates of the alignment
sites are given in the substrate pattern coordinate
system. In many cases, equipment does not align to the
specific pattern elements but instead uses the defined
locations of the pattern elements within the substrate
pattern coordinate system.
R1-2.5 Pattern Element Coordinate System — A
pattern-element coordinate system is a coordinate
system which has its origin and axes defined by the
pattern of one specific rectangular element in a pattern
(a defined arrangement) of equal-sized rectangular
elements. This coordinate system is used to locate or to
define sites relative to that specific pattern-element. The
expected or designed location of the pattern-element
within a pattern can be defined in terms of the
placement of the origin and axes of the pattern-element
coordinate system relative to those of the pattern
coordinate system. The actual location of a pattern-
element within a pattern on a substrate may differ from
the expected location. The actual location is determined
by locating two or more alignment sites within the
pattern-element. The coordinates of the alignment sites
are given in the pattern-element coordinate system.
R1-2.6 Parallel Coordinate Systems — A second
coordinate system is considered to be parallel to a first
coordinate system if the origin of the second can be
defined as a translation from the origin of the first and
if the axes of the second are parallel and in the same
direction as those of the first.
R1-2.7 Requirements — The following is a list of
requirements for ISEM equipment regarding coordinate
systems and reporting site locations:
• ISEM equipment shall document whether it deals
with coordinate systems based on (a) a substrate,
(b) a substrate pattern, or (c) a pattern-element or
whether it deals with several of these coordinate
systems.
• ISEM equipment shall establish a substrate
coordinate system using a standard, documented
method. This coordinate system is not based on any
pattern on the substrate. This coordinate system
shall be a right-hand Cartesian coordinate system
and shall be identified by a name.
NOTE: For wafers, this method is defined in SEMI M20
(Specification for Establishing a Wafer Coordinate
System), and the coordinate system is named “M20.”
• For equipment dealing with substrate pattern
coordinates, the substrate pattern coordinate system
shall be established in a standard, documented
method relative to the substrate coordinate system
(the “unpatterned” coordinate system). This
substrate pattern coordinate system shall be a right-
hand Cartesian coordinate system and shall be
designed to be parallel to the substrate coordinate
system. The substrate pattern coordinate system
shall be identified by a name. The location of its
origin and axes relative to the substrate coordinate
system shall be communicated in terms of the
substrate coordinate system.
NOTE: For wafers, this method is the one described
below, and the substrate pattern coordinate system is
named “M20P”, and its origin and axis relative to the
SEMI M20 coordinate system are given in terms of
“M20” coordinates and are communicated using
XlateData.
• For equipment dealing with pattern-element
coordinates, the pattern-element coordinate system
shall be established in a standard, documented
SEMI 30.1-0200 © SEMI 1998, 200041
method relative either to the substrate pattern
coordinate system or to another pattern-element
coordinate system. The pattern-element coordinate
system shall be a right-hand Cartesian coordinate
system which is designed to be parallel to the
substrate pattern coordinate system. The pattern-
element coordinate system shall be identified by a
name. The location of its origin and axis relative to
the substrate pattern coordinate system shall be
communicated in terms of the substrate pattern
coordinate system.
NOTE: For wafers, this method is based on SEMI M21,
and the coordinate system is named “M21” and its origin
and axis relative to the “M20P” coordinate system are
given in terms of the M20P coordinates.
• ISEM requires that equipment have the capability
to use site location information that is based on the
user’s product designs, which the user shall
provide in the appropriate ISEM-required format.
• ISEM-compliant equipment shall have the
capability to define, locate, and report site
information using only the ISEM-defined right-
handed Cartesian coordinate system formats. This
requirement does not preclude equipment from
having additional capability for defining or
reporting site location information using other
formats.
• Coordinate system name and placement relative to
the “higher” coordinate system shall be defined and
communicated using the following ISEM data
items, in terms of either expected or actual
placement: CoordSys, XlateData, and their
included data items.
• Alignment site information shall be defined and
communicated using the following ISEM items:
the variable item AlignList, the “ALIGNLIST”, the
Process program class of “TABLE-ALIGN-DEF”,
and their included information.
• Areas to be inspected shall be reported using the
specific coordinate system defined by the user. The
following ISEM items are used to define and
communicate area locations: the variable item
“AREALIST”, the “AREALIST”, and the Process
program class of “TABLE-AREA-DEF”, and their
included information.
• The displacement of an actual coordinate system
relative to its expected location shall be
communicated using the ISEM data item:
XlateData and its included data items.
• The displacement of an actual site location relative
to its expected site location shall be communicated
using the ISEM data item: Offset and its included
data items.
• The equipment vendor shall document the
requirements for the ISEM data items used in
alignment of a coordinate system.
• The equipment vendor shall provide and document
a means for the user to define and communicate a
pattern map using SEMI M21 data. A pattern map
defines the layout of equal-sized rectangular
pattern-elements which make up a pattern. Each
pattern-element shall have a name, using the SEMI
M21 naming convention.
NOTE: For patterned wafers, the naming method shall
be that described in SEMI M21, and the pattern-element
information shall be communicated using the ISEM data
item of SEMI M21Data.
• For ISEM compliance, inspection equipment shall
report various anomaly data; AnomalyID,
coordinates, and attributes. Review equipment shall
receive this data for anomalies and be able to locate
them and perhaps modify the coordinates.
Anomaly coordinates shall be reported using ISEM
table named “TABLE-ANOMALY-DEF” and its
included data.
R1-3 Coordinate System for a Substrate
R1-3.1 SEMI M20 Coordinate System — The SEMI
M20 standard (Specification for Establishing a Wafer
Coordinate System) describes how to map a right-
handed Cartesian coordinate system to a substrate so
that its origin is at the center of the substrate, and its
negative y-axis bisects the substrate’s primary fiducial.
This coordinate system is defined by ISEM to be the
“M20” coordinate system. The only information
required by equipment in order to establish an “M20”
coordinate system is the substrate size and the type of
fiducial, which are communicated using the ISEM data
items named SubstrateSize and Fiducial. Another
ISEM data item named Orientation identifies how the
substrate is loaded on the equipment. Note that the
SEMI M20 standard requires that the “M20” coordinate
system is fixed on the substrate and is not affected by
how the substrate is loaded on equipment. Also, as
stated in the SEMI M20 standard, an orientation of “0”
degrees designates a substrate loaded on equipment,
with the primary fiducial towards the operator or
“down.”
R1-3.2 M20P Coordinate System — ISEM defines the
M20P coordinate system to be one which is aligned to
the pattern on the substrate. The M20P coordinate
system is useful because in many cases, it is more
significant to the user to know the location of an
anomaly relative to the pattern on the substrate rather