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SEMI P4-92 © SEMI 1983, 1999 6 APPENDIX 1 NOTE: This appendi x was app roved a s an offi cial part of SEMI P4 by full letter ballot pro cedure. Hard Surface Photom ask Glass Properties  Quartz Proper ties Property Ultra…

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SEMI P4-92 © SEMI 1983, 1999 5
Table 5. Specification for Diameter, Flat Depth, and Thickness for Round Substrates (proposed)
Nominal
Diameter
Diameter
(A) Min.
Diameter
(A) Max.
Flat Depth
(B) Min.
Flat Depth
(B) Max.
Nominal
Thickness (C)
Thickness
Min.
Thickness
Max.
Units
7 1/4" 183.75 184.55 88.52 88.65 3.81 3.69 3.94 mm
7 1/4" 7.234 7.266 3.485 3.490 0.150 0.145 0.155 in.
177.8 mm
Flatness Limits
10 µm TIR
5 µm TIR
3 µm TIR
152.4 mm
177.8 mm
SEMI P4-92 © SEMI 1983, 1999 6
APPENDIX 1
NOTE: This appendix was approved as an official part
of SEMI P4 by full letter ballot procedure.
Hard Surface Photomask Glass Properties
Quartz Properties
Property
Ultra Low Thermal Expansion Ulte
Modulus of Elasticity
6.7-7.4 × 10
3
Kg/mm
2
Poisson' s Ratio 0.18-0.19
(1)
Specific Gravity 2.18-2.20 g/cm
3
Index of Refraction 1.46
NOTE: These properties are not absolute requirements. For
more specific information, contact your individual supplier.
NOTICE: These standards do not purport to address
safety issues, if any, associated with their use. It is the
responsibility of the user of these standards to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
SEMI makes no warranties or representations as to the
suitability of the standards set forth herein for any
particular application. The determination of the
suitability of the standard is solely the responsibility of
the user. Users are cautioned to refer to manufacturer' s
instructions, product labels, product data sheets, and
other relevant literature respecting any materials
mentioned herein. These standards are subject to
change without notice.
The user' s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI P5-0704 © SEMI 1986, 2004 1
SEMI P5-0704
SPECIFICATION FOR PELLICLES
This specification was technically approved by the Global Micropatterning Committee and is the direct
responsibility of the North American Microlithography Committee. Current edition approved by the North
American Regional Standards Committee on April 22, 2004. Initially available at www.semi.org June 2004;
to be published July 2004. Originally published in 1986; previously published in 1994.
NOTICE: This document was completely rewritten in
2004 to combine SEMI P5, SEMI P5.1, and SEMI
P5.2.
1 Preface
1.1 This specification covers requirements for pellicles
used on photomasks or reticles in photolithographic
exposure systems. This specification covers pellicles
for use in either broadband, polychromatic or
monochromatic exposure systems.
NOTICE: This standard does not purport to address
safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory or other limitations prior
to use.
2 Referenced Standards
None.
3 Terminology
3.1 Additional terms are listed for information only in
the glossary, SEMI Compilation of Terms.
3.2 Selected Definitions
3.2.1 pellicle — a thin, optically transparent film,
typically of a polymer, attached to and supported by a
frame, and attached to a photomask (or reticle). Its
purpose is to seal out contaminants and reduce printed
defects caused by contamination in the image plane of
an optical exposure system with a minimum decrease in
the quality of optical transmission.
3.2.2 film adhesive — adhesive between frame and
film.
3.2.3 frame adhesive — adhesive between frame and
photomask.
3.2.4 mechanical strength — the physical condition a
pellicle must meet to withstand a specified force from a
blow-off gun without suffering any damage to the film
due to stretching or breakage.
3.2.5 film defects — inconsistencies in the integrity and
planarity of the film, including particles, pinholes,
scratches, dirt, and a minute quantity of solid.
3.2.5.1 particle — materials that can be distinguished
from the film whether on the film surface or embedded
in the film.
3.2.5.2 dirt — fingerprint; mark left behind after
operator handling; stain from liquid.
3.2.5.3 pinhole — a small opening completely through
a polymer film.
3.2.5.4 scratch — long, narrow, shallow groove or cut
below the established plane of the surface.
3.2.6 adhesive stringer — Any detectable protrusion
from the edge of the adhesive.
3.2.7 light resistance – Minimum cumulative exposure
energy a pellicle can withstand without (or within
specified) change in performance.
4 Ordering Information
4.1 Purchase orders of pellicles furnished to this
specification shall include the following:
4.1.1 Shape, Size, and Standoff of Pellicle — The
information relating to the Shape, Size, and Standoff of
a pellicle may be combined into a single frame part
number, or must be provided separately. For any given
model of stepper or mask aligner the manufacturer will
specify a recommended shape, size and standoff. The
user for inter-operability reasons may specify
alternative values.
4.1.1.1 Shape — This is determined by agreement
between the user and the supplier.
4.1.1.2 Size — This is determined by agreement
between the user and the supplier. Any expression of
tolerance is as follows:
Outer edge tolerance: +0, -x
Inner edge tolerance: +x, -0
4.1.1.3 Standoff — This is determined by agreement
between the user and the supplier. Any expression of
tolerance is +0, -x.
4.1.2 Film Characteristics
4.1.2.1 Type — An anti-reflective (AR) coating may be
applied to either the inside or outside surfaces of the
polymer film. Which surfaces, if any, require the