semi合集-English.pdf - 第6318页
SEMI G62-95 © SEMI 1995, 2002 3 11.3.1 Plating brigh tness sh all be measu red at the center poin t of the die pad. NOT E 5: If leadf rames do not have a plate d die pad, the location of the brightness te st shall be agr…

SEMI G62-95 © SEMI 1995, 2002 2
5.11 discoloration — Any change in the color of the
metallization, as detected by the naked eye. This may
occur on as plated or after application of heat.
5.12 excessive plating — Plating exists outside the
specified area.
5.13 foreign material — An adherent particle other
than parent material of the component.
NOTE 3: Adherent denotes inability to be removed with an
air or nitrogen blow-off at 20 psi.
5.14 incomplete plating — Plating is missing from any
part of the designated area.
5.15 leadframe top surface — The active side of the
leadframe, the surface used for die attach and wire
bonding.
5.16 nodule (of plated particle) — A protrusion or
lump of plating material above the plated surface.
5.17 plating nonuniformity — The lack of consistency
of brightness of silver as plated, or after the application
of heat. These changes in the plated grain structure
causes the inconsistency.
5.18 peeling — The lifting of metallization from a
surface.
5.19 pit (of plating) — A hole or depression extending
below the surface of the plating.
5.20 scratch (on plating) — A surface deformation
which exposes underlying metallization.
5.21 spot-sparing — A stain-like discoloration
occurring after the application of heat.
5.22 step plating — Plateau-like plating having more
than one level.
5.23 spot plating misalignment — The variation
between the defined and actual center lines of the plated
area.
5.24 tape test — A metallization layer adhesion test
technique using adhesive tape to apply a peel force to
the layer. This test may be applied on plated material or
after the application of heat.
5.25 whisker — A plating metal burr-like filament
attached to the surface of the plating.
6 Summary of Method
6.1 Various test methods are described or referenced to
determine silver plating quality for the following items:
• Plating Area
• Plating Thickness
• Plating Brightness
• Visual Inspection
• Functional Test
7 Interferences
7.1 Avoid contaminating the silver plated surface prior
to performing the test. Such contamination may affect
visual appearance and die attach, wire bonding, and
solderability functional tests.
8 Equipment
8.1 GAM densitometer or equivalent
8.2 X-Ray Fluorescence
8.3 Microscope with a 40× maximum magnification.
8.4 Heater block, hot plate or oven (furnace)
9 Sampling
9.1 Sampling plans shall be agreed between user and
supplier.
10 Test Sequence
10.1 When the test methods are used at incoming
inspection, the sequence of tests shall be as follows:
10.1.1 Plating Area — See Section 11.1.
10.1.2 Plating Thickness — See Section 11.2.
10.1.3 Plating Brightness — See Section 11.3.
10.1.4 Visual Inspection — See Section 11.4.
10.1.5 Heat Test — See Section 11.5.
10.1.6 Functional Test — See Section 11.6.
11 Test Procedures
11.1 Plating Area
11.1.1 Measurements may be made by using a glass
scale, shadow scope, or microscope.
11.1.2 Measurement items are listed below:
11.1.2.1 Area variation
11.1.2.2 Spot plating misalignment
11.2 Plating Thickness
11.2.1 Plating thickness shall be measured at a point on
the inner lead or the center point of the die pad.
NOTE 4: The location of the thickness test shall be agreed
between user and supplier.
11.2.2 Thickness measurements may be made using X-
Ray Fluorescence per SEMI G56.
11.3 Plating Brightness

SEMI G62-95 © SEMI 1995, 2002 3
11.3.1 Plating brightness shall be measured at the
center point of the die pad.
NOTE 5: If leadframes do not have a plated die pad, the
location of the brightness test shall be agreed between user
and supplier.
Plating brightness shall be measured using a GAM
densitometer or equivalent per SEMI G55.
11.4 Visual Inspection
11.4.1 Visual inspection may be performed with the
naked eye or a microscope with up to 40× maximum
magnification, as required to confirm results.
11.4.2 Visual inspection shall be performed before and
after functional testing.
11.4.3 Inspection items are listed below.
1. attached silver particles
2. blister
3. bleed-out
4. burnt deposit
5. contamination
6. corrosion
7. discoloration
8. excessive plating
9. foreign material
10. incomplete plating
11. nodule
12. plating nonuniformity
13. peeling
14. pit
15. scratch
16. spot-sparing
17. step plating
18. whisker
11.5 Heat Test
11.5.1 Conditions — The conditions in Table 2 shall be
used to heat test silver plated leadframes.
Table 2 Heat Test Condition
Leadframe Material Bake Temperature Bake Time (min.)
Iron-Nickel Alloy
per MIL-STD-
38510, Type B
400° C ± 5° C 3 min. + 10 (-0) sec.
Cu Alloy 300° C ± 5° C 3 min. + 10 (-0) sec.
Taped Leadframe 275° C ± 5° C 3 min. + 10 (-0) sec.
11.5.2 The test may be carried out on a heater block or
hot plate, or in an oven (furnace). The heat capacity of
the test equipment must be sufficient to avoid
temperature swings outside the specified limits when
the test is started.
NOTE 6: When using a heater block or hot plate, ensure that
air flow does not affect the bake temperature.
11.6 Functional Test
11.6.1 Epoxy Die Bonding — Processes and test
procedures shall be agreed upon between user and
supplier.
11.6.2 Gold Wire Bonding — Processes and test
procedures shall be agreed upon between user and
supplier.
11.6.3 Solderability — Processes and test procedures
shall be agreed upon between user and supplier.
12 Related Documents
12.1 SEMI Specifications
SEMI G8 — Test Method for Gold Plating Quality
SEMI G21 — Specification Plating Integrated Circuit
Leadframes
12.2 JIS Specifications
2
JIS H8501 — Methods of Thickness Test for Metallic
Coatings
JIS H8621 — Electroplated Coatings of Silver for
Engineering Purpose
JIS Z8722 — Methods of Measurement for Color of
Reflecting or Transmitting Objects
JIS Z8741 — Method of Measurement for Specular
Glossiness
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
2 Japanese Industrial Standards, Available through the Japanese
Standards Association, 1-24, Akasaka 4-Chome, Minato-ku, Tokyo
107-8440, Japan. Telephone: 81.3.3583.8005; Fax: 81.3.3586.2014
Website: www.jsa.or.jp

SEMI G62-95 © SEMI 1995, 2002 4
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer’s instructions, product labels,
product data sheets, and other relevant literature
respecting any materials mentioned herein. These
standards are subject to change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express writte
n
consent of SEMI.