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SEMI P6-88 © SEMI 198 8, 1996 1 SEMI P6-88 SPECIFICA TION FOR REGISTRATION MARKS FOR PHOTO M A SKS 1 Genera l Specific ation 1.1 Scope 1.1.1 This s p ecification defines the s h a p e, range of sizes, and gen eral place …

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SEMI P5-0704 © SEMI 1986, 2004 3
frame wall, and its edges must be free of visually
detectable stringers (and particles). Adhesive should
form a complete seal between the frame and the mask
over a minimum of 60% of the width of the frame.
5.3 Frame — Pellicle frame must have no visually
detectable machining burrs, discontinuities in
anodization, or particles.
5.4 Light Resistance
5.4.1 For Broadband Exposure Systems this is
expressed by total exposure energy value (mj/cm
2
or
j/cm
2
) on pellicle film until dropping 1% of optical
transmission of one of the peak wavelengths between
360 nm–440 nm. The test conditions (special
characteristics of exposure wavelength, exposure
energy between 360 nm–440 nm, exposure conditions,
and others) must be stated. Under these conditions, the
pellicle shall release no material, which could
contaminate the photomask or the pellicle itself.
5.4.2 For Monochromatic Exposure Systems this is
expressed by total exposure energy value (mj/cm
2
or
j/cm
2
) of specified wavelength on pellicle’s film until
dropping 0.5% of optical transmission at specified
wavelength. Also, the test conditions (half bandwidth of
exposure specified wavelength, energy of exposure
specified wavelength, exposure conditions, and others)
must be stated. Under these conditions, the pellicle shall
release no material, which could contaminate the
photomask or the pellicle itself.
5.5 Other Characteristics — Other characteristics of
pellicles are to be determined between the supplier and
the user. The transmission of light for mask alignment
is such a characteristic.
6 Measurement Methods
6.1 Measurement methods are to be determined
between the user and supplier. General and example
methods are as follows:
Optical Transmission: by spectrophotometer
Optical Film Thickness: by spectrophotometer
Thickness Uniformity: by monochromatic (e.g., green)
light
Width of Film Adhesive: Visual check by minimum
defect sample
Defects: Visual check by maximum sample or particle
detector
7 Sampling
7.1 Inspection levels shall be agreed upon between the
user and supplier.
8 Handling
8.1 Pellicles are to be handled by the frame only.
9 Certification
9.1 Certification is to be determined between the user
and supplier.
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer's instructions, product labels,
product data sheets, and other relevant literature,
respecting any materials or equipment mentioned
herein. These standards are subject to change without
notice.
By publication of this standard, Semiconductor
Equipment and Materials International (SEMI) takes no
position respecting the validity of any patent rights or
copyrights asserted in connection with any items
mentioned in this standard. Users of this standard are
expressly advised that determination of any such patent
rights or copyrights, and the risk of infringement of
such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI P6-88 © SEMI 1988, 19961
SEMI P6-88
SPECIFICATION FOR REGISTRATION MARKS FOR PHOTOMASKS
1 General Specification
1.1 Scope
1.1.1 This specification defines the shape, range of
sizes, and general placement of a registration mark for
use on all photomasks. Methods of use will be stated in
accompanying application notes (to be furnished at a
later date).
1.2 Applicable Documents — None.
2 Detail Specifications
2.1 Introduction
2.1.1 The complete specification for this registration
mark is to be agreed upon by the circuit designer, mask
maker, and the mask user.
2.2 Requirements
2.2.1 This specification covers a defined mark placed
photolithographically on photomasks for the express
purpose of determining the registration accuracy of one
imaged photomask to another imaged photomask within
the same set of photomasks.
2.3 Other
2.3.1 This mark is not intended to be used for the
determination of overlay accuracy of an imaged layer of
a photomask onto a maker to any subsequent imaged
layers on the same wafer.
3 Guidelines for Shape and Sizes of
Registration Mark
3.1 The shape of the mark shall be in the form of a
cross (see Figure 1).
3.2 The area of intersection of the horizontal and
vertical lines shall be “user-defined.” The designer,
mask maker, or user may define any shape of geometry
within this area. The “user-defined” geometry used
shall not exceed the width or height of the area of
intersection (see Figure 2).
3.3 The width of both the horizontal and vertical lines
shall be equal.
3.4 The length of both the horizontal and vertical lines
shall be equal.
3.5 The width and length of the horizontal and vertical
lines may vary due to design rules, scaling, process
bias, etc. Table 1 lists the design dimensions for each
type of photomask. Sections 3.3 and 3.4 are not
superceded by this statement.
3.6 Any of the four quadrants created to the outside of
the cross shall be defined as “No-Man’s Land” and
shall not have any geometry or marks placed within
them (see Figure 3).
3.7 A field or registration mark (i.e., dark or clear) is
user-definable.
3.8 The mark shall be placed as per attached
application notes (to be furnished at a later date).
SEMI P6-88 © SEMI 1988, 1996 2
Table 1 Dimensions of Registration Mark For All Mask Types (all dimensions are in micrometers (µm))
Type of Photomask Width Length User Defined Area Total Pattern Window
1× Masters 4 – 8 10 – 15 min. 4 × 4
max. 8 × 8
min. 24 × 24
max. 38 × 38
1× Stepper Reticles 4 – 8 10 – 15 min. 4 × 4
max. 8 × 8
min. 24 × 24
max. 38 × 38
5× Stepper Reticles 8 – 40 20 – 75 min. 8 × 8
max. 40 × 40
min. 48 × 48
max. 190 × 190
10× Stepper Reticles 16 – 80 40 – 150 min. 16 × 16
max. 80 × 80
min. 96 × 96
max. 380 × 380
Figure 1
Shape of Registration Mark