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SEMI T9-0200 © SEMI 1998, 2004 1 SEMI T9-0200 (Reapproved 1104) SPECIFICATION FOR MARKING OF METAL LEAD-FRAME STRIPS WITH A TWO-DIMENSIONAL DA TA MATRIX CODE SYMBOL This specificati on was technically approved by the Glo…

SEMI T8-0698
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© SEMI 1998, 2004 8
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SEMI T9-0200 © SEMI 1998, 2004 1
SEMI T9-0200 (Reapproved 1104)
SPECIFICATION FOR MARKING OF METAL LEAD-FRAME STRIPS
WITH A TWO-DIMENSIONAL DATA MATRIX CODE SYMBOL
This specification was technically approved by the Global Traceability Committee and is the direct
responsibility of the North American Traceability Committee. Current edition approved by the North
American Regional Standards Committee on July 11, 2004. Initially available at www.semi.org September
2004; to be published November 2004. Originally published in 1998; previously published April 2000.
1 Purpose
1.1 This specification provides a marking symbology
that can be used to mark metal lead-frame strips.
2 Scope
2.1 This specification defines the geometric and spatial
relationships and content (including the error checking
and correcting code) of rectangular two-dimensional (2-
D), machine-readable, binary Data Matrix symbology
for front-surface marking of metal lead-frame strips
(also called “strips”). It may be used in conjunction
with the alphanumeric marking codes specified in
SEMI M12 and SEMI M13 or the bar code specified in
SEMI T1.
2.2 This specification defines a 22-character default
message that is included in all marks, and option for up
to 50 additional characters, for a total of 72 message
characters. An optional shorter message contains 12 to
16 message characters; the resulting square field is
narrower but taller than the 22-character rectangular
one.
2.3 This specification provides a suggested location for
the code symbol. It also provides guidelines for
specifying other code locations when the suggested
location is not suitable for an application.
2.4 Although this specification does not specify the
marking techniques that may be employed when
complying with its requirements, it is assumed that the
symbol will be obtained by laser scribing individual
dots.
NOTE 1: A mark survivability experiment is being
conducted by the SEMI North American Traceability
committee. A report is available from SEMI: request
“Leadframe Mark Survivability Report” dated February,
1999.
2.5 Data Matrix symbology is applicable to a broad
range of lead-frame materials including copper and
Alloy 42 in both bare and plated conditions. The format
and algorithms of this code are based on two-
dimensional symbology specified in AIM International
Symbology Specification - Data Matrix.
2.6 This specification supports EIA Package Marking
Specification by enabling individual die tracking in the
manufacturing steps between die attach and device
packaging marking.
NOTE 2: Marking of each die, while in wafer form, prior to
dicing, could also accomplish this end.
NOTICE: This standard does not purport to address
safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory or other limitations prior
to use.
3 Referenced Standards
3.1 SEMI Standards
SEMI M12 — Specification for Serial Alphanumeric
Marking of the Front Surface of Wafers
SEMI M13 — Specification for Alphanumeric Marking
of Silicon Wafers
SEMI T1 — Specification for Back Surface Bar Code
Marking of Silicon Wafers
3.2 AIM International Technical Specifications
1
AIM International Symbology Specification — Data
Matrix
3.3 ANSI Standards
2
ANSI/FACT-1 — Data Application Identifier Standard
ANSI X3.4 — American Standard Code for
Information Interchange (ASCII)
NOTE 3: This standard is equivalent to ISO 646, Information
Processing - ISO 7-bit Coded Character Set for Information
Exchange
3
.
1 AIM International, Inc., 125 Warrendale-Bayne Road , Warrendale,
PA 15086, Phone: 1 724 934 4470, Fax: 1 724 934 4495,
http://www.aimglobal.org/
2 American National Standards Institute, Headquarters: 1819 L
Street, NW, Washington, DC 20036, USA. Telephone: 202.293.8020;
Fax: 202.293.9287, New York Office: 11 West 42nd Street, New
York, NY 10036, USA. Telephone: 212.642.4900; Fax:
212.398.0023, Website: www.ansi.org

SEMI T9-0200 © SEMI 1998, 2004 2
ANSI MH10.8.2 — Data Application Identifier
Standard
NOTICE: Unless otherwise indicated, all documents
cited shall be the latest published versions.
4 Terminology
4.1 Definitions
4.1.1 alignment bar, of a data matrix code symbol — a
solid line of contiguous filled cells abutting a line of
alternatively filled and empty cells [AIM International
Symbology Specification - Data Matrix].
4.1.2 binary values — a dot in the substrate surface
indicates the binary value 1. The absence of a dot, or a
smooth surface surrounding a cell center point,
indicates the binary value 0.
4.1.3 border column — the outermost column of a data
matrix code symbol. This column is a portion of the
finder pattern.
4.1.4 border row — the outermost row of a data matrix
code symbol. This row is a portion of the finder pattern.
4.1.5 cell, of a data matrix code symbol — the area
within which a dot may be placed to indicate a binary
value.
4.1.6 cell center point, of an array — the point at
which the centerline of a row intersects the centerline of
a column.
4.1.7 cell spacing, of an array — the (equal) vertical or
horizontal distance between the cell center points of
contiguous cells.
4.1.8 center line, of a row or column — the line
positioned parallel to, and spaced equally between, the
boundary lines of the row or column.
4.1.9 central area, of a cell — the area enclosed by a
circle centered at the cell center point; used by code
readers to sense the binary value of the cell.
4.1.10 data matrix code symbol — a two-dimensional
array of square cells arranged in contiguous rows and
columns. In certain ECC200 symbols, data regions are
separated by alignment patterns. The data region is
surrounded by a finder pattern [AIM International
Symbology Specification - Data Matrix].
4.1.11 dot — a localized region with a reflectance
which differs from that of the surrounding surface.
3 International Organization for Standardization, ISO Central
Secretariat, 1, rue de Varembé, Case postale 56, CH-1211 Geneva 20,
Switzerland. Telephone: 41.22.749.01.11; Fax: 41.22.733.34.30,
Website: www.iso.ch
NOTE 4: To assure reading efficiency, a minimum contrast
of 30% is required between the reflectance value of a dot and
the surrounding substrate surface. Various densitometers can
provide such measurements nondestructively.
4.1.12 dot misalignment, within a cell — the distance
between the physical center point of a dot and the cell
center point.
4.1.13 finder pattern, of a data matrix code symbol —
a perimeter to the data region. Two adjacent sides
contain dots in every cell; these are used primarily to
define physical size, orientation, and symbol distortion.
The two opposite sides are made up of cells containing
dots in alternate cells [AIM International Symbology
Specification - Data Matrix].
4.1.14 orientation corner, of a lead-frame strip — the
strip corner used to assure correct die assembly
orientation. It is denoted by an identification mark.
4.1.15 quiet zone — an unmarked background area that
surrounds the entire code symbol.
4.1.16 reference point, of a data matrix code symbol —
the physical center point of a cell common to a
designated row and column, used to identify the
physical location of the symbol on the object being
marked with the symbol.
NOTE 5: The reference point is at a fixed location on the
object. Different cells may be chosen as the reference point,
depending on the desired orientation of the symbol on the
object and on the size variability of the symbol. The particular
cell to be used as the reference point must be specified for
each application.
5 Ordering Information
5.1 Purchase orders for lead-frame strips furnished to
this specification shall include the following items:
5.1.1 Message Characters
5.1.1.1 Quantity (12 to mm, where mm = 13 to 16; or
22 to nn, where nn is 23 to 72).
5.1.1.2 Content of Message Characters 13 to 16, or 23–
up, if present.
5.1.2 Location of Mark, if different from Section 6.3