semi合集-English.pdf - 第5746页

SEMI P17-92 © SEMI 19 92, 1999 1 SEMI P17-92 (Reapprov ed 0299) DETERMINA TION OF IRON, ZINC, CA LCIUM, M A GNESIUM, COPPER, BORON, ALUMI NUM, CHROMIUM, MANGANESE, AND NICKEL IN POSITIVE PHOTORESIST METAL ION FREE ( MIF)…

SEMI P16-92 © SEMI 1992, 2004 1

SEMI P16-92 (Reapproved 1104)

DETERMINATION OF TIN IN POSITIVE PHOTORESIST METAL ION

FREE (MIF) DEVELOPERS BY GRAPHITE FURNACE ATOMIC

ABSORPTION SPECTROSCOPY

This standard was technically approved by the Global Micropatterning Committee and is the direct

responsibility of the North American Micropatterning Committee. Current edition approved by the North

American Regional Standards Committee on July 11, 2004. Initially available at www.semi.org September

2004; to be published November 2004. Originally published in 1992.

1 Scope

1.1 This procedure is a graphite furnace atomic

absorption analytical method for tin in photoresist MIF

developers. The applicable concentration range is 20 to

1000 ppm.

NOTICE: This standard does not purport to address

safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory or other limitations prior

to use.

2 Referenced Standards

2.1 None.

3 Terminology

3.1 None.

4 Instrument Conditions

4.1 An atomic absorption spectrometer equipped with a

graphite furnace is used with graphite tubes equipped

with pyrolytic coated graphite platforms for sampling.

4.2 The 224.6 nm emission line from a hollow cathode

tin lamp is used as the analytical absorption line.

Table 1 Furnace Program*

Dry Step

Char Step

Atomization

Step

Temperature

(°C)

110 800 2700

Ramp time (s) 20 20 0

Hold time (s) 20 20 5

#1: * Argon flow rate of 50 mL/min

#2: + Maximum power heating

5 Standards

5.1 The standards should be weight/weight (mg/kg)

and should be diluted weight/weight since results will

be expressed in mg/kg.

5.2 A 50 ppm tin standard is prepared by diluting a 500

ppm tin standard to 50 ppm with de-ionized water.

5.3 A 1 ppm standard is made by diluting the 50 ppm

standard.

6 Procedure

6.1 No sample preparation nor dilution is required.

6.2 A 20 mL volume of 1 ppm tin standard is

transferred to the platform by Eppendorf pipette. The

furnace program is run and absorbance measured. The

absorbance of the 1 ppm tin standard should be in the

range of 0.2 absorbance. Measure the absorbance of the

sample in an identical manner.

7 Calculation

ppm tin (mg/kg) =

Abs. Sample 

pm Standard

Abs. Standard

NOTICE: SEMI makes no warranties or

representations as to the suitability of the standards set

forth herein for any particular application. The

determination of the suitability of the standard is solely

the responsibility of the user. Users are cautioned to

refer to manufacturer's instructions, product labels,

product data sheets, and other relevant literature,

respecting any materials or equipment mentioned

herein. These standards are subject to change without

notice.

By publication of this standard, Semiconductor

Equipment and Materials International (SEMI) takes no

position respecting the validity of any patent rights or

copyrights asserted in connection with any items

mentioned in this standard. Users of this standard are

expressly advised that determination of any such patent

rights or copyrights, and the risk of infringement of

such rights are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI P17-92 © SEMI 1992, 19991

SEMI P17-92 (Reapproved 0299)

DETERMINATION OF IRON, ZINC, CALCIUM, MAGNESIUM, COPPER,

BORON, ALUMINUM, CHROMIUM, MANGANESE, AND NICKEL IN

POSITIVE PHOTORESIST METAL ION FREE (MIF) DEVELOPERS BY

INDUCTIVELY COUPLED PLASMA EMISSION SPECTROSCOPY (ICP)

This standard was technically reapproved by the Resist Committee and is the direct responsibility of the North

American Microlithography Committee. Current edition approved by the North American Regional Standards

Committee in October 1998. Initially available at www.semi.org February 1999; to be published February 1999.

Originally published in 1992; previously published in 1996.

1 Scope

This procedure is an ICP plasma emission analysis for

determination of iron, zinc, calcium, magnesium,

copper, boron, aluminum, chromium, manganese, and

nickel in photoresist MIF developers. The applicable

concentration range and detection limit will depend

upon the element and instrument.

2 Spectrometer

An instrument with resolution sufficient to separate the

analytical emission lines in Table 1 is required.

Table 1. Analytical Lines of the Elements

Elements Analytical Line nm

Aluminum 396.152

Calcium 317.933

Copper 324.754

Iron 239.562

Boron 208.960

Magnesium 285.213

Nickel 231.604

Zinc 213.856

Chromium 283.563

Manganese 257.610

3 Standards

The standards should be weight/weight (mg/kg) and

should be diluted weight/weight since results will be

expressed in mg/kg.

The standards are prepared by diluting a concentrated

standard. For example, a 500 ppm standard is diluted to

50 ppm with deionized water. This solution is then

diluted to 0.25 ppm.

4 Plasma Conditions

The sample is pumped in the region of 0.7 mL/min.

usually with a peristaltic pump attached to the

nebulizer. The argon plasma flow rate and RF power

should be optimized for the sample using settings

recommended in the manufacturer manual. Generally, a

plasma gas flow rate of 12 L/min and an RF power of

1.25 kW is required.

5 Quantitation

No sample preparation nor dilution is required.

The detector gain is set by measuring the 0.25 ppm

standard. The standard should be run intermittently to

satisfy reasonable precision. Standard and sample

readings should be repeatable within 0.03 ppm. The

effect of sample viscosity on delivery of diluted sample

to the plasma was not found to be a factor for this

procedure. This effect can be checked by adding an

internal standard of an element known not to be present

in the sample (such as Yttrium) at 1 ppm and checking

the emission response vs. an external 1 ppm Yttrium

standard.

6 Calculation

ppm element (mg/kg)=

Ιx

Ιs

×0.25 ppm

Where Ιx = emission intensity of sample

Ιs = emission intensity of 0.25 ppm standard

NOTICE: These standards do not purport to address

safety issues, if any, associated with their use. It is the

responsibility of the user of these standards to establish

appropriate safety and health practices and determine

the applicability of regulatory limitations prior to use.

SEMI makes no warranties or representations as to the

suitability of the standards set forth herein for any

particular application. The determination of the

suitability of the standard is solely the responsibility of

the user. Users are cautioned to refer to manufacturer's

instructions, product labels, product data sheets, and

other relevant literature respecting any materials

mentioned herein. These standards are subject to

change without notice.

The user's attention is called to the possibility that

compliance with this standard may require use of

copyrighted material or of an invention covered by

patent rights. By publication of this standard, SEMI

takes no position respecting the validity of any patent

rights or copyrights asserted in connection with any

item mentioned in this standard. Users of this standard

are expressly advised that determination of any such

patent rights or copyrights, and the risk of infringement

of such rights, are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o

the contents in whole or in part is forbidden without express written

consent of SEMI.