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SEMI P10-0705 © SEMI 1990, 2005 134 are limited to t hose defined u nder MILESTO NE. MILESTONES may not be used in combination with PERIODIC_UPDATES for th e same MASK_ID. 8.1.448 MIN_CORNER_TO_CORNER_GAP — Smallest (sca…

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SEMI P10-0705 © SEMI 1990, 2005 133
8.1.427 MEASURED_REGISTR_MINIMUM — (x,y) Measured minimum error of all registration measurements
in both x and y. Note that the location of the minimum in x is probably not at the same location as the minimum in
y.
8.1.428 MEASURED_REGISTR_MAXIMUM — (x,y) Measured maximum error of all registration measurements
in both x and y. Note that the location of the maximum in x is probably not at the same location as the maximum in
y.
8.1.429 MEASURED_REGISTR_ORTHO — REGISTR_ORTHO as measured by the vendor.
8.1.430 MEASURED_REGISTR_RELATIVE — REGISTR_RELATIVE as measured by the vendor.
8.1.431 MEASURED_REGISTR_RESIDUAL — (x,y) REGISTR_RESIDUAL as measured by the vendor.
8.1.432 MEASURED_REGISTR_RESIDUAL_THREE_SIGMA — (x,y)
REGISTR_RESIDUAL_THREE_SIGMA as measured by vendor.
8.1.433 MEASURED_REGISTR_SCALE — (x,y) REGISTR_SCALE as measured by the vendor.
8.1.434 MEASURED_REGISTR_THREE_SIGMA — (x,y) REGISTR_THREE_SIGMA as measured by vendor.
8.1.435 MEASURED_REGISTR_TOLERANCE — (x,y) The mean measured registration error in both x and y.
Deviations for which the measured location is to the right or above the reference grid or reference mask are
considered positive; measured locations to the left or below the reference grid or reference mask are considered
negative.
8.1.436 MEASURED_TRANSMISSION — Phase shift transmission as measured at a single site.
8.1.437 MEASURED_TRANSMISSION_AVERAGE — Mean of all customer-specified transmission
measurement sites.
8.1.438 MEASURED_TRANSMISSION_ERROR — TRANSMISSION_ERROR as measured by the vendor.
8.1.439 MEASURED_TRANSMISSION_MARK_SITE_ID — Must match TRANSMISSION_MARK_SITE_ID
in <mask_order> for site being measured. If the customer assigned no TRANSMISSION_MARK_SITE_ID for the
required location (e.g., only TRANSMISSION_MARK_LOCATION_DRAWING was used), the vendor will assign
a MEASURED_TRANSMISSION_MARK_SITE_ID for each measurement location so that it is unique within the
MASK_SET_ID.
8.1.440 MEASURED_TRANSMISSION_RANGE — TRANSMISSION_RANGE as measured by the vendor.
8.1.441 MEASURED_TRANSMISSION_TOLERANCE — TRANSMISSION_TOLERANCE as measured by the
vendor. If the mean transmission is greater than the target, then reported value will be positive; if the mean
transmission is less than the target, then reported value will be negative.
8.1.442 MEASURED_VERTICAL_CD — Measured value of vertical critical dimension.
8.1.443 MFG_BIAS_PREAPPLIED — Amount (in microns, prior to scaling) of sizing pre-applied by the customer
to support mask processing of CD_DATA to achieve CD_TARGET. A negative MFG_BIAS_PREAPPLIED
indicates that the digitized geometry has been made smaller.
8.1.444 MFG_SITE_REQD — Alphanumeric identification of qualified manufacturing sites, to be agreed between
customer and vendor. For a given MASK_ID, MFG_SITE_REQD may not be used in combination with
EQUIP_SITE_REQD.
8.1.445 MFG_SITE_USED — Alphanumeric identification of manufacturing site used, to be agreed between
customer and vendor.
8.1.446 MILESTONE — (ORDER_RECEIVED, ORDER_ACCEPTED, DATA_PREPARED,
MASK_WRITTEN, CDS_MEASURED, REGISTR_MEASURED, DEFECTS_REPAIRED,
PELLICLES_APPLIED, POST_PELLICLE_INSPECTION, SHIPPED, DELIVERED, ON_HOLD, OFF_HOLD)
notifies the customer that the MASK_ID has passed the indicated processing step, or is on hold.
8.1.447 MILESTONES — (T or F) If T, the vendor is requested to use <mask_results> (see §7.5) to notify the
customer each time the mask completes a significant processing step. Within this standard, these significant steps
SEMI P10-0705 © SEMI 1990, 2005 134
are limited to those defined under MILESTONE. MILESTONES may not be used in combination with
PERIODIC_UPDATES for the same MASK_ID.
8.1.448 MIN_CORNER_TO_CORNER_GAP — Smallest (scaled) corner-to-corner spacing of any features
included in any customer-supplied pattern data on the mask.
8.1.449 MIN_MASK_FEATURE_SIZE — Smallest (scaled) feature included in any customer-supplied pattern
data on the mask.
8.1.450 MINIMUM_FEATURE_LOCATION — Location of a minimally sized feature within the pattern file,
relative to the center of the pattern, unscaled and unmirrored.
8.1.451 MINIMUM_FEATURE_SIZE — Smallest (unscaled) feature included in pattern data, excluding OPC data
which is identified under OPC_MINIMUM_FEATURE_SIZE.
8.1.452 MIRROR — (HORIZONTAL or VERTICAL) Axis around which to invert the data image.
8.1.453 MIRROR_MASK — (T or F) All patterns and titles must be mirrored about the vertical axis, to be applied
in addition to all other positioning information.
8.1.454 MIRROR_PATTERN — (T or F) If T, the pattern file (or cell) is to be mirrored about its vertical axis. If
used in conjunction with MIRROR_MASK, the result will be unmirrored pattern data while all other data will be
mirrored.
8.1.455 MIRROR_TITLE — (T or F) If T, TITLE_TEXT is to be mirrored about the vertical axis. If used in
conjunction with MIRROR_MASK, result will be an unmirrored title with all other data mirrored (chrome side up).
8.1.456 MULTIWRITE — (x,y) If present as a mask option, then the MASK_ID represents only one writing
operation for a mask which requires multiple write and process cycles (defined within the <mask_group>) before the
final mask is completed. All MASK_IDs used to make the final mask must have MULTIWRITE as a
<mask_option> and must designate the same integer group number (x). Such a final mask will be built with a
specified integer sequence (y) of MASK_IDs. Sequence numbers may never be less than 1 nor more than the
number of write and process cycles specified in the order, except that zero may be used where the sequence is
arbitrary. A sequence number within a group may not be repeated (except zero).
8.1.457 MULTIWRITE_REF_MASK_ID — Within the MULTIWRITE numerical group, this is the MASK_ID to
which overlay error should be measured.
8.1.458 NUMBER_OF_CDS — The integer number of CD locations to be measured. If sufficient specific sites are
not explicitly identified by the customer, the vendor is free to select additional similar sites.
8.1.459 OPC_MINIMUM_FEATURE_SIZE — For the OPC_TYPE being described, the size of the smallest
(unscaled) OPC feature in the pattern data.
8.1.460 OPC_MINIMUM_GAP — For the OPC_TYPE being described, the size of the smallest (unscaled) gap in
the pattern data between OPC features of the same type.
8.1.461 OPC_PATTERN_MODIFIABLE — (T or F) If F, the pattern may not be modified (biased) by the mask
shop for printability or CD linearity improvement. In this case, the need for such biasing must have been anticipated
by the customer.
8.1.462 OPC_PATTERN_SEPARATE — (T or F) If T, then the pattern being described is only the OPC portion of
what will be written on the mask. Depending upon the write tool methodology, the pattern may need to be merged
off-line with other patterns. This may allow mask shop biasing for printability or CD linearity unless precluded by
OPC_PATTERN_MODIFIABLE = F.
8.1.463 OPC_TYPE — (CLEAR_SERIF, CLEAR_HAMMERHEAD, CLEAR_ASSIST_BAR, OPAQUE_SERIF,
OPAQUE_HAMMERHEAD, OPAQUE_ASSIST_BAR, JOG, PILLAR, HOLE) (Linewidth biasing is not included
as an OPC type.)
8.1.464 OPERATOR — (text) Mask supplier identification of employee who completed the photomask
requirements for the given operation.
SEMI P10-0705 © SEMI 1990, 2005 135
8.1.465 OPERATOR_NAME — Alphabetic name of the person entering the mask order or entering the mask
results.
8.1.466 OPTICAL_MASK_ID — For optical stepping or contact printing, the “pattern” is to be obtained by using a
reticle or mask built under this MASK_ID from the above-named MASK_SET_ID.
8.1.467 OPTICAL_MASK_SET_ID — For optical stepping or contact printing, the “pattern” is to be obtained by
using a reticle or mask from this MASK_SET_ID.
8.1.468 OPTICAL_MASK_TITLE — For optical stepping or contact printing, identifying title on reticle or mask.
To be used in place of OPTICAL_MASK_SET_ID and OPTICAL_-MASK_ID when the reticle or mask was built
without available <mask_order> data.
8.1.469 ORDER_ACCEPTED — Returns the exact FILE_DATE_TIME as in the file being accepted, thereby
agreeing to process the order as received.
8.1.470 ORDER_ID — Printable text of the customer’s internal order identification to provide correlation with pre-
existing order tracking systems. This is for customer cross-referencing only, but should be recorded by the vendor
and reported back in <mask_results>.
8.1.471 ORDER_RECEIVED — Returns the exact FILE_DATE_TIME as in the file being acknowledged, thereby
confirming receipt of that file. This response is required each time a new transmission is received by the vendor.
8.1.472 PACKAGE — Alphanumeric identification of brand and model of acceptable compact to be used for
delivering masks.
8.1.473 PACKAGE_USED — (text) The compact vendor’s part number of the compact in which the mask was
shipped and any additional compacts supplied.
8.1.474 PARAMETER_FILE_NAME REVISION — (text) Name of parameter file required by RUNSET_NAME.
Note that multiple run_set_name entries under a SOFTWARE_NAME means that multiple runs with the same
software are required.
8.1.475 PARAMETER_FILE_REVISION — (text) Revision identification of PARAMETER_FILE_NAME.
8.1.476 PATTERN_ADDRESS_SIZE — Address unit of the (unscaled) pattern file. If this is incorrect, the mask
will not be written until it is corrected. For data manipulation operations, this is the address to use in final fracturing
to produce a pattern file for exposure.
8.1.477 PATTERN_APPROVAL_REQD — name the pattern to be approved before the mask(s) may be written.
8.1.478 PATTERN_APPROVED — (date, name) Date approval was granted by customer and the name of the
pattern for PATTERN_APPROVAL_REQD.
8.1.479 PATTERN_CHARACTER_SET — (ASCII or EBCDID) ASCII is assumed unless otherwise specified.
8.1.480 PATTERN_FORMAT — (ALF, APPLICON, AUTOCAD, CATS_CFLT, CATS_CREF, CIF, DERIVED,
EEBES, ELECTROMASK, FALCON, GDS-II, HITACHI_700, HITACHI_800, JEOL_51, JEOL_52, KLARIS,
MANN_3000, MANN_3600, MEBES_I, MEBES_II, MEBES_EXTENDED, MEBES_RETICLE, MEBES_MODE
5, OASIS, ORBOT, ULTRABEAM, VSB11, ZBA, and others on request). Format of preceding pattern file. For
<data_manipulation> results, if multiple PATTERN_FORMATS are listed, they are in declining order of
preference. For BOOLEAN operations, DERIVED indicates DATA_SOURCE_FILE was the result of a previous
<data_manipulation> process.
8.1.481 PATTERN_FUNCTION — (FRAME, DEVICE, FIDUCIAL, BARCODE, TEST and others as needed by
the user) This keyword is for reference purposes only, with no action or requirement implied for the mask supplier.
It will serve merely to provide a functional name for customer convenience.
8.1.482 PATTERN_GENERATION_AREA — (x1,y1,x2,y2) Window in which to generate a digitized rectangle
for use in BOOLEAN operations, relative to the coordinate space of DATA_SOURCE_FILE.
8.1.483 PATTERN_GROUP_ID — Name of the pattern group which follows; must be used in all references within
this MASK_SET_ID to this pattern group.