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SEMI C35-0301 © SEMI 1979, 2001 N I TR IC A C ID 4 Previous SEMI Refe rence # C1.12-96 C7.6-95 C8.6-95 Grade 1 Grade 2 Tier B (Specif ication) (Specif ication) (Guideline) Gold (A u) 0.3 ppm m ax 5 ppb ma x 1 ppb max Iro…
NITRIC ACID SEMI C35-0301 © SEMI 1979, 20013
9.2.3 Sample Preparation
9.2.3.1 In a clean environment, place 2.00 g of sample
into a tared FEP bottle (30 mL), dilute with Type E1.1
water to a final weight of 20.0 g. Add 20 µL of the
indium internal standard solution. Run a reagent blank.
9.2.4 Analysis
9.2.4.1 Using the prepared solutions and blanks,
analyze sodium, potassium, calcium and iron by
graphite furnace atomic absorption (GFAA) and the
remaining elements by inductively coupled plasma
mass spectrometry (ICP/MS). For calibration, the
standards are made up with the 7.0% nitric acid solution
and the indium internal standard such that the final
concentration is 20 ng/g of indium.
10 Grade 3 Procedures
10.1 This section does not apply to this chemical.
11 Grade 4 Procedures
11.1 This section does not apply to this chemical.
12 Grade 5 Procedures
12.1 This section does not apply to this chemical.
13 VLSI Grade Procedures
13.1 This section does not apply to this chemical.
14 Tier A Procedures
14.1 This section does not apply to this chemical.
15 Tier B Procedures
15.1 Standardized test methods are being developed
for all parameters at the purity levels indicated. Until
standardized test methods are published, test
methodology shall be determined by user and producer.
The Process Chemical Committee considers a test
method to be valid only if there is a documented
recovery study showing a recovery of 75–125%.
Recovery is for a known sample spike at 50% of the
specified level.
16 Tier C Procedures
16.1 This section does not apply to this chemical.
17 Tier D Procedures
17.1 This section does not apply to this chemical.
Table 1 Impurity Limits and Other Requirements for Nitric Acid
Previous SEMI Reference # C1.12-96 C7.6-95 C8.6-95
Grade 1 Grade 2 Tier B
(Specification) (Specification) (Guideline)
Assay (HNO
3
) 69.0–70.0% 69.0–70.0% 69.0–70.0%
Color (APHA) 10 max
(see NOTE 1)
10 max 10 max
Chloride (Cl) 0.08 ppm max 80 ppb max 50 ppb max
Phosphate (PO
4
) 0.2 ppm max 200 ppb max 50 ppb max
Sulfate (SO
4
) 0.5 ppm max 500 ppb max 50 ppb max
Aluminum (Al) 0.2 ppm max 5 ppb max 1 ppb max
Antimony (Sb) -- 5 ppb max --
Arsenic (As) -- 10 ppb max --
Arsenic and Antimony (as As) 0.005 ppm max -- 1 ppb max
Barium (Ba) -- 10 ppb max 1 ppb max
Beryllium (Be) -- 10 ppb max 1 ppb max
Bismuth (Bi) -- 10 ppb max 1 ppb max
Boron (B) 0.1 ppm max 10 ppb max 1 ppb max
Cadmium (Cd) -- 5 ppb max 1 ppb max
Calcium (Ca) 0.2 ppm max 10 ppb max 1 ppb max
Chromium (Cr) 0.1 ppm max 10 ppb max 1 ppb max
Cobalt (Co) -- 10 ppb max 1 ppb max
Copper (Cu) 0.05 ppm max 10 ppb max 1 ppb max
Gallium (Ga) -- 10 ppb max 1 ppb max
Germanium (Ge) -- 5 ppb max 1 ppb max
SEMI C35-0301 © SEMI 1979, 2001 NITRIC ACID4
Previous SEMI Reference # C1.12-96 C7.6-95 C8.6-95
Grade 1 Grade 2 Tier B
(Specification) (Specification) (Guideline)
Gold (Au) 0.3 ppm max 5 ppb max 1 ppb max
Iron (Fe) 0.2 ppm max 5 ppb max 1 ppb max
Lead (Pb) 0.1 ppm max 10 ppb max 1 ppb max
Lithium (Li) -- 5 ppb max 1 ppb max
Magnesium (Mg) 0.3 ppm max 10 ppb max 1 ppb max
Manganese (Mn) 0.2 ppm max 10 ppb max 1 ppb max
Molybdenum (Mo) -- 10 ppb max 1 ppb max
Nickel (Ni) 0.05 ppm max 10 ppb max 1 ppb max
Niobium (Nb) -- 10 ppb max 1 ppb max
Potassium (K) 0.3 ppm max 5 ppb max 1 ppb max
Silicon (Si) -- -- 1 ppb max
Silver (Ag) -- 10 ppb max 1 ppb max
Sodium (Na) 0.3 ppm max 5 ppb max 1 ppb max
Strontium (Sr) -- 10 ppb max 1 ppb max
Tantalum (Ta) -- 10 ppb max 1 ppb max
Thallium (Tl) -- 10 ppb max 1 ppb max
Tin (Sn) 0.3 ppm max 10 ppb max 1 ppb max
Titanium (Ti) 0.3 ppm max 10 ppb max 1 ppb max
Vanadium (V) -- 10 ppb max 1 ppb max
Zinc (Zn) 0.3 ppm max 10 ppb max 1 ppb max
Zirconium (Zr) -- 10 ppb max 1 ppb max
Particles in bottles:
size, #/mL
≥ 1.0 µm, 25 max ≥ 0.5 µm, 25 max ≥ 0.5 µm, 5 max
≥ 0.2 µm, TBD
NOTE 1: This material may darken during storage due to a photochemical reaction.
NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for any
particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant
literature respecting any materials mentioned herein. These standards are subject to change without notice.
The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted
material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI C36-0705 © SEMI 1981, 2005 1
SEMI C36-0705
SPECIFICATIONS FOR PHOSPHORIC ACID
This specification was technically approved by the global Liquid Chemicals Committee. This edition was
approved for publication by the global Audits and Reviews Subcommittee on April 7, 2005. It was available
at www.semi.org in June 2005 and on CD-ROM in July 2005. Originally published in 1981; previously
published March 2001.
1 Purpose
1.1 The purpose of this document is to standardize requirements for phosphoric acid used in the semiconductor
industry and testing procedures to support those standards. Test methods have been shown to give statistically valid
results.
2 Scope
2.1 The scope of this document is all grades of phosphoric acid used in the semiconductor industry.
2.2 This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of
the users of this standard to establish appropriate safety and health practices and determine the applicability of
regulatory limitations prior to use.
3 Limitations
3.1 None.
4 Referenced Standards and Documents
4.1 ASTM Standards
1
ASTM D5127 — Standard Guide for Ultra Pure Water Used in the Electronics and Semiconductor Industry
NOTE 1: As listed or revised, all documents cited shall be the latest publications of adopted standards.
5 Terminology
5.1 None.
6 Physical Property (for information only)
80% 1.64 g/mL
Density at 25C
86% 1.70 g/mL
7 Requirements
7.1 The requirements for phosphoric acid for Grades 1, 2, and 3 are listed in Table 1.
8 Grade 1 Procedures
8.1 Assay — Weigh to the nearest 1 mg about 1 mL of sample in a 250 mL glass-stoppered flask, dilute with 120
mL of water, add 0.5 mL of thymolphthalein indicator solution, and titrate with standardized 1 N sodium hydroxide
to the first appearance of a blue color against a white background.
% Assay =
mL
N
of NaOH
4.900
Weight of sample (g)
8.2 Chloride — Dilute 9 mL (15 g) of sample with 25 mL of water, and add 0.5 mL of nitric acid and 1 mL of silver
nitrate reagent solution. Any turbidity produced should be no greater than that produced when 0.015 mg of chloride
ion (Cl) is treated as the sample.
1 American Society for Testing and Materials, 100 Barr Harbor Drive, West Conshohocken, Pennsylvania 19428-2959, USA. Telephone:
610.832.9585, Fax: 610.832.9555, Website: www.astm.org