semi合集-English.pdf - 第4006页

SEMI F48-0600 © SEMI 2000 1 SEMI F48-0600 TEST METHOD FOR DETERMINING TR A CE M ET A LS I N POLYME R MA TE RIA LS This test method was tec hnically approved by the G lobal Facilitie s Committee and is the direct responsi…

SEMI F47-0200 © SEMI 1999, 2000 6

100

0.01 0.1 1 10 100

Duration of Voltage Sag in Seconds

Percent of Equipment Nominal Voltage

Area included in Specification

0.05 to 1 second

0.02

Figure R1-1

Recommended Semiconductor Equipment Voltage Sag Ride-Through Capability Curve

from 0 to 100 Seconds

NOTICE: SEMI makes no warranties or

representations as to the suitability of the standards set

forth herein for any particular application. The

determination of the suitability of the standard is solely

the responsibility of the user. Users are cautioned to

refer to manufacturer’s instructions, product labels,

product data sheets, and other relevant literature

respecting any materials mentioned herein. These

standards are subject to change without notice.

The user’s attention is called to the possibility that

compliance with this standard may require use of

copyrighted material or of an invention covered by

patent rights. By publication of this standard, SEMI

takes no position respecting the validity of any patent

rights or copyrights asserted in connection with any

item mentioned in this standard. Users of this standard

are expressly advised that determination of any such

patent rights or copyrights, and the risk of infringement

of such rights, are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI F48-0600 © SEMI 20001

SEMI F48-0600

TEST METHOD FOR DETERMINING TRACE METALS IN POLYMER

MATERIALS

This test method was technically approved by the Global Facilities Committee and is the direct responsibility

of the North American Facilities Committee. Current edition approved by the North American Regional

Standards Committee on March 2, 2000. Initially available on www.semi.org April 2000; to be published

June 2000.

1 Purpose

1.1 This method provides a procedure for determining

the nonvolatile trace inorganic impurities in bulk

polymeric materials.

2 Scope

2.1 Following digestion by dry ashing (DDA) or

digestion in closed vessel (DCV) preparation

techniques, samples previously obtained and cleaned

according to SEMI F40 are analyzed for trace

inorganics using inductively coupled plasma-mass

spectrometry (ICP–MS), graphite furnace atomic

absorption spectroscopy (GFAAS), and/or inductively

coupled plasma-atomic emission spectroscopy (ICP–

AES).

2.2 Materials for analysis include, but are not limited

to:

• Raw polymer materials (resins), such as pellets of

perfluoroalkoxy (PFA), polyvinylidene fluoride

(PVDF), ethylenechlorotrifluoroethylene (ECTFE),

polyetheretherketone (PEEK), polypropylene (PP),

polyethylene (PE), acetal resin, polyvinyl chloride

(PVC), Perfluoromethylether-based Perfluoro-

alkoxy (MFA) and powders of polytetrafluoro-

ethylene (PTFE).

• Polymer components of tubing, piping, fittings,

valves, regulators, filter housings, filter cartridges,

O–rings and gaskets used in ultrapure water (UPW)

and liquid chemical distribution systems (LCDS).

See Section 3.8 for further information.

• Ion-exchange resins

• Polymer products used in the manufacturing of

semiconductor devices, such as wafer carriers and

wands, as well as accessories internal to wet

equipment (e.g., drums in spin rinse dryers, tanks

in quick dump rinsers). See Section 3.8 for further

information.

2.3 The DDA sections of this document refer to an

ashing technique, whereby the sample is placed into a

platinum or quartz crucible and thermally decomposed.

Thermal decomposition in muffle furnace or microwave

muffle furnace may also be used. Additionally, oxygen

plasma may be used separately or in conjunction with

these techniques.

2.4 The DCV sections of this document refer to closed

vessel microwave acid decomposition at elevated

temperature and pressure. Alternatively closed vessel

thermal conduction heating may also be applied.

2.5 ICP–MS, GFAAS, and ICP–AES are all

appropriate methods for inorganic analysis. ICP–MS is

the preferred method because it is more sensitive and

efficient. Alternate procedures may be used if they

meet the same analytical performance criteria. Each

laboratory is responsible for verifying the validity of

each method within its own operation.

2.6 This method is applicable for the elements found

in Table 1:

Table 1 List of Applicable Elements (See NOTE 1.)

Aluminum Magnesium

Barium Manganese

Calcium Nickel

Chromium Potassium

Cobalt Sodium

Copper Strontium

Iron Tin

Lead Titanium

Lithium Zinc

Molybdenum Zirconium

NOTE 1: See Limitations, Section 3.3.

2.7 This method may be used for other materials, or

other nonvolatile elements, if the end-user wishes and

performance is demonstrated for the analyte of interest,

in the matrices of interest, at the concentration levels of

interest.

2.8 This standard does not purport to address safety

issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory limitations prior to use.

3 Limitations

3.1 The accuracy of the method is limited by the

detection limits of the instruments and by the sample

preparation procedure.

SEMI F48-0600 © SEMI 2000 2

3.2 This procedure anticipates analysis levels in the

ppm (mass/mass) range. Impurities less than 0.1 ppm

may not be detected by this method.

3.3 When extending the method to other elements

recovery should be evaluated during validation. Poor

recovery rates are often found for volatile elements

such as boron (B), arsenic (As), antimony (Sb),

mercury (Hg), gold (Au), and tungsten (W) because of

the relatively high temperature sample preparation

method and poor stability of some elements in aqueous

solution. Elements forming volatile halogenides can be

affected due to the in-situ production of hydrogen

halogenides when halogenated polymers are ashed.

3.4 This is a bulk analysis technique. For leachable

testing or surface analysis refer to the Related

Documents (Section 16) of this method.

3.5 Due to the rapid advances in digestion technology,

consult the manufacturer’s recommended instructions

for guidance when conducting analyses using the DCV

sections of this document.

3.6 DCV techniques can generate gaseous digestion

reaction products, very reactive, or volatile materials at

high pressures. Spontaneous venting which can occur

during sample heating may cause venting of the vessels

with potential loss of sample and analytes. Sample

sizes greater than 0.25 g may accentuate this event.

3.7 In the use of the DCV technique, TiO2, alumina,

and other oxides may not be totally dissolved.

Sequestering of target analyte elements may occur.

3.8 Although this method allows the sampling of small

pieces of polymer that are mechnically removed from a

larger item, obtaining such samples in a clean manner

may be difficult. Multiple sampling, separation and

preparation techniques might be necessary to establish

confidence in the results.

3.9 This document is not intended to supersede

international, national or local codes, regulations, and

laws. Each should be consulted to ensure that the

method meets regulatory requirements in each location.

4 Referenced Standards

4.1 SEMI Standard

SEMI F40 –– Practice for Preparing Liquid Chemical

Distribution Components for Chemical Testing

4.2 ASTM Standard

ASTM D4375 –– Standard Practice for Basic

Definitions, Notation, and Symbology for Statistics in

Committee D19 on Water

1 American Society for Testing and Materials, 1916 Race St.,

Philadelphia, PA 19103

NOTE 1: As listed or revised, all documents cited shall be the

latest publications of adopted standards.

5 Terminology

5.1 Acronyms and Abbreviations

5.1.1 AAS/GFAAS — atomic absorption spectroscopy/

graphite furnace atomic absorption spectroscopy

5.1.2 amu — atomic mass unit

5.1.3 DCV  digestion in closed vessel

5.1.4 DDA  digestion by dry ashing

5.1.5 GFAAS — graphite furnace atomic absorption

spectroscopy

5.1.6 ICP–AES — inductively coupled plasma–atomic

emission spectroscopy

5.1.7 ICP–MS — inductively coupled plasma–mass

spectrometry

5.1.8 ppb — parts per billion by mass (ng/g)

5.1.9 ppm — parts per million by mass (µg/g)

5.1.10 UPW — ultrapure water (see Section 9.4)

6 Summary of Test Method

6.1 Samples previously prepared using SEMI F40 are

ashed or digested under pressure within a digestion

device, and trace inorganics in the residue are dissolved

into acid and UPW. The sample is then analyzed by

ICP–MS, GFAAS, and/or ICP–AES to determine the

inorganic content of the material. This method applies

only to nonvolatile metals (i.e., alkali metals, alkaline

earths, and transition metals).

6.2 Data from different tests can be compared to

determine the inorganic content in different materials

and in the same material from different manufacturers.

7 Significance and Use

7.1 Determining the metallic contamination

concentration in bulk polymer materials used in either

distribution systems for process fluids or products in

direct contact with the wafer is important criterion for

deciding the suitability of a material. For example,

ultrapure water contaminated by distribution system

components may adversely affect microelectronic and

other processes.

7.2 This method measures the total amount of

impurities in the bulk of the material. These impurities

will not necessarily leach into a process fluid stream.