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SEMI E49.2-1104 © SEMI 1995, 2004 1 SEMI E49.2-1104 GUIDELINE FOR THE QUALIFICAT ION OF POLYMER ASSEMBLIES USED IN ULTRAPURE WATER AND LIQUID CHEMICAL SYSTEMS IN SEMICONDUCTOR PR OCESS EQUIPMENT This guideline was techni…

SEMI E49-1104 © SEMI 1995, 2004 4

5.1.5 Final Assembly Contamination Control — Will

result in reduced possibility of cleanroom

contamination upon tool delivery, and avoid time delay

of tool cleaning at wafer fab site.

NOTICE: SEMI makes no warranties or

representations as to the suitability of the standards set

forth herein for any particular application. The

determination of the suitability of the standard is solely

the responsibility of the user. Users are cautioned to

refer to manufacturer's instructions, product labels,

product data sheets, and other relevant literature,

respecting any materials or equipment mentioned

herein. These standards are subject to change without

notice.

By publication of this standard, Semiconductor

Equipment and Materials International (SEMI) takes no

position respecting the validity of any patent rights or

copyrights asserted in connection with any items

mentioned in this standard. Users of this standard are

expressly advised that determination of any such patent

rights or copyrights, and the risk of infringement of

such rights are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction

of the contents in whole or in part is forbidden without express

written consent of SEMI.

SEMI E49.2-1104 © SEMI 1995, 2004 1

SEMI E49.2-1104

GUIDELINE FOR THE QUALIFICATION OF POLYMER ASSEMBLIES

USED IN ULTRAPURE WATER AND LIQUID CHEMICAL SYSTEMS IN

SEMICONDUCTOR PROCESS EQUIPMENT

This guideline was technically approved by the Global Liquid Chemicals Committee and is the direct

responsibility of the North American Liquid Chemicals Committee. Current edition approved by the North

American Regional Standards Committee on August 16, 2004. Initially available at www.semi.org

September 2004; to be published November 2004. Originally published in 1995; last published February

1998.

NOTICE: This document was rewritten in its entirety in 2004, and is a replacement for the previous versions of

both E49.2 & E49.3.

NOTICE: Paragraphs entitled NOTE are not an official part of this document and are not intended to modify or

supercede it.

1 Purpose

1.1 The objective of this document is to provide a

guideline by which the purity and mechanical integrity

of all ultrapure water and liquid chemical Assemblies

shipped to end users may be qualified. It is also the

purpose of this guideline to complement the following:

 SEMI F57: Provisional Specification For Polymer

Components Used in Ultrapure Water and Liquid

Chemical Distribution Systems and;

 SEMI E49.7: Purity Guide For the Design and

Manufacture of Ultrapure Water and Liquid

Chemical Systems in Semiconductor Process

Equipment

NOTE 1: As with any SEMI guide, the practices outlined

herein are recommendations, not specifications. Users of this

document should recognize that alternate practices are not

excluded as long as they produce results that are equivalent to

those produced using the recommendations outlined here and

meet the requirements of the end user.

2 Scope

2.1 To ensure the purity and mechanical integrity of

ultrapure water and liquid chemical Assemblies the

following tests and quality guidelines are

recommended:

 Hydrostatic Pressure Tests – See Table 1, Section

9.1, and Section 9.2.

 Ultrapure Water Flush Test – See Table 1 Section

9.1, and Section 9.3.

 Particle Test – See Table 1, Section 9.1 and Section

9.4

 Ionic and Metallic Contamination Tests – See

Table 1, Section 9.1, and Section 9.5

 Certification – See Section 10 for defining,

establishing, executing, and maintaining a

certification program.

 Traceability – See Section 11 for the

responsibilities for suppliers to verify compliance

with SEMI F57, SEMI E49.7, and this document.

2.2 Typical semiconductor process equipment with

ultrapure water and liquid chemical delivery

Assemblies includes, but is not limited to the following:

 Wafer Handling Equipment

 Wafer Cleaning Systems

 Chemical Filtration/Mixing Skids provided by

OEM

 Wet Clean Stations

 Wafer Scrubbers

 CMP

 Photolithography coaters and developers

 Ion Implanters

 Metrology equipment

 Ancillary equipment provided with the process

equipment.

NOTICE: This standard does not purport to address

safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory or other limitations prior

to use.

SEMI E49.2-1104 © SEMI 1995, 2004 2

3 Limitations

3.1 For the purposes of this document, qualification

recommendations are limited to the purity and

mechanical integrity of Assemblies as outlined in the

purpose and scope. Qualification recommendations are

not intended to address any other operational

parameters (for example, flow capacity, flow rates,

reliability, chemical compatibility etc.).

3.2 This guideline does not define the purity

performance requirements of individual components,

which may be addressed by SEMI F57. Nor does this

document provide guidelines for the design and

manufacture of Assemblies, which may be addressed by

SEMI E49.7.

3.3 Facility distribution systems are also outside the

scope of this guideline.

3.4 Stainless steel or other non-polymeric Assemblies

are outside the scope of this document. Refer to SEMI

E49.4, SEMI E49.5, and SEMI E49.6 for information

on stainless steel components and Assemblies

3.5 This guideline is not intended to apply to

Assemblies used in the delivery of liquids that do not

contact the wafer’s surface, for example drainage and

cooling Assemblies.

4 Referenced Standards

4.1 SEMI Standards

SEMI C59  Specifications and Guidelines for

Nitrogen

SEMI E49.4 Guide for High Purity Solvent

Distribution Systems in Semiconductor Manufacturing

Equipment

SEMI E49.5  Guide for Ultrahigh Purity Solvent

Distribution Systems in Semiconductor Manufacturing

Equipment

SEMI E49.6 Guide For Subsystem Assembly and

Testing Procedures – Stainless Steel Systems

SEMI E49.7 Purity Guide For the Design and

Manufacture of Ultrapure Water and Liquid Chemical

Systems in Semiconductor Process Equipment

SEMI F57  Provisional Specification For Polymer

Components Used in Ultrapure Water and Liquid

Chemical Distribution Systems

SEMI F61  Guide for Ultrapure Water System Used

in Semiconductor Processing

4.2 ASTM Standards

ASTM D4327  Standard Test Method for Anions in

Water by Chemically Suppressed Ion Chromatography

ASTM D5997-96  Standard Test Method for On-

Line Monitoring of Total Carbon, Inorganic Carbon in

Water by Ultraviolet, Persulfate Oxidation, and

Membrane Conductivity Detection

4.3 Other Standards

Hydrostatic Pressure and Leak Testing of Polymer

Piping Systems Used in High-purity Water

Applications

5 Terminology

5.1 See Section 4 of SEMI E49.

5.2 For the purposes of this document, an “Assembly”

or “Assemblies” is defined as a combination of two or

more ultrapure water or liquid chemical delivery

components and is always capitalized when used in this

manner.

5.3 For the purposes of this document Assemblies

shipped to end users are those Assemblies sent to

semiconductor manufacturers which will not undergo

any additional testing, cleaning, or other qualification

processes. The semiconductor manufacturer may

perform additional testing outside the tests outlined by

this document.

5.4 For the purposes of this document “supply chain”

is defined as those manufacturers involved in producing

components, integrating or assembling components,

and testing Assemblies.

5.5 For the purposes of this document components

include but are not limited to all product covered by

SEMI 57 as well as product not covered by SEMI F57

such as pumps, storage tanks, drums, pressure vessels,

filter housing, sensors, monitors, or ultra-filtration, and

pumps.

5.6 NIST is the National Institute of Standards and

Technology.

1 American Society for Testing and Materials, 100 Barr Harbor

Drive, West Conshohocken, Pennsylvania 19428-2959, USA.

Telephone: 610.832.9585, Fax: 610.832.9555, Website:

www.astm.org

2 Mayer, Burkhart, Rydzewski, UltraPure Water Journal, May/June

2002, pp. 27-40