semi合集-English.pdf - 第4502页

SEMI D21-1000 © SEMI 1992, 2000 3 NOTICE: The user’s attention is called to the possibilit y that compliance with this standard may require use of cop yrigh ted material or of an invention covered by pat ent right s. B y…

SEMI D21-1000 © SEMI 1992, 2000 2

composition by a stepper). Usually, it is deviation as

shown in the following figure.

Figure 3

Stitching Error

5 Pattern Positioning Accur acy

5.1 Pattern Positioning Accuracy — Relation between

the actual and desired locations of a printed pattern on a

glass substrate.

5.2 End Plane Reference — Positioning accuracy of

the printed pattern measured from the reference edge of

a glass mask.

Figure 4

Pattern Positioning Accuracy

5.2.1 Reference Edge: Two adjacent edges are

considered as the reference edge.

5.3 Pattern Rotation — Deviation of a printed pattern

on a glass mask caused by rotation. Usually, it is

expressed by the difference between two measured

distances at separated points within one side as shown

in the figure.

θ = (D

- D

)/C

Usually fix the value of C

and use the value of D

- D

Figure 5

Pattern Rotation

5.4 Cell Rotation in Multiimages — Cell’s slant

rotation against axis of light in case of exposure by

stepper and similar equipment. (Generally, it is

measured by vernier outside of cells.)

Figure 6

Cell Rotation in Multiimages

5.5 Gaps of Cells in Multiimages — X and Y

directions’ gaps of cells against designed grating which

should be exposed primarily by stepper and similar

equipment. (Generally, it is measured by gaps between

cells which are next to each other with vernier outside

of cells.)

Figure 7

Gaps of Cells in Multiimages

SEMI D21-1000 © SEMI 1992, 20003

NOTICE: The user’s attention is called to the

possibility that compliance with this standard may

require use of copyrighted material or of an invention

covered by patent rights. By publication of this

standard, SEMI takes no position respecting the validity

of any patent rights or copyrights asserted in connection

with any item mentioned in this standard. Users of this

standard are expressly advised that determination of

any such patent rights or copyrights, and the risk of

infringement of such rights, are entirely their own

responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI D22-1103 © SEMI 1999, 2003 1

SEMI D22-1103

TEST METHOD FOR THE DETERMINATION OF COLOR,

TRANSMITTANCE OF FPD COLOR FILTER ASSEMBLIES

This test method was technically approved by the Global Flat Panel Display Committee and is the direct

responsibility of the Japanese Flat Panel Display Committee. Current edition approved by the Japanese

Regional Standards Committee on August 8, 2003. Initially available at www.semi.org October 2003; to be

published November 2003. Originally published September 1999.

NOTICE: This document was completely rewritten in

2003.

1 Purpose

1.1 This standard establishes practices for measuring

selected characteristics of FPD color filters. These

methods are applicable to manufacturing, quality

control, and development operations.

2 Scope

2.1 This method is to be used by FPD color filter

suppliers and users to evaluate quality of products as

well as items under development.

2.2 This method shall be used in general to measure

the color characteristics and transmittance of FPD color

filter.

NOTICE: This standard does not purport to address

safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory or other limitations prior

to use.

3 Referenced Standards

3.1 SEMI Standards

SEMI D13 — Terminology for FPD Color Filter

Assemblies

3.2 CIE Standards

CIE 1931 — Standard Colorimetric System

(Colorimetry – Official Recommendations of the CIE)

CIE 1976 (L*,a*,b*) — Color Space (Recommend-

ations on Uniform Color Spaces)

NOTICE: Unless otherwise indicated, all documents

cited shall be the latest published versions.

4 Summary of Method

4.1 Turn on the apparatus, and input measurement

parameters.

1 CIE International Commission on Illumination, Kegelgasse 27, A-

1030 Vienna, Austria

4.2 Warm up and stabilize the equipment.

4.3 Measure the reference quantity of light.

4.4 Set the sample on the measuring stage, and adjust

the point of measurement into the measuring spot.

4.5 Measure the sample quantity of light.

4.6 Print the results (color characteristics and

transmittance).

5 Apparatus

5.1 The measurement system shall have the following

specifications.

5.2 Wavelength range: variable between 380 and 780

mm, in increments of < 5nm.

5.3 Measuring area: Measuring spot size or the spot

size of incident beam on the sample surface is smaller

than the sub-pixel to be measured. (for example 2 to 50

micrometer in diameter).

5.4 Sample stage:

5.4.1 Sample surface can be set normal to the incident

beam. (See Figure 1)

5.4.2 The sample stage shall have a sufficient

mechanical travel to permit measurements within the

color filter area and in the transparent area of the

substrate outside the color filter material.

Phot ometer

ht sour c

color filt er

ure 1