semi合集-English.pdf - 第4544页

SEMI D26-1000 © SEM I 2000 3 Figure 1 L-Bar Cell

SEMI D26-1000 © SEMI 2000 2

5.2 border column — The outermost column of a data

matrix code symbol. This column is a portion of the

finder pattern.

5.3 border row — The outermost row of a data matrix

code symbol. This row is a portion of the finder pattern.

5.4 cell, of a data matrix code symbol — The area

within which a dot may be placed to indicate a binary

value.

6 Ordering Information

6.1 Purchase orders for substrates furnished to this

specification shall include the following items:

Checklist:

6.2 Edge length

6.3 Long reference edge

6.4 Short reference edge

6.5 Orientation corner dimensions

6.6 Quality edge area exclusion

6.7 Thickness

6.8 Tolerance for all specified dimensions

6.9 Warp

6.10 Marking

6.10.1 Marking message characters

6.10.1.1 Quantity (46 to mm, where mm = 72)

6.10.1.2 Content of message characters related to

Customer Specification Number, and message

characters 47 and up, if present.

6.10.1.3 Location of mark, if different from Section

9.5.5

7 Requirements

7.1 Materials Specification — Substrate material shall

be specified as high thermal expansion (HTE), medium

thermal expansion (MTE), low thermal expansion

(LTE), or ultra low thermal expansion (ULTE).

Examples of HTE materials are soda lime glasses;

examples of ULTE materials are synthetic quartz

glasses. Substrate materials shall conform to thermal

expansion and optical transmittance characteristics

specified in SEMI P1. Selected physical properties of

HTE, MTE, LTE, and ULTE materials are provided for

information in SEMI P1.

7.2 Overlay — Overlay refers to alignment of the

printed pattern of one mask to another of the same set.

Overlay error shall not exceed ± 6.0 µm for soda lime

plates and ± 2.0 µm for quartz plates when plate

temperature is maintained within ± 1°C. Alignment or

registration marks per SEMI P6 may be used to

facilitate measurements.

7.3 Positional Accuracy — Relation between actual

and desired locations of a printed feature on a glass

substrate. This is a tolerance to be agreed upon by the

end user and mask designer. The following guidelines

should be used, with measurements being taken in a

temperature and humidity controlled environment:

• ± 0.0157 µm/mm/ °C for soda lime masks

• ± 0.00394 µm/mm/ °C for quartz masks

Dimensioning from a central reference point shall be

used.

7.4 Critical Dimensions (CD) — The gauging or

measurement process is fundamental to manufacturing

of masks. The purpose of this section is to define

standard CD patterns to provide consistent evaluation

and testing of micropatterning equipment, metrology

instruments and processes used in large area mask

photomask manufacturing.

7.4.1 Figures 1 and 2 are intended to illustrate the

proper layout of each pattern cell and to define

appropriate design elements used within each basic cell.

The user will determine all appropriate dimensions for

the feature as they apply to specific processing/

equipment situations.

7.4.2 L-bar cell (see Figure 1) — The L-bar cell is

designed to be a measurement site for isolated features

as well as line and space groups in orthogonal axes. The

basic cell consists of one or more groups of nested L-

shaped lines at a specific pitch. The pitch is defined as

twice the nominal feature width. The center L-bar of

each group shall extend beyond the ends of the other L-

bars by at least 10µm. This implies that the number of

bars is odd.

7.4.3 Contact array cell (see Figure 2) — The contact

array cell is designed to provide resolution and proxim-

ity effect information over a wide range of contact

sizes. The design elements will consist of a 5 × 5 con-

tact array and an isolated contact. The 5 × 5 array will

produce the maximal proximity for the center contact.

7.4.4 A label to indicate the nominal feature width

must be placed near each basic cell. The labels must be

of a clearly printable size. The details of the pattern

cells, such as the orientation, magnitude, range of line

widths and polarity of tone (clearfield vs. darkfield)

shall be defined by the user.

7.4.4.1 The target CD should closely represent the size

of the most critical feature in the end user’s process, not

necessarily the minimum feature. A reasonable

tolerance is ± 10% of the target CD.

Figure 1

L-Bar Cell

Figure 2

Contact Array Cell