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SEMI P10-0705 © SEMI 1990, 2005 117 8.1.83 CD_PITCH — Local spacing of the critical dimension fr om the center of the geom etry to the center of adjacent geometries. This will be designated by the customer as required an…

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SEMI P10-0705 © SEMI 1990, 2005 116
8.1.65 CD_GROUP_NAME — Identifies a <cd_group> to be included in the <cd_set>. The data field must match
the data field of START_CD in the referenced <cd_group>.
8.1.66 CD_HORIZONTAL_ID — CD_SITE_ID of CD_HORIZONTAL_LOCATION.
8.1.67 CD_HORIZONTAL_LOCATION — (x,y) Location of critical dimension feature. The
CD_ORIENTATION of the feature must be HORIZONTAL. If CD_HORIZONTAL_LOCATION appears in
<mask_options>, then the (x,y) coordinates are relative to the nominal center of the mask (chrome side up). If
CD_HORIZONTAL_LOCATION appears in <pattern_options>, then the (x,y) coordinates are relative to the center
of the pattern or cell, before mirroring or scaling. If CD_HORIZONTAL_LOCATION appears in <mask_results>,
then the (x,y) coordinates are relative to the nominal center of the mask (chrome side up), even if the original
CD_HORIZONTAL_LOCATION was in <pattern_options>.
8.1.68 CD_HORIZONTAL_MORPHOGRAPHY — CD_MORPHOGRAPHY of the individual
CD_HORIZONTAL_ID feature.
8.1.69 CD_HORIZONTAL_TONE_CLEAR — CD_TONE_CLEAR of the individual CD_HORIZONTAL_ID
feature.
8.1.70 CD_ISO_DENSE_REFERENCE_ONLY — (T or F) If T, indicates that the <cd_iso_dense_definition> is to
be measured and the data transmitted to the customer (if requested by SHIP_CD_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection. (This does not exempt mishandling
of the data in pattern preparation from being a cause for mask rejection.)
8.1.71 CD_ISO_DENSE_TOLERANCE — Maximum acceptable difference of the mean of all measured customer-
defined DENSE critical dimensions from the mean of all measured customer-defined ISOLATED critical
dimensions.
8.1.72 CD_ISO_GROUP — Identifies a <cd_group> for use in iso/dense analysis. Data field must match data field
of a START_CD in a <cd_group>. The <cd_group> must contain CD_MORPHOGRAPHY with data value
ISOLATED.
8.1.73 CD_LOCATION — (x,y) Location of critical dimension feature. If CD_LOCATION appears in
<mask_options>, then the (x,y) coordinates are relative to the nominal center of the mask (chrome side up). If
CD_LOCATION appears in <pattern_options>, then the (x,y) coordinates are relative to the center of the pattern or
cell, before mirroring or scaling. If CD_LOCATION appears in <mask_results>, then the (x,y) coordinates are
relative to the nominal center of the mask (chrome side up), even if the original CD_LOCATION was in
<pattern_options>.
8.1.74 CD_LOCATION_DRAWING — The uniquely identified (for each customer) document which shows the
location of the CD structure.
8.1.75 CD_MATRIX_FILE_NAME — Alphanumeric name of file to be used for critical dimension measurement
locations. It is not to be used in conjunction with CD_LOCATION within the same START_CD to END_CD set.
8.1.76 CD_MATRIX_FILE_FORMAT — (MF2, MF3, KMS and others on request)
8.1.77 CD_MEASURE_DIE — In combination with the associated <placement> definition, specifies the die to be
used for CD measurement.
8.1.78 CD_MEASUREMENT_DATE — Date CD measurement was made.
8.1.79 CD_MORPHOGRAPHY — (DENSE, ISOLATED and others on request) Feature density surrounding CD
location.
8.1.80 CD_ORIENTATION — (VERTICAL or HORIZONTAL) Direction in which the CD feature is to be
scanned for measurement. In other words, a HORIZONTAL CD is scanned in the X direction (left to right), and a
VERTICAL CD is scanned in the Y direction (top to bottom).
8.1.81 CD_PERCENT_CLEAR — Calculated percentage of clear area within CD_PERCENT_CLEAR_WINDOW
in the mask data.
8.1.82 CD_PERCENT_CLEAR_WINDOW — (x1,y1,x2,y2) window coordinates over which
CD_PERCENT_CLEAR is calculated, relative to the nominal center of the mask.
SEMI P10-0705 © SEMI 1990, 2005 117
8.1.83 CD_PITCH — Local spacing of the critical dimension from the center of the geometry to the center of
adjacent geometries. This will be designated by the customer as required and reported in <mask_results> for
analysis by the customer.
8.1.84 CD_QUALITY_ID — (text) Customer’s label for a collection of CD quality specifications, to be used only
in addition to explicit quality requirement keywords. This may be used in the data structure in addition to, but not in
place of, explicit quality requirement keywords. This may not be used in combination with QUALITY_GROUP_ID.
Customer and vendor should document the meaning of this quality grade before using it in SEMI P10.
8.1.85 CD_RANGE — Maximum acceptable variation of all measured critical dimensions of same nominal size,
same tone and same orientation, relative to each other. (See Related Information 1 at the end of this standard.)
8.1.86 CD_REFERENCE_ONLY — (T or F) If T, indicates that the CD location, <cd_group> or <cd_set>
is to be
measured and the data transmitted to the customer (if requested by SHIP_CD_DATA_), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection. (This does not exempt mishandling
of the data in pattern preparation from being a cause for mask rejection.)
8.1.87 CD_SITE_ID — Unique alphanumeric identifier of each critical dimension location within MASK_SET_ID
to identify individual cd locations when using <mask_results>. If the same coordinates apply to locations on
different masks within the mask set, they may have the same CD_SITE_ID, but it is not mandatory. If
CD_SITE_ID is used with a CD_LOCATION within a <pattern_options>, it will be associated with as many mask
locations as the cell has instances. (See MEASURED_CD_SITE_ID for more information.)
8.1.88 CD_STD — (NBS, NIST, ROGER_SHERMAN, CUSTOMER, and others on request) reference standard to
be used to correlate critical dimension measurements.
8.1.89 CD_TARGET — Desired final size of critical dimension feature on mask. (See Related Information 1 at the
end of this standard.)
8.1.90 CD_THREE_SIGMA — Maximum acceptable 3-sigma deviation of all measured critical dimensions to the
mean of all measured critical dimensions. (See Related Information 1 at the end of this standard.)
8.1.91 CD_TOLERANCE — Maximum acceptable deviation of the mean of all measured critical dimensions to the
CD_TARGET. (See Related Information 1 at the end of this standard.)
8.1.92 CD_TONE_CLEAR — (T or F) If T, critical dimension feature on mask is clear.
8.1.93 CD_VERTICAL_ID — CD_SITE_ID of CD_VERTICAL_ID.
8.1.94 CD_VERTICAL_LOCATION — (x,y) Location of critical dimension feature. The CD_ORIENTATION of
the feature must be VERTICAL. If CD_VERTICAL_LOCATION appears in <mask_options>, then the (x,y)
coordinates are relative to the nominal center of the mask (chrome side up). If CD_VERTICAL_LOCATION
appears in <pattern_options>, then the (x,y) coordinates are relative to the center of the pattern or cell, before
mirroring or scaling. If CD_VERTICAL_LOCATION appears in <mask_results>, then the (x,y) coordinates are
relative to the nominal center of the mask (chrome side up), even if the original CD_VERTICAL_LOCATION was
in <pattern_options>.
8.1.95 CD_VERTICAL_MORPHOGRAPHY — CD_MORPHOGRAPHY of the individual CD_VERTICAL_ID
feature.
8.1.96 CD_VERTICAL_TONE_CLEAR — CD_TONE_CLEAR of the individual CD_VERTICAL_ID feature.
8.1.97 CD_X_GROUP — Identifies a <cd_group> for use in comparing horizontally scanned critical dimensions to
a vertically scanned critical dimensions. Data field must match data field of a START_CD in a <cd_group>. The
<cd_group> must contain CD_ORIENTATION with data value HORIZONTAL.
8.1.98 CD_Y_GROUP — Identifies a <cd_group> for use in comparing horizontally scanned critical dimensions to
a vertically scanned critical dimensions. Data field must match data field of a START_CD in a <cd_group>. The
<cd_group> must contain CD_ORIENTATION with data value VERTICAL.
8.1.99 CD_XY_DEVIATION — Maximum deviation, on a site-by-site basis, of a horizontally scanned critical
dimension to a vertically scanned critical dimension within a <cd_xy_definition>. The two critical dimensions at
each <cd_xy_site> site must be the same size in the pattern data and the same tone on the mask. (See Related
Information 1 at the end of this standard.)
SEMI P10-0705 © SEMI 1990, 2005 118
8.1.100 CD_XY_REFERENCE_ONLY — (T or F) If T, indicates that the <cd_xy_definition> is to be measured
and the data transmitted to the customer (if requested by SHIP_CD_DATA), but that deviations in its measured
value due to mask processing would NOT be cause for mask rejection. (This does not exempt mishandling of the
data in pattern preparation from being a cause for mask rejection.)
8.1.101 CD_XY_TOLERANCE — Maximum acceptable deviation of the mean of all measured horizontally
scanned critical dimensions to the mean of all measured vertically scanned critical dimensions within a
<cd_xy_definition> and/or between the sites in {CD_X_GROUP} and the sites in {CD_Y_GROUP}. Critical
dimensions at all sites must be the same size in the pattern data and the same tone on the mask. (See Related
Information 1 at the end of this standard.)
8.1.102 CELL_ID — Name of the cell which follows; must be used in all references within this MASK_SET_ID to
this cell definition.
8.1.103 CELL_INSTANCE — (text) Identifies CELL_ID to be placed by the following location information.
8.1.104 CELL_REGISTR_MARK — (x,y) Location of registration reference mark in <mask_order> data, relative
to center of the cell (before mirroring or scaling).
8.1.105 CENTRALITY — (x,y,rotation)
Maximum misplacement in millimeters and, optionally, microradians of
all patterns as a group, relative to the nominal center of the mask.
8.1.106 CHECKSUM — For <mask_order>, an ASCII 16 bit crc checksum encompassing all records from
START_ORDER through END_ORDER, inclusive. For <mask_results>, an ASCII 16 bit crc checksum
encompassing all records from START_MASK_RESULTS through END_MASK_RESULTS, inclusive. (See
COMPUTING THE CHECKSUM, §9.)
8.1.107 CLEAR_INTERNAL_WINDOW — (x1,y1,x2,y2) Area to have all digitized data removed within the
window described by (x1,y1,x2,y2), relative to the coordinate space of DATA_SOURCE_FILE. The extents of the
output pattern file will be the same as DATA_SOURCE_FILE.
8.1.108 COAT_DATE_TIME – (date) The date and time that the coating was applied by the mask vendor.
8.1.109 COAT_EQUIP_USED – (text) The model identification of the equipment used by the mask vendor to
apply the coating.
8.1.110 COATING_COMPOSITION – (text) The name used to identify the composition of the coating, for
example IP3500, MoSi, AR3, etc., as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or
mask vendor if MASK_VENDOR_APPLIED = T.
8.1.111 COATING_GRADE — Supplier grade of MASK_COATING applied to the substrate to build the
photomask. Text to be agreed by customer/vendor to suit the specific requirement.
8.1.112 COATING_LOT_NUMBER — (text) The lot number supplied by the mask blank vendor for a particular
coating such as the photoresist. Also known as “Resist Lot” or “Bake Lot”.
8.1.113 COATING_MASK_VENDOR_APPLIED — (T or F) If T, the coating was applied by the mask vendor.
8.1.114 COATING_OPTICAL_DENSITY — (number) A measure of the transmittance through the given coating
as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask vendor if
MASK_VENDOR_APPLIED = T. Optical density equals the log to the base 10 of the reciprocal of the
transmittance
8.1.115 COATING_PHASE — (number) The angle in degrees that light is shifted by the given coating as specified
by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask vendor if MASK_VENDOR_APPLIED =
T.
8.1.116 COATING_REFLECTANCE — (number) For a given coating, the ratio of the reflected flux to the incident
flux expressed as a percent, as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask
vendor if MASK_VENDOR_APPLIED = T.
8.1.117 COATING_THICKNESS — (number) The thickness of the coating in Angstroms as specified by the mask
blank vendor if MASK_VENDOR_APPLIED = F, or mask vendor if MASK_VENDOR_APPLIED = T.