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SEMI E108-0301 © SEMI 2001 1 SEMI E108-0301 TEST METHOD FOR THE A SSESSM ENT OF OUTGA SSING ORG A NIC CONTAMINATION FROM MI NIENVIRONMENTS USING GAS CHROM A TOGR A PHY/M A SS SPECTROSCOPY This test method was tec hnicall…

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SEMI E106-1104 © SEMI 2000, 2004 11
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SEMI E108-0301 © SEMI 20011
SEMI E108-0301
TEST METHOD FOR THE ASSESSMENT OF OUTGASSING ORGANIC
CONTAMINATION FROM MINIENVIRONMENTS USING GAS
CHROMATOGRAPHY/MASS SPECTROSCOPY
This test method was technically approved by the Global Metrics Committee and is the direct responsibility
of the European Equipment Automation Committee. Current edition approved by the European Regional
Standards Committee on December 20, 2000. Initially available at www.semi.org February 2001; to be
published March 2001.
1 Purpose
1.1 The purpose of this standard is to define a test
method for the determination of the outgassing organic
contamination from minienvironments used for storage
and transport of wafers using gas chromatography/mass
spectroscopy (GC/MS).
1.2 This test method is intended as an alternative to
SEMI E46. The main difference between SEMI E46
and this document is that SEMI E46 defines a test
method which is based on ion mobility spectroscopy
(IMS) as the measurement technique while this
standard is based on gas chromatography/mass
spectroscopy in combination with thermal desorption.
Additionally, this test method provides a procedure for
testing the outgassing of organic compounds in a
complete minienvironment. The results of SEMI E46
and this document are given in different units.
2 Scope
2.1 The test method provided in th is document is
applicable to the assessment of the outgassing of
organic contamination from minienvironments.
2.2 Gas chromatography/mass spe ctroscopy is chosen
as the method to determine organic contamination
because it is commonly used for characterization and
quantification of organic compounds. In combination
with thermal desorption, it provides a method for the
identification of organic compounds in the atmosphere
(i.e., inside the minienvironment) as well as directly
from source materials, and transferred contaminants.
This method can also be used to evaluate materials and
processes used in semiconductor industry.
2.3 This test method is based on ASTM F1982.
2.4 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety health practices and determine the
applicability or regulatory limitations prior to use.
3 Limitations
3.1 The test methodologies, metric s and applications
provided in this standard are limited by the following
constraints:
3.1.1 The specific recovery of comp ounds by the
proposed standard method strongly depends on the
setup of the apparatus used. This has been taken into
account by the use of the “reference-cocktail”, see
Section 9.2.
3.2 Identification of the source of organic compounds
inside the minienvironment is out of the scope of this
test method. For a procedure for the analysis of
outgassing organic compounds from individual
materials using gas chromatography/mass spectroscopy,
see IDEMA M11-99.
3.3 This test method does not prov ide a procedure how
to use the obtained data for assessing the risks that
come from individual compounds.
4 Referenced Standards
4.1 SEMI Standards
SEMI E46 — Test Method for the Determination of
Organic Contamination from Minienvironments
SEMI F21 — Classification of Airborne Molecular
Contaminant Levels in Clean Environments
4.2 ASTM Standard
1
ASTM F1982 — Standard Test Methods for Analyzing
Organic Contaminants on Silicon Wafer Surfaces by
Thermal Desorption Gas Chromatography.
4.3 IDEMA Standard
2
IDEMA M11-99 — General Outgas Test Procedure by
Dynamic Headspace Analysis
1 American Society for Testing and Materials, 100 Barr Harbor
Drive, West Conshohocken, PA 19428-2959, website: www.astm.org
2 International Disk Drive Equipment and Materials Association,
3255 Scott Blvd., Suite 2-102, Santa Clara, CA 95054-3013, website:
www.idema.org
SEMI E108-0301 © SEMI 2001 2
NOTE 1: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
5 Terminology
5.1 analytical environment environment where all
analytical measurements are taking place.
5.2 headspace sampling — in this standard defined as:
collecting volatile organic compounds in an enclosed
volume by means of a silicon wafer or silicon wafer
chips.
5.3 minienvironment — A localized environment for
transport and storage created by an enclosure to isolate
the product from contamination and people.
5.4 sample — wafer or wafer chip s used for the
headspace sampling of organic contaminants.
5.5 static storage conditions — co nditions excluding
any active movement of test specimens.
5.6 thermal desorption tube — Analytical equipment
capable of collecting organic compounds of interest
(i.e., adsorbent filled glass tube).
5.7 wafer — Object made of semiconducting material
to be processed, handled or stored in the
minienvironment to be tested (i.e., prime or processed
silicon wafer).
6 Summary of Method
6.1 This test method comprises sto rage tests of wafers
in minienvironments under static storage conditions.
The contamination is directly measured from the silicon
wafer surface. Three important aspects are covered:
a) Contamination due to the minienvironment alone,
b) Contamination from the use of minienvironments for
wafer processing, and
c) Contamination from future materials to be used in
semiconductor technology.
6.2 The setup for each test compri ses an analytical
equipment in the analytical environment as well as a
test equipment in the test environment. Each
environment has to fulfill the following requirements:
6.2.1 Analytical Environment — shall be clean enough
with respect to airborne organic contamination:
recommendation is less than 100 pptM for organic
compounds with boiling points > 150°C (Class MC-
100, according to SEMI F21).
6.2.2 Test Environment — shall equ al the environment
in which the test specimen will be used.
6.3 Silicon wafers are placed in the minienvironment
or used for headspace sampling experiments. These
wafer samples are then analyzed by gas chromatogra-
phy/mass spectrometry to determine the amount of
contaminants.
6.4 The wafers or wafer chips to b e used for the test
method are decontaminated as described in ASTM
F1982 for bare silicon wafers. The surface condition of
the wafer (hydrophobic or hydrophilic) has to be
adjusted in a reproducible way and has to be the same
for all comparative measurements.
6.5 The wafer or the wafer chips are placed in the
minienvironment and are left there under static
conditions for the chosen static storage time (depending
on the intended use of the minienvironment to be tested,
a time between 1 h and 28 d may be used). When
loaded into the minienvironment the wafer may have a
temperature which reflects production circumstances
(i.e., 80°C when unloading from furnace processes). In
some situations wafers may be exposed to severe
thermal conditions. The minienvironment should be
evaluated under the conditions exposed to. Be sure that
the material to be tested does not undergo phase
transitions under the chosen temperature conditions.
6.6 After the static storage test per iod, the wafer is
returned to the analytical equipment and the organic
contamination on the wafer is measured immediately.
6.7 The quantitative value for the total amount of
outgassed and adsorbed organics from the minienviron-
ment is calculated as the difference between the
detected amount of contamination on a blank sample
vs. the amount on the exposed sample.
7 Interferences
7.1 The presence of organic conta mination in the
atmosphere of the test environment may lead to a
significant contribution to the detected total amount of
organic compounds on the test wafers or wafer chips.
Care has to be taken when subtracting the blank value
from the test value. Transport times from test
environment to analytical environment have to be as
short as possible.
8 Apparatus
8.1 For the analysis of organic compounds on wafers a
gas chromatography/mass spectroscopy apparatus with
thermal desorption unit is required: A gas
chromatography (GC) instrument, which utilizes a
capillary column to separate a wide variety of organic
compounds, combined with mass spectrometer (MS). A
thermal desorption unit is used to desorb organics from
sample thermal desorption tubes and collect them in a
trap. Two types of trapping may be used: