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SEMI E107-1102 © SEMI 2001, 2002 15 NOTICE: SEMI makes no warranties or representations as to the suitability o f the standards set forth herein for any particular application. The determination of the suitability o f th…

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SEMI E107-1102 © SEMI 2001, 2002 14
Table R1-2 Attributes Used for FailBitData
Item Name Item or Attribute Define In Mandatory and Optional Relation Items
Seq Attribute Map Data Items Mandatory ---
XAddress Attribute Map Data Items Mandatory WaferLocation
YAddress Attribute Map Data Items Mandatory WaferLocation
XMin Attribute Map Data Items Mandatory DieCoordinate
XMax Attribute Map Data Items Mandatory DieCoordinate
YMin Attribute Map Data Items Mandatory DieCoordinate
YMax Attribute Map Data Items Mandatory DieCoordinate
XCenter Attribute Map Data Items Mandatory DieCoordinate
YCenter Attribute Map Data Items Mandatory DieCoordinate
XSize Attribute Map Data Items Mandatory DieCoordinate
YSize Attribute Map Data Items Mandatory DieCoordinate
Area Attribute Map Data Items Mandatory DieCoordinate
DefectCate Attribute Map Data Items Mandatory ErrorClassList
XMinPhysic Attribute Map Data Items Mandatory DieCoordinate
XMaxPhysic Attribute Map Data Items Mandatory DieCoordinate
YMinPhysic Attribute Map Data Items Mandatory DieCoordinate
YMaxPhysic Attribute Map Data Items Mandatory DieCoordinate
IoNumber Attribute Map Data Items Mandatory DieCoordinate
XMinLogic Attribute Map Data Items Mandatory DieCoordinate
XMaxLogic Attribute Map Data Items Mandatory DieCoordinate
YMinLogic Attribute Map Data Items Mandatory DieCoordinate
YMaxLogic Attribute Map Data Items Mandatory DieCoordinate
Table R1-3 Attributes Used for AnalogData
Item Name Item or Attribute Define In Mandatory and Optional Relation Items
XAddress Attribute Map Data Items Mandatory WaferLocation
YAddress Attribute Map Data Items Mandatory WaferLocation
TestNumber Attribute Map Data Items Mandatory ---
Note Attribute Map Data Items Optional ---
Measure Attribute Map Data Items Optional ---
MeasureUnit Attribute Map Data Items Optional ---
Std Attribute Map Data Items Optional ---
Parameter Attribute Map Data Items Optional ---
ParameterUnit Attribute Map Data Items Optional ---
UpperLimitData Attribute Map Data Items Optional ---
LowerLimitData Attribute Map Data Items Optional ---
TestResult Attribute Map Data Items Optional ---
SEMI E107-1102 © SEMI 2001, 2002 15
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacture' s instructions, product labels,
product data sheets, and other relevant literature,
respecting any materials or equipment mentioned
herein. These standards are subject to change without
notice.
By publications of this standard, Semiconductor
Equipment and Materials International (SEMI) takes no
position respecting the validity of any patent rights or
copyrights asserted in connection with any items
mentioned in this standard. Users of this standard are
expressly advised that determination of any such patent
rights or copyrights, and the risk of infringement of
such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI E109-0305 © SEMI 2001, 2005 1
SEMI E109-0305
SPECIFICATION FOR RETICLE AND POD MANAGEMENT (RPMS)
This specification was technically approved by the Global Information & Control Committee and is the direct
responsibility of the North American Information & Control Committee. Current edition approved by the
North American Regional Standards Committee on December 10, 2004. Initially available at www.semi.org
February 2005; to be published March 2005. Originally published July 2001; previously published
November 2004.
1 Purpose
1.1 This document provides standardized behavior for lithography, reticle inspection, and bare reticle stocker
equipment. It also provides for standardized communication with lithography, reticle inspection, and bare reticle
stocker equipment. This includes the coordination, execution, and completion of automated and manual reticle pod
transfers to and from the equipment, transfer of reticles to and from the reticle pods, movement of the reticles within
the equipment, identification and verification of both reticle pods and reticles, inspection and qualification of
reticles, and other relevant information such as tracking reticle usage.
2 Scope
2.1 This is a standard that covers host and equipment communication for equipment that handles reticles. This only
includes equipment that handles reticles both in and outside of a reticle pod.
2.2 The scope of this document is to define standards that facilitate the host’s knowledge and role in automated and
manual reticle pod transfers, reticle transfers to and from the reticle pod, internal reticle movement, identification
and verification of ReticleID, inspection and qualification of reticles, and tracking reticle usage. Specifically, this
document provides state models and scenarios that define the host interaction with the equipment for the following:
Reticle pod transfer between AMHS vehicles and production equipment, bare reticle stockers, and reticle
inspection equipment reticle load ports.
Reticle transfers to/from lithography production equipment internal reticle library space.
Equipment and reticle load port access mode switching.
Reticle Pod to load port association.
Reticle Pod ID verification and Reticle Pod slot map verification.
NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
3 Limitations
3.1 This standard applies to semiconductor equipment that handles reticles and reticle carriers. This standard is
intended to be used for lithography production, bare reticle storage, and reticle inspection equipment. It may or may
not be applied to other types of equipment.
4 Referenced Standards
4.1 SEMI Standards
SEMI E15 — Specification for Tool Load Port
SEMI E30 — Generic Model for Communications and Control of Manufacturing Equipment (GEM)
SEMI E39 — Object Services Standard: Concept, Behavior, and Services
SEMI E41 — Exception Management (EM) Standard
SEMI E53 — Event Reporting