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SEMI D26-1000 © SEMI 2000 2 5.2 bor der column — The outerm o s t col umn of a data matrix code symbol. This column is a p ortion of the finder pattern. 5.3 bor der row — The outermost r o w o f a data matrix code sym bo…

SEMI D26-1000 © SEMI 20001

SEMI D26-1000

PROVISIONAL SPECIFICATION FOR LARGE AREA MASKS FOR FLAT

PANEL DISPLAYS (NORTH AMERICA)

This specification was technically approved by the Global Flat Panel Display Committee and is the direct

responsibility of the North American Flat Panel Display Committee. Current edition approved by the North

American Regional Standards Committee on July 14, 2000. Initially available on SEMI OnLine August

2000; to be published October 2000.

1 Purpose

1.1 This specification establishes a set of standards to

assist in specifying and ordering large area masks for

the Flat Panel Display industry. A major objective is to

improve the cycle time, order process efficiency and

reduce the overall cost of manufacturing for both the

mask maker and the customer.

1.2 This specification is intended for use in North

America as an emerging market. However, the

applicability of this specification is not restricted or

limited to this region alone. This standard was

developed to address a North American need for a

common set of requirements for specifying,

manufacturing, and ordering large area masks.

2 Scope

2.1 The following areas are covered by this document:

2.1.1 Registration and Accuracy

2.1.2 Critical Dimensions

2.1.3 Centrality

2.1.4 Pellicles

2.1.5 Edge Length and Thickness

2.1.6 Symbology

2.1.7 Data Formats

2.1.8 Auto Inspection Artifacts

2.1.9 Product Labeling

2.2 This specification is being issued so that the

industry may evaluate the concept covered before its

adoption as a full standard. It is expected that initial

application will occur mostly in North America,

however, nothing in this standard limits its use to this

market region.

2.3 This standard does not purport to address safety

issues, if any, associated with its use. It is the

responsibility of the user of these standards to establish

appropriate safety and health practices and determine

the applicability of regulatory limitations prior to use.

3 Limitations

3.1 The document does not seek to be comprehensive.

Instead, the areas listed are meant to help move the

current industry towards an agreed upon set of

standards that are useful in reducing the overall cost of

supplying masks for use by FPD manufacturers. The

document only describes 1X full field masks up to 620

× 720 mm for all display types except for Plasma, TN

and STN LCD technologies.

4 Referenced Standards

NOTE: As listed or revised, all documents cited shall be the

latest publications of adopted standards.

4.1 SEMI Standards

SEMI D6 — Specification for Edge Length and

Thickness for Flat Panel Display Mask Substrates

SEMI P1 — Specification for Hard Surface Photomask

Substrates

SEMI P5 — Specification for Pellicles

SEMI P6 — Specification for Registration Marks for

Photomasks

SEMI T8 — Specification for Marking of Glass Flat

Panel Display Substrates with a Two-Dimensional

Matrix Code Symbol

4.2 AIM International Technical Specifications

AIM International Symbology Specification – Data

Matrix

5 Terminology

Each section of the document defines the terms used in

that section, with the exception of:

5.1 alignment bar, of a data matrix symbol — A solid

line of contiguous filled cells abutting a line of

alternatively filled and empty cells (AIM International

Symbology Specification Data Matrix)

1 AIM International Inc., 11860 Sunrise Valley Drive, Suite 100,

Reston, VA 20191, tel y703.391.7621, fax 703.391.7624

SEMI D26-1000 © SEMI 2000 2

5.2 border column — The outermost column of a data

matrix code symbol. This column is a portion of the

finder pattern.

5.3 border row — The outermost row of a data matrix

code symbol. This row is a portion of the finder pattern.

5.4 cell, of a data matrix code symbol — The area

within which a dot may be placed to indicate a binary

value.

6 Ordering Information

6.1 Purchase orders for substrates furnished to this

specification shall include the following items:

Checklist:

6.2 Edge length

6.3 Long reference edge

6.4 Short reference edge

6.5 Orientation corner dimensions

6.6 Quality edge area exclusion

6.7 Thickness

6.8 Tolerance for all specified dimensions

6.9 Warp

6.10 Marking

6.10.1 Marking message characters

6.10.1.1 Quantity (46 to mm, where mm = 72)

6.10.1.2 Content of message characters related to

Customer Specification Number, and message

characters 47 and up, if present.

6.10.1.3 Location of mark, if different from Section

9.5.5

7 Requirements

7.1 Materials Specification — Substrate material shall

be specified as high thermal expansion (HTE), medium

thermal expansion (MTE), low thermal expansion

(LTE), or ultra low thermal expansion (ULTE).

Examples of HTE materials are soda lime glasses;

examples of ULTE materials are synthetic quartz

glasses. Substrate materials shall conform to thermal

expansion and optical transmittance characteristics

specified in SEMI P1. Selected physical properties of

HTE, MTE, LTE, and ULTE materials are provided for

information in SEMI P1.

7.2 Overlay — Overlay refers to alignment of the

printed pattern of one mask to another of the same set.

Overlay error shall not exceed ± 6.0 µm for soda lime

plates and ± 2.0 µm for quartz plates when plate

temperature is maintained within ± 1°C. Alignment or

registration marks per SEMI P6 may be used to

facilitate measurements.

7.3 Positional Accuracy — Relation between actual

and desired locations of a printed feature on a glass

substrate. This is a tolerance to be agreed upon by the

end user and mask designer. The following guidelines

should be used, with measurements being taken in a

temperature and humidity controlled environment:

• ± 0.0157 µm/mm/ °C for soda lime masks

• ± 0.00394 µm/mm/ °C for quartz masks

Dimensioning from a central reference point shall be

used.

7.4 Critical Dimensions (CD) — The gauging or

measurement process is fundamental to manufacturing

of masks. The purpose of this section is to define

standard CD patterns to provide consistent evaluation

and testing of micropatterning equipment, metrology

instruments and processes used in large area mask

photomask manufacturing.

7.4.1 Figures 1 and 2 are intended to illustrate the

proper layout of each pattern cell and to define

appropriate design elements used within each basic cell.

The user will determine all appropriate dimensions for

the feature as they apply to specific processing/

equipment situations.

7.4.2 L-bar cell (see Figure 1) — The L-bar cell is

designed to be a measurement site for isolated features

as well as line and space groups in orthogonal axes. The

basic cell consists of one or more groups of nested L-

shaped lines at a specific pitch. The pitch is defined as

twice the nominal feature width. The center L-bar of

each group shall extend beyond the ends of the other L-

bars by at least 10µm. This implies that the number of

bars is odd.

7.4.3 Contact array cell (see Figure 2) — The contact

array cell is designed to provide resolution and proxim-

ity effect information over a wide range of contact

sizes. The design elements will consist of a 5 × 5 con-

tact array and an isolated contact. The 5 × 5 array will

produce the maximal proximity for the center contact.

7.4.4 A label to indicate the nominal feature width

must be placed near each basic cell. The labels must be

of a clearly printable size. The details of the pattern

cells, such as the orientation, magnitude, range of line

widths and polarity of tone (clearfield vs. darkfield)

shall be defined by the user.

7.4.4.1 The target CD should closely represent the size

of the most critical feature in the end user’s process, not

necessarily the minimum feature. A reasonable

tolerance is ± 10% of the target CD.

Figure 1

L-Bar Cell