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SEMI P1-1101 © SE MI 1981, 2001 1 SEMI P1-1101 SPECIFICA TION FOR HARD SURFACE PHOTOMASK SUBSTRA TES This spe cification w as technically approved by the G lobal Micropattern ing Committee a nd is the direct responsi bil…

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SEMI INTERNATIONAL STANDARDS
MICROLITHOGRAPHY
Semiconductor Equipment and Materials International
SEMI P1-1101 © SEMI 1981, 20011
SEMI P1-1101
SPECIFICATION FOR HARD SURFACE PHOTOMASK SUBSTRATES
This specification was technically approved by the Global Micropatterning Committee and is the direct
responsibility of the North American Micropatterning Committee. Current edition approved by the Japanese
Regional Standards Committee on August 3, 2001. Initially available at www.semi.org September 2001; to
be published November 2001. Originally published in 1981; previously published February 1999.
1 Purpose
1.1 This specification covers the general requirements
of the glass substrate for hard surface photomasks.
2 Scope
2.1 This document covers square photomasks up to 7
inches in length. 230 mm substrates are excluded from
this standard and can be found in SEMI P33.
2.2 This document also gives specifications for the
following materials:
• High Thermal Expansion (HTE),
• Medium Thermal Expansion (MTE),
• Low Thermal Expansion (LTE),
• Ultra Low Thermal Expansion (ULTE)
• Durable Fused Silica (DFS) glass for 193 nm
wavelength
• Modified Fused Silica (MFS) glass for 157 nm
wavelength.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety health practices and determine the
applicability or regulatory limitations prior to use.
3 Referenced Standards
3.1 SEMI Standards
SEMI P33 — Provisional Specification for Develop-
mental 230 mm Square Hard Surface Photomask
Substrates
3.2 ASTM Standards
1
ASTM E 228 — Test for Linear Thermal Expansion of
Rigid Solids with a Vitreous Silical Dilatometer
1 American Society for Testing and Materials, 100 Barr Harbor
Drive, West Conshohocken, Pennsylvania 19428-2959, USA.
Telephone: 610.832.9585, Fax: 610.832.9555 Website:
www.astm.org
3.3 ANSI/ASQC Standards
2
ANSI/ASQC Z1.4 — Sampling Procedures and Tables
for Inspection by Attributes
3.4 ISO Standard
3
ISO 14644-1 — Cleanrooms and Associated Controlled
Environments Part 1: Classification of Air Cleanliness
4 Terminology
4.1 Selected terms relating to photomasking are given
for information only in “Terms and Definitions
Relating to the Microlithography Industry” found at the
end of SEMI P33 “RELATED INFORMATION”.
Definitions may be found in what was ASTM F 127.
5 Ordering Information
5.1 Purchase orders for hard surface photomask
substrates furnished to this specification shall include
the following:
5.1.1 Nominal edge length, nominal thickness
dimension, and edge criteria (see Section 6);
5.1.2 Material (see Section 7);
5.1.3 Flatness quality area and flatness (Total Indicated
Reading, T.I.R.) see Section 8);
5.1.4 Visual quality area and defect limits (see Section
9); and
5.1.5 Lot acceptance criteria (see Section 10).
6 Dimensions and Permissible Variations
6.1 The square substrates shall conform to the
dimensional tolerances appropriate to the nominal edge
length and thickness as listed in Table 1. Dimensions
are illustrated in Figure 1 and a fixture for measuring
the diagonal dimensions is shown in Figure 2.
6.2 Substrates shall have chamfered or rounded edges.
The edges shall conform to the dimensional tolerances
2 American Society for Quality Control, 611 East Wisconsin
Avenue, Milwaukee, WI 53202, USA
3 International Organization for Standardization, ISO Central
Secretariat, 1, rue de Varembé, Case postale 56, CH-1211 Geneva 20,
Switzerland. Telephone: 41.22.749.01.11; Fax: 41.22.733.34.30
Website: www.iso.ch
SEMI P1-1101 © SEMI 1981, 2001 2
appropriate to the nominal thickness listed in Table 2.
Dimensions are illustrated in Figures 3 and 4.
7 Material Specifications
7.1 Substrate materials shall be specified as high
thermal expansion (HTE), medium thermal expansion
(MTE), low thermal expansion (LTE), ultra low
thermal expansion (ULTE), durable fused silica (DFS),
or modified fused silica (MFS). Examples of HTE
materials are white crown and soda lime glasses, of
MTE materials are borosilicate and aluminosilicate
glasses, of LTE materials are aluminosiliate glasses,
and of ULTE, DFS, and MFS materials are quartz
(silica).
7.2 Substrate materials shall conform to thermal
expansion and optical transmittance characteristics
specified in Table 3.
7.2.1 DFS shall maintain the transmittance given in
Table 3 within 0.3% change at least accumulated
dosage of 100 kJ/cm
2
of 193 nm wavelength irradiation.
7.3 Selected physical properties of HTE, MTE, LTE,
ULTE, DFS, and MFS materials are provided for
information only in Appendix 1.
8 Flatness Specifications
8.1 Substrates shall be supplied with one side having a
flatness (TIR) of 0.25, 0.5, 1, 2, 5, 10, or 20 µm over a
circular or square quality flatness area as defined in
Figures 5 and 6.
9 Visual Criteria
9.1 A visual quality area, which may or may not
correspond with the flatness area, shall be agreed upon
between the user and supplier.
9.2 Each plate shall not have more defects than listed
in Table 4. This table includes limits for the following
types of defects:
9.2.1 Internal defects in the quality area,
9.2.2 Frontside surface defects,
9.2.3 Backside surface defects, and
9.2.4 Defects outside the quality area.
9.3 Glass substrates shall be identified with notches on
the backside corner as shown in Figure 7. Soda lime
and white crown (HTE) glasses are marked with one
corner notch (Figure 7a). Borosilica and Alumino-
silicate (MTE) glasses are marked with three corner
notches (Figure 7b). Aluminosilica (LTE) glass is
marked with two adjacent corner notches (Figure 7c).
Quartz (ULTE) is marked with two diagonal corner
notches (Figure 7d). Quartz (DFS) is marked with one
corner notch (Figure 7e), that is the same as specified
for HTE. Quartz (MFS) is marked with one non-
isosceles triangle
corner notch (Figure 7f). Dimensions
of notches shall be as specified in Figure 8. If desired,
and so specified in the contract or order, notches are
positioned to identify the squareness origin corner.
10 Sampling
10.1 Unless otherwise specified, appropriate sample
sizes shall be selected from each lot in accordance with
ANSI/ASQC Z1.4. Each quality characteristic shall be
assigned an acceptable quality level (AQL) in
accordance with ANSI/ASQC Z1.4 definitions for
critical, major, and minor classifications. If desired, and
so specified in the contract or order, each of these
classifications may alternatively be assigned cumulative
AQL values. Inspection levels shall be agreed upon
between user and supplier.
11 Test Methods
11.1 Thermal Expansion — Determine in accordance
with ASTM E 228.
11.2 Transmission (to be agreed upon between user
and supplier).
11.3 Irradiation durability (to be agreed upon between
user and supplier).
11.4 Flatness (to be agreed up between user and
supplier).
11.5 Visual (to be agreed upon between user and
supplier).
12 Handling
12.1 Substrates are to be handled on the edges only.
Substrates are to be handled with gloves approved for
cleanroom use.
13 Certification
13.1 Upon request of the purchaser in the contract or
order, a manufacturer's or supplier's certification that
the material was manufactured and tested in accordance
with this specification, together with a report of the test
results, shall be furnished at the time of shipment.