semi合集-English.pdf - 第5045页
SEMI M18-0704 © SEMI 1990, 2004 31 Line Item EDI Code ID Sub Param ID 13.10 Edge Chips 100145 13.11 Edge Crown 100146 13.12 Haze 100147 13.13 Foreign Matter 100148 14.1 Contamination 100149 16.1 Mask ID 100150 16.2 Align…
SEMI M18-0704 © SEMI 1990, 2004 30
Line Item EDI Code ID Sub Param ID
8.13 Orange Peel 100099
8.14 Saw Marks 100100
8.15 Dopant Striation Rings 100101
8.16 Stains 100102
9.01 Back Surface Visual Inspection Specified According to SEMI M1 Table 1 100103
9.1 Edge Chips 100104
9.2 Cracks, Crow’s Feet 100105
9.3 Contamination/Area 100106
9.4 Saw Marks 100107
9.5 Stains 100108
9.6 Roughness 100109
9.7 Brightness 100110
11.1 Conductivity Type/Structure 100111
11.2 Dopant 100112
11.3 Silicon Source Gas 100113
11.4 Growth Method 100114
11.5 Net Carrier Density (Resistivity) 100115
11.6 Net Carrier Density Variation 100116
11.7 Thickness 100117
11.8 Thickness Variation 100118
11.9 Transition Width 100119
11.10 Flat Zone 100120
11.11 Phantom Layer 100121
12.1 Bow 100122
12.2 Warp Method 100123 SEMI MF657
12.2 Warp Method 100124 SEMI MF1390
12.3 Sori 100125
12.4 Flatness/Global 100126
12.5 Flatness/Site 100127 SF3R
12.5 Flatness/Site 100128 SF3D
12.5 Flatness/Site 100129 SFLR
12.5 Flatness/Site 100130 SFLD
12.5 Flatness/Site 100131 SFQR
12.5 Flatness/Site 100132 SFQD
12.5 Flatness/Site 100134 SBIR
13.01 Epi Front Surface Visual Inspection
Specified According to SEMI M2 Table 1 or SEMI M11 Table 1
100135
13.1 Stacking Faults 100136
13.2 Slip 100137
13.3 Large Point Defects 100138
13.4 Total Points Defects 100139
13.5 Scratches 100140
13.6 Dimples 100141
13.7 Orange Peel 100142
13.8 Cracks/Fractures 100143
13.9 Crow’s Feet 100144
SEMI M18-0704 © SEMI 1990, 2004 31
Line Item EDI Code ID Sub Param ID
13.10 Edge Chips 100145
13.11 Edge Crown 100146
13.12 Haze 100147
13.13 Foreign Matter 100148
14.1 Contamination 100149
16.1 Mask ID 100150
16.2 Alignment Precision 100151
16.3 Pattern Line Width Tolerance 100152
17.1 Dopant 100153
17.2 Diffusion Depth (xj) 100154
17.3 Sheet Resistance 100155
17.4 Pattern Step Height 100156
17.5 Defect Density (Before Epi) 100157
18.1 Pattern Shift Ratio 100158
18.2 Pattern Distortion Ratio 100159
6.14 Flatness/Site 100160 SFSR
12.5 Flatness/Site 100161 SFSR
4.9
Interstitial Oxygen Reduction (∆Oi)
100162
6.15 Fixed Quality Area 100164
10.1 Bulk defects by X-ray topography 100169
12.6 Fixed Quality Area 100172
9.8 Scratches – macro 100165
9.9 Scratches – micro 100166
9.10 Localized Light Scatterers (LLS)
4
100167
9.10 Localized Light Scatterers (LLS)
4
100168
11.01 [ ] Specified According to SEMI M11 Table [ ] 100170
12.01 [ ] Specified According to SEMI M11 Table [ ] 100171
13.14 Localized Light Scatterers (LLS)
4
100173 ≥ 0.50µ
13.14 Localized Light Scatterers (LLS)
4
100174 ≥ 0.30µ
13.14 Localized Light Scatterers (LLS)
4
100175 ≥ 0.20µ
13.14 Localized Light Scatterers (LLS)
4
100176 ≥ 0.19µ
13.14 Localized Light Scatterers (LLS)
4
100177 ≥ 0.18µ
13.14 Localized Light Scatterers (LLS)
4
100178 ≥ 0.17µ
13.14 Localized Light Scatterers (LLS)
4
100179 ≥ 0.16µ
13.14 Localized Light Scatterers (LLS)
4
100180 ≥ 0.15µ
13.14 Localized Light Scatterers (LLS)
4
100181 ≥ 0.14µ
13.14 Localized Light Scatterers (LLS)
4
100182 ≥ 0.13µ
13.14 Localized Light Scatterers (LLS)
4
100183 ≥ 0.12µ
13.14 Localized Light Scatterers (LLS)
4
100184 ≥ 0.11µ
13.14 Localized Light Scatterers (LLS)
4
100185 ≥ 0.10µ
13.14 Localized Light Scatterers (LLS)
4
100186 ≥ 0.09µ
13.14 Localized Light Scatterers (LLS)
4
100187 ≥ 0.08µ
13.14 Localized Light Scatterers (LLS)
4
100188 ≥ 0.07µ
13.14 Localized Light Scatterers (LLS)
4
100189 ≥ 0.06µ
13.14 Localized Light Scatterers (LLS)
4
100190 ≥ 0.05µ
13.14 Localized Light Scatterers (LLS)
4
100191 ≥ 0.04µ
SEMI M18-0704 © SEMI 1990, 2004 32
Line Item EDI Code ID Sub Param ID
13.14 Localized Light Scatterers (LLS)
4
100192 ≥ 0.03µ
13.14 Localized Light Scatterers (LLS)
4
100193 ≥ 0.02µ
13.15 Surface Edge Exclusion 100194
14.01 [ ] Specified According to SEMI M11 Table [ ] 100195
14.2 Scratches -- macro 100196
14.3 Scratches -- micro 100197
14.4 Localized Light Scatterers 100198
100199
20.1 Annealing Atmosphere 100200
20.2 Other Dopant in Crystal 100201
21.1 Bow 100202
21.2 Warp 100203 SEMI MF657
21.2 Warp 100204 SEMI MF1390
21.3 Sori 100205
21.4 Flatness/Global 100206
21.5 Flatness/Site 100207 SF3R
21.5 Flatnes/Site 100208 SF3D
21.5 Flatness/Site 100209 SFLR
21.5 Flatness/Site 100210 SFLD
21.5 Flatness/Site 100211 SFQR
21.5 Flatness/Site 100212 SFQD
21.5 Flatness/Site 100213 SBIR
21.5 Flatness/Site 100214 SFSR
21.6 Fixed Quality Area 100215
22.1 Stacking Faults 100216
22.2 Slip 100217
23.1 Contamination 100218
24.1 Depth of BMD Denuded Zone 100219
24.2 BMD Density 100220
6.14 Flatness/Site 100221 SFSD
12.5 Flatness/Site 100222 SFSD
12.5 Flatness/Site 100223 SBID
21.5 Flatness/Site 100224 SFSD
21.5 Flatness/Site 100225 SBID
25.0 Type of SOI 100226
25.1 Starting silicon wafer for SOI 100227
25.2 Surface Silicon Thickness 100228
25.3 Surface Silicon Thickness Mean Value Variation 100229
25.4 Surface Silicon Thickness Variation in Wafer 100230
25.5 Crystal Orientation 100231
25.6 Rotation Misalignment 100232
25.7 Edge Exclusion, Nominal 100233
25.8 Non-SOI Edge Area 100234
25.9 Conductivity Type 100235
25.10 Dopant 100236
25.11 Dopant Concentration 100237