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SEMI M40-0200 © SE MI 2000 17 Table R1-3 A verage Ov er Site Patterns ii, iii and iv (wafer av erage) and Corre sponding Relativ e Standard Deviation for Each Wafer Wfr # Avg . of Averag es, A Relat ive Std. Dev. of Aver…

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SEMI M40-0200 © SEMI 2000 16
12 2.76 2.48/
0.32
2.50/
0.32
2.43/
0.42
2.47/
0.31
7.30 6.566/
0.91
6.521/
0.75
6.146/
1.05
6.478/
0.77
Acid etched, 200 mm 13 327.2 332.0/
6.73
335.0/
16.25
352.6/
12.37
334.5/
13.76
826.2 873.5/
43.16
869.5/
50.22
906.5/
28.56
874.4/
46.13
14 337.9 344.9/
18.74
344.7/
9.19
353.1/
12.11
345.3/
13.00
876.8 899.9/
60.49
915.5/
24.15
930.0/
43.19
912.5/
39.69
15 339.5 340.5
8/13.4
2
335.2/
6.07
363.4/
7.22
337.0/
9.58
887.7 913.7/
68.10
879.1/
24.64
966.1/
30.75
891.7/
47.65
16 337.6 331.8/
8.84
337.6/
13.37
348.7/
9.26
335.4/
12.41
922.8 886.1/
37.57
896.0/
38.04
921.8/
27.16
890.2/
37.14
Table R1-2 Results of Roughness Measurements, 80 and 250 µm Filters
Wfr. # Average/Standard Deviation, A
80 µm filter
Average/Standard Deviation, A
250 µm filter
Site pattern i ii iii iv v i ii iii iv v
Final polished, 150 mm 1 1.33 1.426/
0.075
1.416/
0.134
1.434/
0.108
1.426/
0.115
4.34 4.678/
0.484
4.836/
0.632
4.786/
0.435
4.813/
0.578
2 1.57 1.470/
0.112
1.482/
0.147
1.444/
0.112
1.471/
0.133
5.34 4.944/
0.312
5.441/
0.613
4.592/
0.434
5.258/
0.591
3 1.49 1.460/
0.025
1.472/
0.131
1.357/
0.080
1.466/
0.108
4.81 4.788/
0.403
5.164/
0.823
4.353/
0.507
5.047/
0.735
4 1.33 1.394/
0.089
1.446/
0.115
1.461/
0.069
1.435/
0.106
4.09 4.528/
0.619
4.814/
0.584
4.934/
0.503
4.760/
0.585
Final polished, 200 mm 5 3.29 2.582/
0.45
2.638/
0.71
2.531/
0.65
2.566/
0.60
7.33 6.676/
0.45
6.627/
0.99
6.560/
0.95
6.592/
0.82
6 3.65 2.560/
0.65
2.724/
0.79
2.510/
0.67
2.590/
0.69
7.49 6.804/
0.57
6.834/
0.93
6.443/
0.92
6.772/
0.80
7 2.02 2.682
/0.72
2.493/
0.56
2.641/
0.81
2.602/
0.61
5.45 6.914/
1.37
6.601/
0.81
7.057/
1.47
6.810/
0.97
8 1.97 2.400/
0.45
2.317/
0.40
2.279/
0.54
2.375/
0.40
5.56 6.268/
0.59
6.342/
0.69
6.232/
1.08
6.374/
0.62
Pre-polished, 200 mm 9 11.12 9.94/
1.06
10.19/
1.09
10.10/
1.27
10.02/
1.04
15.15 14.25/
1.31
14.50/
1.18
14.47/ 14.36/
1.22
10 10.13 10.54/
1.34
11.05/
0.78
10.27/
1.35
10.92/
1.03
14.40 15.44/
2.01
15.58/
0.77
14.59/
1.88
15.62/
1.28
11 11.29 11.35/
0.31
11.26/
0.45
10.13/
1.23
11.29/
0.41
15.75 16.56/
0.59
16.27/
0.81
14.83/
1.26
16.42/
0.74
12 10.60 10.11/
1.10
9.86/
0.95
9.92/
1.12
9.90/
0.99
14.42 14.33/
1.31
14.10/
1.14
14.41/
1.26
14.17/
1.21
Acid etched, 200 mm 13 1257.0 1404/
140.8
1391/
123.44
1439/
88.10
1406/
122.83
1789.6 2127/
331.59
2118/
295.83
2185/
270.70
2147/
291.78
14 1421.9 1460/
109.9
1514/
53.27
1497/
95.92
1501/
78.94
2154.6 2256/
154.21
2366/
222.41
2322/
216.72
2349/
203.72
15 1374.7 1500/
199.2
1396/
94.33
1549/
95.25
1438/
147.56
1970.4 2350/
508.52
2071/
257.41
2348/
198.70
2186/
384.36
16 1478.4 1421/
109.9
1450/
108.89
1477/
104.51
1437/
109.71
2006.4 2075/
186.85
2219/
297.40
2264/
252.44
2180/
271.75
R1-4.2.5 The five-point site pattern appears to represent the average surface reasonably well for wafers where the
roughness does not vary more than by a factor of about two across the entire surface. Patterns with a higher number
of sites are recommended for problematic surfaces.
SEMI M40-0200 © SEMI 200017
Table R1-3 Average Over Site Patterns ii, iii and iv (wafer average) and Corresponding Relative Standard
Deviation for Each Wafer
Wfr # Avg. of Averages, A Relative Std. Dev. of Averages, %
Filter 10 µm 30 µm 80 µm 250 µm 10 µm 30 µm 80 µm 250 µm
Final polished,
150 mm
1 0.088 0.392 1.425 4.767 2.34 0.90 0.65 1.69
2 0.091 0.410 1.465 4.992 2.80 0.66 1.33 8.55
3 0.091 0.397 1.430 4.768 1.41 2.29 4.43 8.52
4 0.092 0.412 1.434 4.759 4.17 2.22 2.45 4.38
Final polished,
200 mm
5 0.146 0.789 2.584 6.606 6.09 5.15 2.07 1.24
6 0.145 0.798 2.598 6.694 7.79 6.25 4.32 3.25
7 0.128 0.729 2.605 6.857 4.16 3.74 3.81 3.40
8 0.116 0.637 2.332 6.281 3.35 1.76 2.66 0.89
Pre-polished,
200 mm
9 2.418 6.441 10.08 14.41 1.35 1.31 1.23 0.96
10 2.541 6.775 10.59 15.21 6.30 5.37 4.18 3.54
11 2.669 7.052 10.91 15.89 6.89 6.23 6.20 5.83
12 2.469 6.411 9.96 14.28 1.54 3.60 1.30 1.13
Acid etched, 200
mm
13 339.87 883.15 1411.66 2143.24 3.27 2.30 1.78 1.68
14 347.57 915.12 1490.70 2314.67 1.37 1.64 1.87 2.40
15 346.41 919.62 1481.90 2256.45 4.32 4.77 5.29 7.13
16 339.38 901.30 1449.77 2185.77 2.52 2.04 1.93 4.52
Table R1-4 Average Over the Standard Deviations of the Site Patterns ii, iii and iv (wafer standard devia-
tion) and the Corresponding Relative Standard Deviations for Each Wafer Normalized to the Wafer Average
Wfr # Avg. of Std. Deviations, A Relative Std. Dev. of Std. Devs, %
Filter 10 µm 30 µm 80 µm 250 µm 10 µm 30 µm 80 µm 250 µm
Final polished,
150 mm
1 0.007 0.026 0.106 0.517 2.2 1.4 2.1 2.2
2 0.007 0.033 0.123 0.453 2.8 1.2 1.4 3.0
3 0.004 0.023 0.079 0.578 4.6 1.6 3.7 4.6
4 0.005 0.019 0.091 0.569 5.5 1.4 1.6 1.3
Final polished,
200 mm
5 0.059 0.302 0.603 0.797 3.8 6.2 5.3 4.6
6 0.065 0.347 0.703 0.807 4.0 1.8 2.9 3.1
7 0.042 0.261 0.699 1.219 10.4 7.3 4.9 5.2
8 0.025 0.156 0.463 0.789 4.7 4.0 3.1 4.1
Pre-polished,
200 mm
9 0.320 0.834 1.14 1.397 3.1 1.1 1.1 1.8
10 0.321 0.816 1.17 1.553 4.4 4.0 3.2 4.5
11 0.205 0.516 0.663 0.889 7.9 6.6 4.5 2.2
12 0.353 0.901 1.06 1.234 2.2 2.3 0.9 0.6
Acid etched,
200 mm
13 11.78 40.65 117.5 299.4 1.4 1.3 1.9 1.4
14 13.35 42.61 86.4 197.8 1.4 2.0 2.0 1.6
15 8.90 41.16 129.6 321.5 1.1 2.6 4.1 7.3
16 10.49 34.25 107.8 245.6 0.7 0.7 0.2 2.5
SEMI M40-0200 © SEMI 2000 18
0%
1%
2%
3%
4%
5%
6%
7%
8%
9%
1234 5678 9101112 13141516
Wafer #
Rel. Std. Dev. of Wafer Averag
e
10 µm filter 30 µm filter 80 µm filter 250 µm filter
Figure R1-2
The Relative Standard Deviations of the Wafer Averages Normalized to the Wafer Averages for Site Patterns
ii, iii and iv, for All Wafers Investigated and for Filter Lengths of 10, 30, 80 and 250 µm
0%
2%
4%
6%
8%
10%
12%
1 2 3 4 5 6 7 8 9 101112 13141516
Wafer-#
Rel. Std. Dev. of Wafer Std. Dev
10 µm filter 30 µm filter 80 µm filter 250 µm filter
Figure R1-3
The Relative Wafer Standard Deviations of the Wafer Standard Deviations Normalized to the Wafer
Averages for the Site Patterns ii, iii and iv, for All Wafers and for Filter Lengths of 10, 30, 80 and 250 µm