semi合集-English.pdf - 第5651页

SEMI P10-0705 © SEMI 1990, 2005 146 8.1.696 START_DATA_FUNCTIO N — (text) name of <data_funct ion> grou p. 8.1.697 START_DATA_MANIP ULATION — (text) nam e of group of seque ntial BOOLEA N and/or <data_fracture &…

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SEMI P10-0705 © SEMI 1990, 2005 145
8.1.668 SHIP_TRAVELER — (T or F) If T, requires delivery of mask traveler document to the customer.
8.1.669 SHIPPING_ADDRESS — Address for delivery of masks.
8.1.670 SHIPPING_CONTACT — Name of person to receive masks.
8.1.671 SHIPPING_EMAIL — Internet address for SHIPPING_CONTACT.
8.1.672 SHIPPING_FAX — Phone number for facsimile machine of SHIPPING_CONTACT.
8.1.673 SHIPPING_PHONE — Phone number for SHIPPING_CONTRACT.
8.1.674 SHIPPING_METHOD — Transportation method for masks, including special arrangements for off-hours
and weekends.
8.1.675 SHIPPING_METHOD_USED — Transportation method used to deliver masks.
8.1.676 SIZING — (n) The amount to increase or decrease the width and height of all geometry within a pattern
while fracturing. (n) is in microns and can be negative, indicating a decrease. Note that (n) results in a “one-sided”
change in feature size.
8.1.677 SIZING_BORDER_RULE — (FIT, INSIDE, OUTSIDE and others on request) Describes methodology for
applying SIZING at the borders of the output file and the effect on the final dimensions of the output file.
8.1.678 SIZING_RULE — (SQUARE, PARAGON, EXTEND, OCTAGON and others on request) Describes
methodology for applying SIZING around corners.
8.1.679 SO_NUMBER — Alphanumeric sales order number.
8.1.680 SOFTWARE_NAME — Name of the software program, not the brand (e.g., MaskRigger or MaskWeaver,
not MaskTools). If, for a given function_purpose, multiple software_program names appear, then they are
alternative software tools to achieve the desired outcome.
8.1.681 SOFTWARE_REVISION — (text, including …“OR HIGHER”) Revision identification, per software
vendor’s nomenclature.
8.1.682 START_BARCODE — (text) name of barcode.
8.1.683 START_BILLING_INFORMATION — (text) name of <billing_information>.
8.1.684 START_CD — Indicates beginning of <cd_group>. Alphanumeric data field identifies the collection to
establish which collections are hierarchically affected by another. The appearance of a <cd_definition> at a lower
level in the hierarchy supercedes the entire <cd_definition> at a higher level in the hierarchy if and only if it has the
same START_CD data field.
8.1.685 START_CD_GROUP_MEASUREMENTS — (text) name of <cd_group_measurements>.
8.1.686 START_CD_ISO_DENSE — (text) name of <cd_iso_dense_definition>.
8.1.687 START_CD_ISO_DENSE_RESULTS — (text) name of <cd_iso_dense_results>.
8.1.688 START_CD_MEASUREMENT — (text) name of <cd_measurement>.
8.1.689 START_CD_SET — Indicates beginning of <cd_set>. Alphanumeric data field identifies the collection to
establish which collections are hierarchically affected by another. The appearance of a <cd_set> at a lower level in
the hierarchy supercedes the entire <cd_set> at a higher level in the hierarchy if and only if it has the same
START_CD data field.
8.1.690 START_CD_SET_RESULTS — (text) name of <cd_set_results>.
8.1.691 START_CD_XY_DEFINITION — (text) name of <cd_xy_definition>.
8.1.692 START_CD_XY_RESULTS — (text) name of <cd_xy_results>.
8.1.693 START_CLOSURE_MEASUREMENTS — (text) name of <closure_measurements>
8.1.694 START_COATING — (text) name of <coating>.
8.1.695 START_DATA_FRACTURE — (text) name of <data_fracture> group.
SEMI P10-0705 © SEMI 1990, 2005 146
8.1.696 START_DATA_FUNCTION — (text) name of <data_function> group.
8.1.697 START_DATA_MANIPULATION — (text) name of group of sequential BOOLEAN and/or
<data_fracture> operations. The output pattern data from the first operation is the input pattern data for the next
operation and so on. The data field must be a unique identifier within <mask_order> as the results of one
<data_manipulation> may be referenced by another.
8.1.698 START_DEFECT_DEFINITION — (text) name of <defect_definition> group.
8.1.699 START_DEFECT_MEASUREMENTS — (text) name of <defect_measurements> group.
8.1.700 START_ETCH_DEPTH_MEASUREMENTS — Indicates the beginning of etch depth measurements
within <phase_shift_measurements>.
8.1.701 START_LITHO_INFORMATION — (text) name of <litho_information>.
8.1.702 START_MASK_RESULTS — Indicates the beginning of the file from the vendor to the customer
containing actual mask results data. Should match the data field of the START_ORDER to which it is responding
AND the data field of END_MASK_RESULTS.
8.1.703 START_MASK_RESULTS_OPTIONS — (text) name of <mask_results_options>.
8.1.704 START_MATERIALS_USED — (text) name of <materials_used>.
8.1.705 START_MEASURED_REGISTR_MARK —(text) name of <measured_registr_mark>.
8.1.706 START_OPC — (text) name of <opc_definition> group.
8.1.707 START_ORDER — Indicates the beginning of order entry data file from the customer to the vendor.
Should indicate the name(s) of the mask sets included.
8.1.708 START_PATTERN_GROUP_RESULTS — (text) name of <pattern_group_results>.
8.1.709 START_PATTERN_OPTIONS — (text) name of <pattern_options> group.
8.1.710 START_PHASE_ANGLE_MEASUREMENTS — Indicates the beginning of phase angle measurements
within <phase_shift_measurements>.
8.1.711 START_PHASE_SHIFT — (text) name of <phase_shift> group.
8.1.712 START_PHASE_SHIFT_MEASUREMENTS — (text) name of <phase_shift_measurements> group.
8.1.713 START_PLACEMENT — (text) name of <placement> group.
8.1.714 START_REGISTR — Indicates beginning of <registration> collection. Defines separation between
multiple <registration>s. Alphanumeric data field identifies the collection to establish which collections are
hierarchically superceded by another; also for reference by REGISTR_RELATIVE.
8.1.715 START_REGISTR_MEASUREMENTS — (text) name of <registr_measurements> group.
8.1.716 START_REPAIR_DEFINITION — (text) name of <repair_definition> group.
8.1.717 START_SEM_PHOTO — (text) name of <sem_photo> group.
8.1.718 START_SHIP_PLOT — Indicates beginning of <ship_plot> collection. Alphanumeric data field identifies
the collection to establish which collections are hierarchically affected by another. The appearance of a <ship_plot>
with the same START_SHIP_PLOT data field at a lower level in the hierarchy (see §6) supersedes the <ship_plot>
at a higher level in the hierarchy.
8.1.719 START_SHIP_TO — (text) name of <ship_to> group.
8.1.720
START_SHIPPABLE_DATA — (text) name of <shippable_data> group.
8.1.721 START_SUBSTRATE — (text) name of <substrate> group.
8.1.722 START_SURFACE_DEFINITION — (text) name of <surface_definition> group.
8.1.723 START_SURFACE_INSP_MEASUREMENTS — (text) name of <surface_insp_measurements> group.
Must match START_SURFACE_DEFINITION of corresponding <surface_definition> group.
SEMI P10-0705 © SEMI 1990, 2005 147
8.1.724 START_TITLE — (title number) Indicates the beginning keywords for a specific title.
8.1.725 START_TRANSMISSION_MEASUREMENTS — Indicates the beginning of transmission measurements
within <phase_shift_measurements>.
8.1.726 START_VENDOR_INFO — (text) name of <vendor_info> group.
8.1.727 STATUS — (NEW, OLD, CHANGE, CANCEL, HOLD, STOP, RESTART, RETURNED, PROTESTED,
QUOTE ONLY) Present status of mask(s); NEW = new mask which has not been ordered before. OLD = previously
ordered mask whose data is included for reference only. CHANGE = previously ordered mask whose data is
included because the order data has been changed since the last transmission. CANCEL = previously ordered mask
whose order is being cancelled. HOLD = enter a new mask but do not release it to production until customer
authorization.
STOP = previously ordered mask which is put on hold until further notice. RESTART = changes a
previous STATUS of STOP from being on hold to being released for production. RETURNED = a previously
delivered mask which has been rejected by the customer and is being returned to the vendor. A data entry transmittal
which includes a RETURNED mask should also include a NEW mask if replacement is to be initiated. PRICE of the
returned mask should be the negative of the original price in order to track credit. The NEW mask should also
contain PRICE and a new schedule. PROTESTED = a RETURNED mask whose rejection is protested by the mask
vendor. If a NEW mask accompanied the RETURNED mask to initiate replacement, the NEW mask should also
have PROTESTED status. QUOTE_ONLY = the order is not to be manufactured, but is only to be used by the
vendor for quoting price and delivery.
8.1.728 STD_PATTERN_NAME — Name of a standard pattern, on file at the vendor, previously supplied or
authorized by the customer.
8.1.729 STEPPING_COUNT — (x,y) Count of successive pattern or cell placements.
8.1.730 STEPPING_DISTANCE — (x,y) Spacing between successive pattern or cell placements.
8.1.731 STRIPE_HEIGHT — Stripe height in address units of pattern file.
8.1.732 SUMMARY_FILE_NAME — (text) Name identifying the summary output file for RUNSET_NAME. If
this keyword appears in the
<mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.733 SURF_DEFECT_TYPE — (CONTAM_ON_CLEAR, DIM_CLEAR, ON_EDGE, UNKOWN, PINHOLE,
BRIGHT_CHROME, CONTAM_ON_CHROME, DIM_CHROME, ON_CLEAR, BRIGHT, ON_CHROME,
ON_ATT, DIM_ATT, ATT_PINHOLE and others on request) Setup parameter for surface inspection.
8.1.734 SURF_INSP_AREA — (x1,y1,x2,y2) Unscaled coordinates of window for surface inspection, lower left
and upper right corners, relative to the nominal center of mask, pattern or cell (chrome side up for masks,
unmirrored for patterns or cells).
8.1.735 SURF_INSP_EQUIP_REQD — Alphanumeric identification of acceptable equipment for defect
inspection.
8.1.736 SURF_INSP_EQUIP_USED — Surface inspection equipment used.
8.1.737 SURF_INSP_GLASS_SIDE — If present, specifies the maximum dimension of the smallest unacceptable
particle on the glass side of the mask. This keyword is generally intended for non-pelliclized masks.
8.1.738 SURF_INSP_METHOD — (LASER, VISUAL, PIXEL or MICROSCOPE) Methodology for detecting
surface particles.
8.1.739 SURF_INSP_MODE_REQD — Alphanumeric operating mode required for SURF_INSP_EQUIP_REQD.
8.1.740 SURF_INSP_MODE_USED — (text) SURF_INSP_EQUIP_USED operating mode.
8.1.741 SURF_INSP_PATTERN_SIDE — Specifies the maximum dimension of the smallest unacceptable particle
on the patterned side of the mask. This keyword is generally intended for non-pelliclized masks.
8.1.742 SURF_INSP_PELL_BOTTOM — Specifies the maximum dimension of the smallest unacceptable particle
on the pellicle on the glass side of the mask on either surface of the pellicle membrane or on the glass surface under
the pellicle.