semi合集-English.pdf - 第5530页

SEMI P10-0705 © SEMI 1990, 2005 25 { BIN_SIZE SEVERITY_CRITERION_REQD } } [DEFECT_SETUP_FILE_NAME_REQD] } [DEFECT_EQUIP_USED [EQUIP_SITE_USED] [ DEFECT_INSP_MODE_USED ] [DEFECT_INSP_PIXEL_SIZE_USED] {DEFECT_TYPE DEFECT_I…

SEMI P10-0705 © SEMI 1990, 2005 24

[CD_DEVIATION_FROM_TARGET] [CD_DEVIATION_FROM_MEAN]

[MEASURED_CD_MEAN] [MEASURED_CD_MIN] [MEASURED_CD_MAX]

[MEASURED_CD_TOLERANCE]

[MEASURED_CD_RANGE] [MEASURED_CD_THREE_SIGMA]

[MEASURED_CD_DEVIATION_FROM_TARGET]

[MEASURED_CD_DEVIATION_FROM_MEAN]

END_CD_SET_RESULTS

<cd_xy_results> = START_CD_XY_RESULTS

{CD_X_GROUP} {CD_Y_GROUP}

cd_xy_site>}

[

CD_XY_TOLERANCE] [CD_XY_DEVIATION] [CD_XY_REFERENCE_ONLY]

[MEASURED_CD_XY_TOLERANCE] [MEASURED_CD_XY_DEVIATION]

[MEASURED_CD_XY_MORPHOGRAPHY]

[MEASURED_CD_XY_TONE_CLEAR]

END_CD_XY_RESULTS

<cd_xy_site> = START_CD_XY_SITE

[

CD_HORIZONTAL_ID CD_HORIZONTAL_LOCATION ]

[

CD_HORIZONTAL_MORPHOGRAPHY] [CD_HORIZONTAL_TONE_CLEAR]

MEASURED_HORIZONTAL_CD

[

CD_VERTICAL_ID CD_VERTICAL_LOCATION ]

[

CD_VERTICAL_MORPHOGRAPHY] [CD_VERTICAL_TONE_CLEAR]

MEASURED_VERTICAL_CD

END_CD_XY_SITE

<cd_iso_dense_results> = START_CD_ISO_DENSE_RESULTS

{

CD_ISO_GROUP} {CD_DENSE_GROUP}

[

CD_ISO_DENSE_TOLERANCE]

[

CD_ISO_DENSE_REFERENCE_ONLY]

[

MEASURED_CD_ISO_MEAN] [MEASURED_CD_ISO_RANGE]

[

MEASURED_CD_DENSE_MEAN] [MEASURED_CD_DENSE_RANGE]

[

MEASURED_CD_ISO_DENSE_TOLERANCE]

END_CD_ISO_DENSE_RESULTS

<defect_measurements> = START_DEFECT_MEASUREMENTS

[

DEFECT_QUALITY_ID]

{INSPECTION_AREA} {INSPECTION_AREA_EXCLUDE}

{VISUAL_INSP_CRITERIA}

DIE_TO_DIE_INSPECTION

DIE_TO_DIE_MEASUREMENTS

{DEFECT_EQUIP_REQD {EQUIP_SITE_REQD}

[

DEFECT_INSP_MODE_REQD] [DEFECT_INSP_PIXEL_SIZE_REQD]

{DEFECT_TYPE DEFECT_INSP_SENSITIVITY_REQD

SEMI P10-0705 © SEMI 1990, 2005 25

{BIN_SIZE SEVERITY_CRITERION_REQD } }

[DEFECT_SETUP_FILE_NAME_REQD] }

[DEFECT_EQUIP_USED [EQUIP_SITE_USED]

[

DEFECT_INSP_MODE_USED] [DEFECT_INSP_PIXEL_SIZE_USED]

{DEFECT_TYPE DEFECT_INSP_SENSITIVITY_USED

{BIN_SIZE SEVERITY_CRITERION_USED } }

[DEFECT_SETUP_FILENAME_USED ] ]

[

DEFECT_INSP_DATE]

{REPAIR_EQUIP_REQD {EQUIP_SITE_REQD} }

[REPAIR_EQUIP_USED [EQUIP_SITE_USED] ]

{MEASURED_INSPECTION_AREA} {MEASURED_INSPECTION_AREA_EXCLUDE}

[MEASURED_DEFECT_DENSITY]

[MEASURED_DEFECT_COUNT]

[MEASURED_DEFECT_COUNT_REP]

[

MEASURED_DEFECT_COUNT_WITHIN_SPEC]

[MEASURED_DEFECTIVE_DIE_DENSITY]

[MEASURED_DEFECTIVE_DIE_COUNT]

[MEASURED_DEFECTIVE_DIE_COUNT_REP]

[MEASURED_PERCENT_DEFECTIVE_DIE]

{

MEASURED_DEFECT_FILE_NAME}

[PRE_PELL_INSPECTION_ID] [PRE_PELL_INSPECTION_DATE_AND_TIME]

[POST_PELL_INSPECTION_ID] [POST_PELL_INSPECTION_DATE_AND_TIME]

[OPERATOR]

END_DEFECT_MEASUREMENTS

<surface_insp_measurements> =

START_SURFACE_INSP_MEASUREMENTS

[

SURFACE_QUALITY_ID]

{SURF_INSP_EQUIP_REQD {EQUIP_SITE_REQD}

[SURF_INSP_MODE_REQD] [SURF_INSP_PIXEL_SIZE_REQD]

{SURF_DEFECT_TYPE SURF_INSP_SENSITIVITY_REQD

{BIN_SIZE SEVERITY_CRITERION_REQD } }

[SURF_INSP_SETUP_FILE_NAME_REQD] }

[

SURF_INSP_EQUIP_USED [EQUIP_SITE_USED]

[

SURF_INSP_MODE_USED] [SURF_INSP_PIXEL_SIZE_USED]

{SURF_DEFECT_TYPE SURF_INSP_SENSITIVITY_USED

{ BIN_SIZE SEVERITY_CRITERION_USED } }

[SURF_INSP_SETUP_FILE_NAME_USED ] ]

[MEASURED_DEFECT_COUNT]

[MEASURED_DEFECT_COUNT_WITHIN_SPEC]

{MEASURED_SURF_INSP_FILE_NAME}

SEMI P10-0705 © SEMI 1990, 2005 26

[PRE_PELL_INSPECTION_ID] [PRE_PELL_INSPECTION_DATE_AND_TIME]

[POST_PELL_INSPECTION_ID] [POST_PELL_INSPECTION_DATE_AND_TIME]

[OPERATOR]

END_SURFACE_INSP_MEASUREMENTS

7.6 Mask Order Data Structure Syntax in Extensible Markup Language (XML) Format  The following file

defines the Mask Order Data Structure Syntax (above) in Extensible Markup Language Schema Definition (XSD)

format. Should the user choose to implement the mask order data file in Extensible Markup Language (XML), the

file must validate against this XSD. For optimal viewing, paste the text into a program designed to read XML such

as an internet browser. The content of both versions of representation of mask order data should be entirely

equivalent. Since the XML schema is derived directly from the Mask Order Data Structure Syntax, in the event of a

discrepancy between the two, the Data Structure Syntax should be considered to be the more correct.

<xs:schema xmlns:xs="http://www.w3.org/2001/XMLSchema"

elementFormDefault="qualified" attributeFormDefault="unqualified"

version="P10-0705 ">

<xs:element name="MaskOrder" type="MaskOrderType"/>

<xs:annotation>

<xs:documentation>

<purpose>SEMI P10 MaskOrder</purpose>

</xs:documentation>

</xs:annotation>

<xs:complexType name="MaskOrderType">

<xs:sequence>

<xs:element name="SemiRevision" type="xs:string"/>

<xs:element name="Customer" type="xs:string"/>

<xs:element name="Vendor" type="xs:string"/>

<xs:element name="FileDateTime" type="xs:dateTime"/>

<xs:sequence minOccurs="0">

<xs:element name="OperatorName" type="xs:string"/>

</xs:sequence>

<xs:element name="MaskSet" type="MaskSetType"/>

<xs:element name="Checksum" type="xs:string"/>

</xs:sequence>

<xs:attribute name="groupName" type="xs:string" use="required"/>

<xs:attribute name="p10Start" type="xs:string" use="required"

fixed="StartMaskOrder"/>

<xs:attribute name="p10End" type="xs:string" use="required"

fixed="EndMaskOrder"/>

</xs:complexType>

<xs:complexType name="MaskSetType">

<xs:sequence>

<xs:element name="MaskSetOptions"

type="MaskSetOptionsType"/>

<xs:sequence minOccurs="0" maxOccurs="unbounded">

<xs:element name="MaskGroup" type="MaskGroupType"/>

</xs:sequence>

<xs:attribute name="groupName" type="xs:string" use="required"/>