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SEMI F66-1101 © SEMI 2001 2 By publication of this sta ndard, Se micondu ctor Equipment and Materials International (SEMI) takes no position respecting t he validity of any patent rights or copyrigh t s asserted in conne…
SEMI F66-1101 © SEMI 20011
SEMI F66-1101
SPECIFICATION FOR PORT MARKING AND SYMBOL OF STAINLESS
STEEL VESSELS FOR LIQUID CHEMICALS
This specification was technically approved by the Global Liquid Chemical Distribution Systems Committee
and is the direct responsibility of the Japanese Liquid Chemical Distribution Systems Committee. Current
edition approved by the Japanese Regional Standards Committee on August 3, 2001. Initially available at
www.semi.org September 2001; to be published November 2001.
1 Purpose
1.1 This document specifies port marking and symbol
of stainless steel vessels for liquid chemicals used in
semiconductor and flat panel display manufacturing
equipment and liquid chemical distribution facilities.
2 Scope
2.1 This document covers stainless steel vessels with
tubes that penetrate into the vessels as inlets or outlets
of liquid chemical to/from the vessels.
2.2 A vessel which uses coupling (quick coupling) at
its tube end (port) is excepted from the scope.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the user of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
3 Referenced Standards
3.1 None.
4 Terminology
4.1 dip tube — a piece of tube which penetrates into a
vessel as an inlet or outlet of liquid chemical to/from
the vessel.
4.2 liquid chemical — organic or inorganic liquid
chemical used for semiconductor or flat panel display
manufacturing.
4.3 port — an end of a tube attached to a vessel.
5 Requirements for Port Marking
5.1 The dip tube port shall be marked as “DIP”. If
more than one dip tube port exists on a vessel, each port
shall be marked as “DIP”.
5.2 Additional Marking — A description to identify
multiple ports may be added to the dip port marking
such as DIP-1 or DIP (1).
5.3 Location of Marking — “DIP” marking shall be
located where it will clearly identify the dip tube port.
If more than one dip tube ports exist on a vessel, each
marking shall be located so that the corresponding port
is clearly identified.
5.4 Method of Marking — The marking shall be
engraved, etched, or labeled properly so that the “DIP”
marking shall not be removed. Color of the marking is
optional.
5.5 Size of Marking — The marking shall be sized so
that it is clearly readable.
6 Requirements for Symbol
6.1 A symbol illustrated in Figure 1 shall be used to
draw a stainless steel vessel with a dip tube. A dip tube
shall be identified in the symbol as a line penetrating
into a rectangle.
6.2 If more than one dip tube exists on a vessel, the
symbol shall have the same number of lines which
correspond to the dip tubes.
Figure 1
Symbol for Stainless Steel Vessel with a Dip Tube
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer' s instructions, product labels,
product data sheets, and other relevant literature,
respecting any materials or equipment mentioned
herein. These standards are subject to change without
notice.
SEMI F66-1101 © SEMI 2001 2
By publication of this standard, Semiconductor
Equipment and Materials International (SEMI) takes no
position respecting the validity of any patent rights or
copyrights asserted in connection with any items
mentioned in this standard. Users of this standard are
expressly advised that determination of any such patent
rights or copyrights, and the risk of infringement of
such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI F67-1101 © SEMI 20011
SEMI F67-1101
TEST METHOD FOR DETERMINING INERT GAS PURIFIER CAPACITY
This test method was technically approved by the Global Facilities Committee and is the direct responsibility
of the North American Facilities Committee. Current edition approved by the North American Regional
Standards Committee on August 27, 2001. Initially available at www.semi.org September 2001; to be
published November 2001.
1 Purpose
1.1 The purpose of this document is to define a test
method to quantify impurity removal capacity of inert
gas purifiers.
2 Scope
2.1 To determine the impurity capacity of a gas purifier
at the point of breakthrough. Capacity tests are done by
adding ppm levels of a given gaseous impurity to a pure
zero gas and monitoring the effluent of the test purifier
for active impurity species.
NOTE 1: Mixtures of two or more impurities for multi
impurity removal purifiers is a more representative method
for determining capacity.
2.2 This document is intended for point of use (POU)
inert gas purifiers where inlet purity is 99.9995% or
higher.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate and safety health practices and determine
the applicability of regulatory limitations prior to use.
3 Limitations
3.1 The inherent limitation to this method is the limit
of detection (LOD) of the analytical instrument
employed by the user.
3.2 This test method can only be used to compare
purifier capacity results if the user application for flow
rate, pressure, and temperature are the same as the test
conditions. Different
users and/or different operating
conditions may result in different purifier performance
results.
3.3 In testing mixtures of impurities, some impurities
may influence the capacity results. Discussion with the
manufacturer is highly recommended prior to testing.
3.4 The test method does not apply to particulates.
3.5 This test method can only be used to compare the
capacity of different purifiers, when the purifiers are
sized for the appropriate flow rate. Comparing purifiers
of different maximum flow ratings will result in
misleading information.
3.6 This test method will provide capacity information
only for impurities that are used in the challenge gas.
4 Referenced Standards
4.1 SEMI Standards
SEMI E29 — Standard Terminology for the Calibration
of Mass Flow Controllers and Mass Flow Meters
SEMI F6 — Guide for Secondary Containment of
Hazardous Gas Piping Systems
SEMI F22 — Guide for Gas Distribution Systems
SEMI F33 — Method for Calibration of Atmospheric
Pressure Ionization Mass Spectrometer (APIMS)
4.2 ANSI Standards
1
ANSI B46.1 — Surface Texture (Surface Roughness,
Waviness, and Lay)
NOTE 2: Unless otherwise indicated, all documents cited
shall be the latest published versions.
5 Terminology
5.1 Abbreviations and Acronyms
5.1.1 APIMS — atmospheric pressure ionization mass
spectrometer
5.1.2 °C — degrees Celsius
5.1.3 DUT — device under test
5.1.4 °F — degrees Fahrenheit
5.1.5 in — inch
5.1.6 kPa — kiloPascal
5.1.7 LOD — limit of detection
5.1.8 m — meter
5.1.9 MFC — mass flow controller
5.1.10 NMHC — non methane hydrocarbons
5.1.11 POU — point of use
5.1.12 ppb — parts per billion, volume basis
1 American National Standards Institute, New York Office: 11 West
42nd Street, New York, NY 10036, USA. Telephone: 212.642.4900;
Fax: 212.398.0023 Website: www.ansi.org