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SEMI F22-1102 © SEMI 1997, 2002 1 SEMI F22-1102 GUIDE FOR GAS DISTRIBUTION SYSTEMS This guide was technically approved by the Global Faci lities Committee and is the di rect responsibility of the North American Facilitie…

SEMI F21-1102 © SEMI 1995, 2001 4

RELATED INFORMATION 2

EXAMPLE OF AN ANALYSIS REPORT

NOTE: This related information is not an official part of SEMI F21 and is not intended to modify or supercede the official

standard. It has been derived from the work of the originating task force. Publication was authorized by full ballot procedures.

Determination of the suitability of the material is solely the responsibility of the user.

Analysis for compliance with SEMI Standard Classification MA-10:

Site : FAB 3

Test date and duration : 18 August 1994, 0800

–

1700, 9 hours

Contaminants measured : Hydrofluoric acid

1 pptm

Sulfuric acid

1 pptm

Hydrochloric acid 2 pptm

Nitric acid

1 pptm

Phosphoric acid

2 pptm

Hydrobromic acid

1 pptm

Total 8 pptm

Detection Limits : 1 pptm for each analyte

Confidence Level :

95%

Assumptions made : All acids determined as anions after water scrubbing;

anions can be from other sources but are assumed to

be in the acid form for reporting purposes.

Conclusion :

This environment meets the MA -10 criterion in

SEMI F21.

NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for

any particular application. The determination of the suitability of the standard is solely the responsibility of the user.

Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant

literature respecting any materials mentioned herein. These standards are subject to change without notice.

The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted

material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position

respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this

standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and

the risk of infringement of such rights, are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI F22-1102 © SEMI 1997, 2002 1

SEMI F22-1102

GUIDE FOR GAS DISTRIBUTION SYSTEMS

This guide was technically approved by the Global Facilities Committee and is the direct responsibility of the

North American Facilities Committee. Current edition approved by the North American Regional Standards

Committee on July 21, 2002. Initially available at www.semi.org October 2002; to be published November

2002. Originally published June 1997.

1 Purpose

1.1 This reference document is intended to outline for

the user the common systems configurations,

components, and subcomponents of high purity gas

distribution systems in a semiconductor fabrication

facility. Related specifications are also noted.

2 Scope

2.1 Outlined in this document are both bulk and

specialty gas distribution systems.

2.2 Components and subcomponents are identified

from the point-of-supply to the point-of-connection to

the process tool.

2.3 This standard does not purport to address safety

issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety health practices and determine the

applicability or regulatory limitations prior to use.

3 Limitations

3.1 The gas distribution system configurations noted in

this reference document are provided solely as a guide

to indicate common industry practice. They are not

presented as, or intended to be, a representation of best

engineering practice.

3.2 The reference documents noted are provided for

general guidance only and are not intended to portray a

code compliance protocol. The users should always

consult local authorities to determine specific

applicable codes and regulations. Agencies, regulatory

or otherwise, noted herein are representative only of the

U.S.

3.3 Specifications, SEMI Standards or other, are noted

to assist the user as a reference only.

4 Referenced Standards

None.

5 Terminology

5.1 Acronyms and Abbreviations

5.1.1 AOV — Air-operated valves

5.1.2 ASO — Automatic shutoff valve

5.1.3 POC — Point of connection

5.1.4 POU — Point of use

5.1.5 VMB — Valve manifold box

5.2 Definitions

5.2.1 air-operated valves (AOV) — are those which

require pneumatic energy to initiate or terminate flow

or to change flow path (e.g., normally closed, partially

open, double acting).

5.2.2 automatic shutoff valve (ASO) — a mechanically,

electrically, or pneumatically activated valve which has

the sole purpose of terminating flow if a predetermined

condition is exceeded. For cryogenic supply systems,

ASO’s are used in conjunction with a low temperature

sensing device.

5.2.3 check valve — a mechanical gas system

component which prevents reverse flow.

5.2.4 effluent treatment system — a device which,

through mechanical, chemical, cryogenic, absorbent, or

other means, abates hazardous gas effluent to

“environmentally safe levels” through dilution,

neutralization, entrapment, or distillation.

5.2.5 excess flow device — a mechanical or electrical

component which senses and signals an AOV or itself

to terminate flow in the event predetermined flow is

exceeded.

5.2.6 face seal fitting — a high purity fitting which

incorporates two machined faces and a metallic gasket

within a male/female nut configuration to attain a high

leak integrity seal.

5.2.7 filter — a porous device, generally constructed of

polymer, metal, or ceramics and housed in a metal

chamber, which traps particles, preventing them from

being transported downstream.

5.2.8 flow restrictor — a component, generally an

orifice, which prohibits gas flow beyond a

predetermined flow.

5.2.9 gas box — a gas distribution subsystem which

generally contains the final shut-off valve(s) prior to the

POC. It may also contain filter(s) and a regulator.

5.2.10 hazardous gas detectors — analytical

instruments which placed in strategic locations in and

around gas distribution systems and components are

used to detect potentially unnoticeable releases at

extremely low levels.

5.2.11 low temperature sensing device — a component

which protects the system downstream of the vaporizer

from cryogenic temperatures by initiating an alarm or

triggering a valve shut-down.

5.2.12 nitrogen generation plant — a system which,

generally through cryogenic distillation, separates and

purifies nitrogen from ambient air. Other air separation

techniques may be used but are not considered in this

document.

5.2.13 point of connection (POC) — is often used

interchangeably with POU, indicating the final

connection between the system and the process tool.

5.2.14 point of use (POU) — is often used

interchangeably with POC, indicating the final

connection between the system and the process tool.

5.2.15 pressure relief valve — a device which, at a

given design pressure set point, releases gas pressure to

prevent system over-pressurization.

5.2.16 pressure transducer — a component which

mechanically or electrically senses the pressure within a

gas system and transmits a signal to a readout or a

control device.

5.2.17 process gas panel — a subsystem, generally

contained within a gas cabinet, that delivers process gas

from the cylinder to the specialty gas distribution

system.

5.2.18 purifier — generally a catalytic, resinous, or

diatomaceous material within a pressure vessel which

removes particulate and/or trace gas impurities from a

gas stream.

5.2.19 regulator — generally a mechanical device

which alters the pressure within a gas system.

5.2.20 segregation — a practice in design and

operation to prevent non-compatible gases from co-

mingling.

5.2.21 tube trailer — a bulk gas supply system which

manifolds high pressure, DOT-specified, vessels

(cylindrical tubes) on a portable trailer.

5.2.22 vacuum generator — a component in a process

gas panel which, via a suction created by an inert gas

venturi, allows for evacuation of the gas system to

levels of 16.7 kPa (25" mercury) or less.

5.2.23 valve manifold box (VMB) — a gas distribution

subsystem designed to allow the distribution of a single

process cylinder gas to multiple process tools. Its

manifold design uses a series of valves (manual or

AOV), regulators, filters, and vacuum generator(s), and

may be controlled manually or automatically.

5.2.24 vaporizer — a component which, through heat

transfer, is designed to convert a cryogenic liquid to a

gas.