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SEMI P33-0998 © SEMI 1998 6 Figure 7 Measurem e nts for Cal culation of Parallelism with Approx imate Position s Figure 8 Corner Diagonal ly Opposi te of Cham fer
SEMI P33-0998 © SEMI 19985
Figure 5
Substrate Identification by Corner Chamfer(Non-Critical Side)
Figure 6
Dimension of Corner Chamfer
SEMI P33-0998 © SEMI 1998 6
Figure 7
Measurements for Calculation of Parallelism with Approximate Positions
Figure 8
Corner Diagonally Opposite of Chamfer
SEMI P33-0998 © SEMI 19987
APPENDIX 1
HARD SURFACE PHOTOMASK MATERIAL PROPERTIES
NOTE: This appendix was approved as an official part of SEMI P33 by full letter-ballot procedure.
Table A1-1 Material Properties
Property
Ultra Low Thermal Expansion (ULTE)
Modulus of Elasticity 6.7–7.4 × 10
3
kg/mm
2
Poisson’s Ratio 0.16–0.19
Specific Gravity 2.18–2.20 g/cm
3
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