semi合集-English.pdf - 第4117页

SEMI F61-0301 © SEMI 2001 2 4.2.9 dissolved solid s  contaminan t s in water that are so small that they are unifor m ly distributed, includ- ing ions and the smallest T OC and silica co m pound s. 4.2.10 dual -beds  a…

100%1 / 7923
SEMI F61-0301 © SEMI 20011
SEMI F61-0301
GUIDE FOR ULTRAPURE WATER SYSTEM USED IN
SEMICONDUCTOR PROCESSING
This guide was technically approved by the Global Facilities Committee and is the direct responsibility of the
North American Facilities Committee. Current edition approved by the North American Regional Standards
Committee on November 22, 2000. Initially available at www.semi.org December 2000; to be published
March 2001.
1 Purpose
1.1 This guide establishes the typical definitional
requirements for an ultrapure water (UPW) system used
in semiconductor manufacturing. It is intended to
establish a common basis for developing detailed
specifications in subsequent documents concerning
design, performance and certification and monitoring of
UPW systems.
1.2 This document may be used by users and suppliers
as a basis for developing site-specific UPW
specifications and performance criteria.
2 Scope
2.1 This guide applies to ultrapure water systems used
in semiconductor manufacturing facilities for supplying
high purity water for chemical dilutions, wafer
processing and other manufacturing processes.
2.2 This guide can be used to understand the design
elements and functionality of all UPW systems, which
includes a Reverse Osmosis (RO) and a Deionization
(DI) process. However, it is most applicable to newer
designed UPW systems that support submicron
linewidth device manufacturing.
2.3 This standard does not purport to address safety
issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory limitations prior to use.
3 Limitations
3.1 This guide does not define the actual specifications
generally negotiated between the user and the
manufacturer of the UPW system, against which water
samples are tested and qualification is passed.
3.2 This guide does not address the testing and
prequalification of materials, subassemblies, or
components used in a UPW system.
3.3 This guide does not address the protocols and
requirements defined by the manufacturer concerning
the installation of the UPW system.
3.4 This guide does not address the type, level, or
frequency of testing necessary and appropriate for
ongoing monitoring of a UPW system.
3.5 This guide does not address the frequency or scope
of ongoing maintenance for UPW systems including
change out of resin beds and replacement of filters.
3.6 This guide does not intend to cover any of the
important safety considerations that relate to the proper
installation, operation, or maintenance of a UPW
system.
4 Terminology
4.1 Acronyms and Abbreviations
4.1.1 TOC Total organic carbon, also Total
Oxidizable Carbon. Refers to organic compounds.
4.1.2 UPW — Ultrapure Water System consisting of
multiple components including a Reverse Osmosis
(RO) and a Deionization (DI) process.
4.2 Definitions
4.2.1 activated Carbon a media filter used to
remove oxidizing agents, like chlorine and chloramines,
and remove (adsorb) certain TOC compounds.
4.2.2 anion a negatively charged ion.
4.2.3 cation a positively charged ion.
4.2.4 clarifier a piece of water treatment
equipment, typically used at municipal drinking water
plants, to remove suspended solids from surface water
and/or to soften surface water.
4.2.5 degasification the removal of a certain
amount of volatile compounds dissolved in water.
4.2.6 deionization (DI) the removal of undesirable
ions from water.
4.2.7 DI storage generally refers to a storage tank
that contains DI water, located between the primary and
polishing ion exchange subsystems.
4.2.8 DI (deionized) water generally refers to water
that has passed through a full-train ion exchange system
or RO water that has been polished by ion exchange.
SEMI F61-0301 © SEMI 2001 2
4.2.9 dissolved solids contaminants in water that
are so small that they are uniformly distributed, includ-
ing ions and the smallest TOC and silica compounds.
4.2.10 dual-beds an ion exchange scheme where a
cation exchange unit is followed by an anion exchange
unit.
4.2.11 electrodeionization (EDI) a water treatment
technology that utilizes mixed-bed ion exchange plus
an electrical potential to remove undesirable dissolved
solids. Also referred to in the industry as CDI
(Continuous Deionization).
4.2.12 filtration the removal of suspended solids by
passing water through some form of solid or semi-solid
medium.
4.2.13 final filter generally the final treatment step
in a UPW system; used to remove suspended solids.
4.2.14 full-train DI an ion exchange scheme where
a cation exchange unit is followed by an anion
exchange unit and a mixed-bed ion exchange unit.
4.2.15 ground water water located below the
surface of the earth, also called well water.
4.2.16 heat exchanger a piece of equipment used to
control the temperature of a water stream.
4.2.17 ion exchange a water treatment technology
used in a high-purity water treatment application to
exchange undesirable cations for hydrogen ions and
undesirable anions for hydroxide ions.
4.2.18 loop the distribution system that includes the
continuous circulation of UPW from the Final Filter
back to the DI storage tank. End users draw off of the
loop.
4.2.19 low-pressure UV units units that use UV
lamps that have a slight vacuum within. Typically,
low-pressure lamps are called 254 nm for ozone
destruction and bacterial inactivation or 185 nm for
TOC reduction.
4.2.20 medium-pressure UV units units that use UV
lamps that have a positive pressure within. Used with
bacterial inactivation/ozone destruction lamps or TOC
reduction lamps.
4.2.21 microfiltration generally refers to filters
designed to remove suspended solids less then one
micron in size but greater than 0.1 micron in size.
4.2.22 mixed-beds ion exchange vessels used to
polish already purified water, in which both cation and
anion exchange occurs.
4.2.23 multimedia filter generally refers to a
suspended-solids removal piece of equipment that
contains two or more filtering media such as anthracite
and sand, or anthracite, sand and garnet.
4.2.24 Ozone Ozone (O
3
) may be injected into the
Supply and/or Return line to control microbiological
contaminants and also to enhance the action of TOC
breakdown in downstream TOC reducing UV units.
4.2.25 polishing ion exchange a cation/anion
exchange step located downstream of primary ion
exchange.
4.2.26 pretreated water generally refers to treated
water that is fed to reverse osmosis (RO) units.
4.2.27 primary ion exchange the first cation/anion
exchange step in a high purity water treatment scheme.
4.2.28 raw water any untreated natural water like
river water, lake water, ground water, or seawater.
May also refer to the treated feed water that enters a
plant from a municipal drinking water source or other
source.
4.2.29 return the UPW sent to but not used by end
users that returns to the DI storage tank.
4.2.30 reverse osmosis (RO) a filtration technology
that utilizes a semi-permeable membrane to remove
essentially all suspended solids and the vast majority of
all dissolved solids. Generally refers to water
(permeate) that has passed through a reverse osmosis
(RO) membrane.
4.2.31 RO storage generally refers to a storage tank
that contains RO water.
4.2.32 scale inhibitor a chemical used to minimize
or eliminate the precipitation of slightly-soluble salts,
like calcium carbonate (limestone) or calcium sulfate
(gypsum), within water treatment equipment
.
4.2.33 supply the UPW sent to end users.
4.2.34 surface water water located on the surface
of the earth, such as river water, lake water, and
seawater.
4.2.35 TOC total organic carbon, also Total
Oxidizable Carbon. Refers to organic compounds.
4.2.36 treated water water that has passed through
water treatment equipment and/or received chemical
injections in order to modify the dissolved and/or
suspended solids content of the water.
4.2.37 ultrafiltration generally refers to filters
designed to remove all submicron suspended solids.
4.2.38 ultraviolet (UV) electromagnetic energy
with around a 100–400 nm (nanometer) wavelength.
SEMI F61-0301 © SEMI 20013
4.2.39 UPW (ultra pure water) the highest purity
water produced by a semiconductor water treatment
system, which is sent to the end users for use in
manufacturing.
5 General Requirements
5.1 Materials
Components of the UPW system
must be appropriate to the application and conform to
electrical, mechanical, and purity requirements, as well
as the corrosive properties of the UPW chemistry.
These requirements are defined by the physical
installation environment, local and national code
interpretations, process requirements, and delivery
specifications.
5.2 System Installation The UPW system is
installed according to a protocol that ensures
mechanical integrity, leakproof operation, and no or
minimal contamination being added from distribution
throughout the system.
5.3 Acceptance Tests Acceptance tests are
conducted on each subsystem or system produced. Such
tests may include performance demonstrations,
demonstrations of reliability criteria, and achievement
of purity standards. Such tests are the basis for
acceptance or rejection by the purchaser against a pre-
negotiated set of criteria for the performance of the
system.
5.4 Qualification Testing Qualification testing may
include tests for resistivity, temperature, pressure, TOC,
dissolved oxygen, particle levels, bacteria, total silica,
dissolved silica, non-volatile residue, ions, and metals.
5.5 Monitoring UPW systems are monitored for
continuing performance against desired and achievable
levels of quality. Action limits are generally set to
determine when system performance suggests that
corrective action is required.
5.6 UPW specifications UPW systems are generally
guaranteed to deliver a certain quality of water on an
ongoing basis. The guaranteed performance is
established in advance between the UPW equipment
manufacturer and the system owner. Both qualification
testing and monitoring testing use the guaranteed
specifications to determine the parameters and levels of
purity to be tested.
5.7 Recycle/Reclaim Opportunitie s
There can be
several opportunities for using water within a UPW
system, and should be recognized during the design
phase when possible. Examples are; use of 1
st
pass
reject for cooling tower make-up water, returning UF
reject to Primary or Feed water Tank, re-use of last
stage rinse waters as UPW for lower grade use areas,
i.e., CMP, isolation of CMP waste stream, for possible
reclaim/reuse.
6 Source Water
6.1 Raw Water
is the raw material from which
UPW is made. Untreated raw water is natural water
that is obtained from a surface source such as a lake or
river, or from a ground water source. The raw water to
a UPW system is most frequently treated Municipal
Drinking Water.
6.2 Municipal Drinking Water Most natural raw
waters must be treated in order to produce drinking
water that meets federal and state requirements. There
are upper limits for inorganic contaminants (e.g.,
asbestos, arsenic, copper, and lead), pesticides, volatile
organic chemicals (e.g., benzene, trichloroethylene,
toluene, and xylene), turbidity, microbiological
contaminants, and radiological contaminants (e.g.,
radon 226, radon 228, tritium, and strontium 90).
Municipal Water Treatment may utilize only
chlorination, or filtration and chlorination for certain
ground water sources. For many surface water sources,
coagulation (injection of aluminum or iron salts),
flocculation (injection of a long-chain polymer),
sedimentation, lime or lime/soda ash softening,
filtration, chlorination or chloramination (chlorine plus
ammonia) and other steps may be required.
7 Major Treatment Processe s
7.1 Pretreatment includes all of the water treatment
steps ahead of the Reverse Osmosis Membrane
Treatment step. These steps are primarily required to
protect the membrane units from scaling with sparingly
soluble salts, fouling with living or non-living
suspended particles, or chemical attack by pH,
oxidizing agents or other dissolved contaminants.
Pretreatment equipment may include media filtration,
micro filtration, or ultrafiltration (bulk suspended solids
removal), 1–5 micron cartridge filtration (polishing step
for suspended solids removal), sodium-cycle cation
exchange (softening, to remove scale-forming cations),
acid injection (to minimize cellulose acetate membrane
damage and/or to control carbonate scales), scale
inhibitor injection (to control scaling), activated carbon
filtration (to remove oxidizing agents and certain
organic molecules), and sulfite ion injection (to remove
oxidizing agents).
7.2 Reverse osmosis Membrane Treatment provides
extremely high rejection of dissolved ions (charged
atoms and molecules), organic (carbon containing)
compounds, silica (silicon containing) compounds, and
virtually complete rejection of suspended contaminants,
but will not reject dissolved gases and volatile organic
compounds as well. Reverse osmosis (RO) units may