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SEMI P10-0705 © SEMI 1990, 2005 150 8.1.788 TRANSMISSION_RANGE — For phase shift masks, the maxim um acceptable variation of all percent transmission measurements, relative to eac h other. 8.1.789 TRANSMISSION_REFERENCE_…

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8.1.766 TITLE_JUSTIFICATION — (L or R) Left or right justification within the writable field, before mirroring
and before rotation.
8.1.767 TITLE_LOCATION — (x,y) Location of the lower left corner of TITLE_TEXT in the associated
<title_data> (before mirroring or rotation), relative to nominal center of mask (chrome side up).
8.1.768 TITLE_MAG — Numeric magnification to the standard font size for the mask writer in writing
TITLE_TEXT. This item should not be used in conjunction with TITLE_HEIGHT for the same MASK_SET_ID.
8.1.769 TITLE_TEXT — (text) Alphanumeric contents of human-readable text on the mask.
8.1.770 TITLE_TYPE — (MASK, DEVICE, LAYER, DATE_TIME, SOFTWARE, SERIAL_NUMBER,
AUXILIARY)
8.1.771 TOP_PELLICLE_CENTRALITY_ERROR — (x,y,rotation) Maximum misplacement in micrometers and
microradians of pellicle mounting, relative to the nominal center of the mask.
8.1.772 TOP_PELLICLE_TYPE — Alphanumeric brand and model of acceptable pellicle for the patterned side of
the mask. If multiple pellicles are listed, they are prioritized with the most preferred first and least preferred last.
8.1.773 TOP_PELLICLE_USED — (text) The pellicle vendor’s part number of the pellicle applied to the patterned
surface of the mask.
8.1.774 TRANSMISSION_DEFECT_CLEAR — Maximum allowable percent transmission of light through a clear
defect.
8.1.775 TRANSMISSION_DEFECT_DARK — Maximum allowable percent blocking of light through a dark
defect.
8.1.776 TRANSMISSION_EQUIP_REQD — (text) Transmission measurement equipment required by customer.
8.1.777 TRANSMISSION_EQUIP_USED — (text) Transmission measurement equipment used.
8.1.778 TRANSMISSION_ERROR — For phase shift masks, the maximum acceptable deviation of any percent
transmission measurement from the TRANSMISSION_TARGET.
8.1.779 TRANSMISSION_MARK_DRAWING — The uniquely identified (for each customer) document which
shows the transmission mark structure itself, and may show the place(s) within the transmission mark which are to
be measured.
8.1.780 TRANSMISSION_MARK_FEATURE — Text describing the feature to be used for transmission
measurement.
8.1.781 TRANSMISSION_MARK_LOCATION — (x,y) Location of transmission mark location relative to the
nominal center of the mask (chrome side up).
8.1.782 TRANSMISSION_MARK_LOCATION_DRAWING — The uniquely identified (for each customer)
document which shows the location(s) of the transmission mark structure.
8.1.783 TRANSMISSION_MARK_SITE_ID — Unique alphanumeric identifier of each transmission measurement
location within MASK_SET_ID to identify individual locations when using <mask_results>. If the same
coordinates apply to locations on different masks within the mask set, they may have the same
TRANSMISSION_MARK_SITE_ID, but it is not mandatory.
8.1.784 TRANSMISSION_MEASUREMENT_DATE — Transmission measurement date.
8.1.785 TRANSMISSION_MEASUREMENT_FILE_NAME — Name of data file containing results of
transmission measurement.
8.1.786
TRANSMISSION_MODE_REQD — (text) Operating mode required by customer for
TRANSMISSION_EQUIP_USED.
8.1.787 TRANSMISSION_MODE_USED — (text) Operating mode used on TRANSMISSION_EQUIP_USED
operating mode.
SEMI P10-0705 © SEMI 1990, 2005 150
8.1.788 TRANSMISSION_RANGE — For phase shift masks, the maximum acceptable variation of all percent
transmission measurements, relative to each other.
8.1.789 TRANSMISSION_REFERENCE_ONLY — (T or F) If T, indicates that the transmission feature is to be
measured and the data transmitted to the customer (if requested by SHIP_PHASE_SHIFT_MEASUREMENTS), but
that deviations in its measured value due to mask processing would NOT be cause for mask rejection.
8.1.790 TRANSMISSION_TARGET — For phase shift masks, the required percent transmission of light at the
specified PSM_WAVELENGTH compared to quartz.
8.1.791 TRANSMISSION_TOLERANCE — For phase shift masks, the maximum acceptable deviation of the
mean of all percent transmission measurements to the TRANSMISSION_TARGET.
8.1.792 UNSCALED_PATTERN_SIZE — (x,y) Unscaled size of the pattern file. If this is incorrect, the mask will
not be written until it is corrected.
8.1.793 USER_UNIT — To be used for fracturing DATABASE_SOURCE into inspection data, as required by
some inspection systems.
8.1.794 UT1X_UNCUT — (T or F) If T, indicates that the reticle is to be delivered uncut (i.e., 5 inch square) size.
If F, or if the keyword is absent, the reticle is to be delivered in the 3 inch by 5 inch size.
8.1.795 VENDOR — The name of the company from which the masks are ordered.
8.1.796 VENDOR_ADDRESS — Address for VENDOR_CONTACT.
8.1.797 VENDOR_CONTACT — Name of person to contact regarding the mask.
8.1.798 VENDOR_EMAIL — Internet address for VENDOR.
8.1.799 VENDOR_FAX — Phone number for facsimile machine of VENDOR.
8.1.800 VENDOR_ORDER_ID — (text) The mask vendor’s order identification used to track the mask order in
manufacturing.
8.1.801 VENDOR_PHONE — Phone number for VENDOR_CONTACT.
8.1.802 VIRTUAL_ADDRESS — (T or F) Designates whether “virtual addressing” option is to be used to write
the pattern. If T, then the pattern will be written with a writing grid twice the nominal size of the pattern but in such
a way that the overall dimensions of the pattern and its internal features are preserved. This option is used only by
MEBES systems and is usually limited to writing grids no larger than 0.25 micron.
8.1.803 VISUAL_INSP_CRITERIA — (text) The part of the mask to inspect visually (e.g., “5 mm border”).
8.1.804 VISUAL_INSPECTION_OK — (T or F) If T, the area of the preceding pattern may be inspected visually
and/or automatically at the vendor’s option. VISUAL_INSPECTION_OK is not allowed if either
VISUAL_INSPECTION_REQD or AUTO_INSPECTION_REQD is T (true).
8.1.805 VISUAL_INSPECTION_REQD — (T or F) Visual, microscopic inspection of the mask for defects is
required.
8.1.806 WAFER_EXPOSURE_ILLUMINATION — (STANDARD, ANNULAR, DIPOLE, QUADRAPOLE, and
others on request) Illumination configuration of the scanner, stepper or aligner on which the mask is to be used. If
ANNULAR, then both WAFER_EXPOSURE_SIGMA_INNER and WAFER_EXPOSURE_SIGMA_OUTER are
required. If not ANNULAR, then only WAFER_EXPOSURE_SIGMA is required.
8.1.807 WAFER_EXPOSURE_NUMERICAL_APERATURE — Numerical aperture in nanometers of the scanner,
stepper or aligner on which the mask is to be used.
8.1.808 WAFER_EXPOSURE_SIGMA — Partial coherence of the scanner, stepper or aligner on which the mask
is to be used. (This is a unitless parameter.)
8.1.809 WAFER_EXPOSURE_SIGMA_INNER — Inner partial coherence of the scanner, stepper or aligner on
which the mask is to be used. (This is a unitless parameter.)
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8.1.810 WAFER_EXPOSURE_SIGMA_OUTER — Outer partial coherence of the scanner, stepper or aligner on
which the mask is to be used. (This is a unitless parameter.)
8.1.811 WAFER_EXPOSURE_TOOL — Alphanumeric brand and model of the scanner, stepper or aligner on
which the mask is to be used.
8.1.812 WAFER_FAB — (text) Identification of the customer’s wafer fab at which the mask(s) are intended to be
used.
8.1.813 WAIVER — The uniquely identified (for each customer) document which describes specifications which
may be ignored by the vendor.
8.1.814 WAIVER_OVERRIDE — The uniquely identified (for each customer) document which describes
specifications which usually may be ignored by the vendor, but in this case may NOT be ignored by the vendor.
This keyword cancels the effect of the waiver only within the scope of its application in <mask_order>.
8.1.815 WEB_ADDRESS — URL address.
8.1.816 WRITE_DATE_TIME — Date and time at which mask exposure began on the lithography tool.
9 Computing the Checksum
9.1 The cyclic checksum is computed as follows:
9.1.1 Initialize the 16 bit checksum value to zero. Consider all the records in the data file from START_ORDER
through END_ORDER, inclusive. Consider each ASCII character up to and including the “new_line” character.
Convert each character to its ASCII numeric equivalent (e.g., space is 32 decimal, “A” is 65 decimal, etc.) Use the
value 10 decimal for the new_line function regardless of its internal representation (e.g., CR LF). Use only the 7 bit
ASCII representation for each character (i.e., ignore the high order bit in an 8 bit byte).
9.1.2 XOR each of the characters from each of the records in sequence, from the first character in the
START_ORDER record to the new_line character in the END_ORDER record. Before each character is XORed
with the checksum, circularly rotate the previous value of the accumulated 16 bit checksum one bit to the left.
9.1.3 After all of the above characters have been accumulated into the checksum, convert it as an unsigned 16 bit
integer into the ASCII representation of its decimal value. This ASCII string is the data field following the
CHECKSUM keyword, the last record in the mask order structure.