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SEMI P10-0705 © SEMI 1990, 2005 139 8.1.544 REGISTR_ CLOSURE_REFERENCE_ONLY — (T or F) If T, indicates that the closure measurements are to be measured and the data transmitted to th e cust omer (if requested by S HIP_CL…

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SEMI P10-0705 © SEMI 1990, 2005 138
8.1.526 PRODUCT_IMAGING_TYPE — (BINARY, AAPSM, EAPSM, COMPLIMENTARY, BINARY_TRIM,
or EUV)
8.1.527 PRODUCT_MAGNIFICATION — (10X, 5X, 4X, 2.5X, 2X, 1.25X, 1X, 0.8X) Factor by which the
exposure tool will reduce the image on the photomask (reticle) to form the image on the wafer.
8.1.528 PRODUCT_TYPE — (1X_FULL_FIELD, 1X_STD_FIELD_RETICLE, 1X_WIDE_FIELD_RETICLE,
RETICLE, CONTACT, SUBMASTER, CHECKPLATE, PROBE_PLATE, REPELLICLIZE and REINSPECT).
8.1.529 PSM_WAVELENGTH — Wavelength in nanometers to be used for <phase_shift> measurements. This
keyword may appear in addition to AIM_WAVELENGTH for a single MASK_ID, though the values of the two
should usually be the same.
8.1.530 PTC_FIXED — (numeric) The additional charge for the mask shipping within the time defined in the
corresponding PTC_HOURS. The value is expressed as a fixed monetary amount and is mutually exclusive with
PTC_RATE.
8.1.531 PTC_HOURS — (numeric) The number of hours from a given mask’s start date time (as negotiated
between the customer and vendor) within which the mask must be shipped to qualify for the Premium Time Charge
(PTC) specified in either PTC_RATE or PTC_FIXED. Multiple instances allow configuration of different charge
rates for different levels of performance, for example: 100 % for 12 hr turn, 75 % for 18 hr turn, 50 % for 24 hr turn.
8.1.532 PTC_RATE — (numeric) The additional charge for the mask shipping within the time defined in the
corresponding PTC_HOURS. The value represents the percentage of the total mask price (excluding
EWT_THRESHOLD hours) and is mutually exclusive with PTC_FIXED.
8.1.533 QS9000 — (T or F) If T, requires QS9000 control. Customer and vendor should agree on the methods and
control details before using this item.
8.1.534 QUALITY_GROUP_ID — (text) Customer’s label for a collection of mask quality specifications, to be
used only in addition to explicit quality requirement keywords. This may be used in the data structure in addition to,
but not in place of, explicit quality requirement keywords. Customer and vendor should document the meaning of
this quality grade before using it in SEMI P10.
8.1.535 QUANTITY — Integer number of array plots, pattern plots and films. May also apply to masks only when
PRODUCT_TYPE is contact masks.
8.1.536 QUOTE_NUMBER — Vendor’s quotation number to be referenced in billing documents.
8.1.537 REGISTR_ALGORITHM — (ONE-POINT, TWO-POINT or MULTI-POINT, x1,y1,x2,y2) Specifies the
method for analyzing registration reference marks. For ONE-POINT analysis, (x1,y1) is the fixed point and (x2,y2)
is used for angular orientation only. For TWO-POINT analysis, (x1,y1) and (x2,y2) are both used for angular
orientation and the fixed reference point is midway between the two. If MULTI-POINT is followed in the data field
by no specific points, then MULTI-POINT is the fit of all measured points resulting in zero mean error in x and zero
mean error in y. If MULTI-POINT is followed in the data field by a collection of three or more specific points, then
MULTI-POINT is the fit of all the specific points resulting in zero mean error in x and zero mean error in y for those
points. All of these points are relative to the nominal center of the mask.
8.1.538 REGISTR_ALGORITHM_USED — The method used for analyzing registration reference marks in the
registration measurements.
8.1.539 REGISTR_CLOSURE — Maximum allowable positional error between patterns written at the beginning of
writing the mask and the end of writing the mask, to be measured in both x and y axes.
8.1.540 REGISTR_CLOSURE_BEGIN — Identifies the CELL_ID or PATTERN_GROUP_ID to be used at the
beginning of writing the mask for REGISTR_CLOSURE measurement.
8.1.541 REGISTR_CLOSURE_END — Identifies the CELL_ID or PATTERN_GROUP_ID to be used at the end
of writing the mask for REGISTR_CLOSURE measurement.
8.1.542 REGISTR_CLOSURE_EQUIP_REQD — Alphanumeric identification of acceptable equipment for closure
measurement.
8.1.543 REGISTR_CLOSURE_EQUIP_USED — Closure measurement equipment used.
SEMI P10-0705 © SEMI 1990, 2005 139
8.1.544 REGISTR_CLOSURE_REFERENCE_ONLY — (T or F) If T, indicates that the closure measurements are
to be measured and the data transmitted to the customer (if requested by SHIP_CLOSURE_DATA), but that
deviations in its measured value due to mask processing would NOT be cause for mask rejection.
8.1.545 REGISTR_COMPENSATION_TEMPERATURE — Temperature in Celsius of the mask at the time
registration measurement data is to be collected.
8.1.546 REGISTR_EQUIP_REQD — Alphanumeric identification of acceptable equipment for measuring
REGISTR_ERROR and REGISTR_ORTHO.
8.1.547 REGISTR_EQUIP_USED — Registration measurement equipment used.
8.1.548 REGISTR_ERROR — Maximum allowable registration error, relative to the REGISTR_REF_MASK_ID
or the reference grid of REGISTR_EQUIP_REQD. The mask must be rejected if the deviation in either X or Y of
any measured registration mark exceeds REGISTR_ERROR.
8.1.549 REGISTR_MARK_COUNT — (x,y) For a rectangular array of registration marks, the number of rows (x)
and columns (y).
8.1.550 REGISTR_MARK_DRAWING — The uniquely identified (for each customer) document which shows the
registration mark structure itself, and may show the place(s) within the registration mark which are to be measured.
8.1.551 REGISTR_MARK_FEATURE — Text describing the feature to be used for registration measurement.
8.1.552 REGISTR_MARK_ID — Unique alphanumeric identifier of each registration mark location within
MASK_SET_ID to identify individual registration measurements when using <mask_results>. If the same
coordinates apply to locations on different masks within the mask set, they may have the same
REGISTR_MARK_ID, but it is not mandatory. If REGISTR_MARK_ID is used with a CELL_REGISTR_MARK,
it will be associated with as many mask locations as the cell has instances. (See
MEASURED_REGISTR_MARK_ID for more information.) REGISTR_MARK_ID may only be used immediately
preceding either MASK_REGISTR_MARK or CELL_REGISTR_MARK.
8.1.553 REGISTR_MARK_LOCATION_DRAWING — The uniquely identified (for each customer) document
which shows the location(s) of the registration mark structure.
8.1.554 REGISTR_MARK_SEPARATION — (x, y) For an array of registration marks, the spacing between
successive marks in the horizontal (x) and vertical (y) directions.
8.1.555 REGISTR_MEASUREMENT_DATE — Date registration measurement was performed.
8.1.556 REGISTR_ORTHO — Maximum allowable non-orthogonality, in micro-radians, relative to the
REGISTR_REF_MASK_ID or the reference grid of REGISTR_EQUIP_REQD.
8.1.557 REGISTR_ORTHO_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_ORTHO is to be
measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection.
8.1.558 REGISTR_QUALITY_ID — (text) Customer’s label for a collection of registration quality specifications,
to be used only in addition to explicit quality requirement keywords. This may be used in the data structure in
addition to, but not in place of, explicit quality requirement keywords. This may not be used
in combination with
QUALITY_GROUP_ID. Customer and vendor should document the meaning of this quality grade before using it in
SEMI P10.
8.1.559 REGISTR_REF_MASK_ID — MASK_ID of the reference mask for determining REGISTR_ERROR and
REGISTR_ORTHO. If multiple masks are identified, the reference grid should be based on the mean of the
measurements of the group of masks.
8.1.560 REGISTR_REF_MASK_NAME — To be used in place of REGISTR_REF_MASK_ID only to refer to
those mask sets which were built outside the SEMI order standard and have no MASK_ID.
8.1.561 REGISTR_REF_MASK_SET_ID — MASK_SET_ID for the mask set containing
REGISTR_REF_MASK_ID for determining REGISTR_ERROR and REGISTR_ORTHO.
SEMI P10-0705 © SEMI 1990, 2005 140
8.1.562 REGISTR_REF_MASK_SET_NAME — To be used in place of REGISTR_-REF_MASK_SET_ID only
to refer to those mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.563 REGISTR_REF_MASK_SET_VERSION — To be used in addition to REGISTR_-
REF_MASK_SET_NAME only to refer to those mask sets which were built outside the SEMI order standard and
have no MASK_SET_ID.
8.1.564 REGISTR_REF_METHOD_REQD — Alphanumeric description of the method and/or reference marks to
use for measuring REGISTR_-ERROR and REGISTR_ORTHO (e.g., using a previously established reference, or
the REGISTR_-EQUIP_REQD grid).
8.1.565 REGISTR_REF_METHOD_USED — Alphanumeric description of the method and/or reference marks
used by the vendor for measuring REGISTR_ERROR and REGISTR_ORTHO.
8.1.566 REGISTR_RELATIVE — If present, indicates that the START_REGISTR collection in which
REGISTR_RELATIVE is contained is to be measured relative to another START_REGISTR collection, rather than
to the grid of the registration measurement tool. The alphanumeric data field of REGISTR_RELATIVE must match
the data field of START_REGISTR of the collection to which it is to be compared.
8.1.567 REGISTR_RELATIVE_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_RELATIVE is to
be measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in
its measured value due to mask processing would NOT be cause for mask rejection.
8.1.568 REGISTR_RESIDUAL — (x,y) The maximum acceptable deviation in both axes (in microns) of all
registration measurements relative to the REGISTR_STD_GRID, with REGISTR_SCALE and REGISTR_ORTHO
removed. The mask must be rejected if the residual deviation in either X or Y of any measured registration mark
exceeds REGISTR_RESIDUAL.
8.1.569 REGISTR_RESIDUAL_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_RESIDUAL is to
be measured and the data transmitted to the customer (if requested by SHIP_REGISTR_DATA), but that deviations in
its measured value due to mask processing would NOT be cause for mask rejection.
8.1.570 REGISTR_RESIDUAL_THREE_SIGMA — (x,y) The maximum acceptable 3 sigma deviation in both
axes (in microns) of all registration measurements, with REGISTR_SCALE and REGISTR_ORTHO removed. The
mask must be rejected if the residual 3 sigma deviation in either X or Y exceeds REGISTR_RESIDUAL.
8.1.571 REGISTR_RESIDUAL_THREE_SIGMA_REFERENCE_ONLY — (T or F) If T, indicates that
REGISTR_RESIDUAL_THREE_SIGMA is to be measured and the data transmitted to the customer (if requested
by SHIP_REGISTR_DATA), but that deviations in its measured value due to mask processing would NOT be cause
for mask rejection.
8.1.572 REGISTR_SCALE — (x,y) Maximum acceptable scale error in each axis in parts per million, relative to
the REGISTR_STD_GRID.
8.1.573 REGISTR_SCALE_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_SCALE is to be
measured and the data transmitted to the customer (if requested by SHIP_REGISTR_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection.
8.1.574 REGISTR_STD_GRID — (NIST, PTB and others on request) reference standard to be used to correlate
registration measurement. This keyword is not allowed in conjunction with REGISTR_REF_METHOD_REQD on
the same mask.
8.1.575 REGISTR_STD_GRID_USED — (NIST, NBS, and others on request) The reference standard used to
correlate the registration measurements.
8.1.576 REGISTR_THREE_SIGMA — (x,y) The maximum acceptable 3 sigma deviation in both axes (in microns)
of all registration measurements. Both the 3 sigma deviation in x and the 3 sigma deviation in y must be less than
REGISTR_THREE_SIGMA for the mask to be acceptable.
8.1.577 REGISTR_THREE_SIGMA_REFERENCE_ONLY — (T or F) If T, indicates that
REGISTR_THREE_SIGMA is to be measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in its measured value due to mask processing would NOT be cause for
mask rejection.