semi合集-English.pdf - 第5980页

SEMI P42-0304 © SEMI 2004 13 ReticleID ReticleT ype ReticleMarkT ype ReticleMarkID ReticleDesign BarCod e ReticleName ReticleSize Size UnitType Reti cleInformati on Projectio nMagnification FileName MarkUseRule Align men…

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SEMI P42-0304 © SEMI 2004 12
ShotAreaID
ReticleID
ShotAreaSize
X
Y
UnitType
ShotMap
ShotAreaInformation
ShotAreaShift
X
Y
UnitType
ShotAreaPositionShift
X
Y
UnitType
ShotAreaID
C
R
ShotLocation
ShotPosition
X
Y
UnitType
ShotID
ShotInformation
rdm
SEMI P42-0304 © SEMI 2004 13
ReticleID
ReticleType
ReticleMarkType
ReticleMarkID ReticleDesign
BarCode
ReticleName
ReticleSize
Size
UnitType
ReticleInformation
ProjectionMagnification
FileName
MarkUseRule
AlignmentMarkDesign
AlignmentMark
Information
Comment
Wa
f
erMarkType
Group
AlignmentMarkID
WaferMark
Position
Y
X
X-Mark
Y
X
Y-Mark
UnitType
SEMI P42-0304 © SEMI 2004 14
Alignment USE Mark
AlignmentMark
Information
Comment
WaferMarkType
Group
Ali
g
nmentMarkID
Wa
f
erMark
Position
Y
X
X-Mark
Y
X
Y-Mark
Unit Type
R1-2 XML Description Sample
This sample is provided with the repetitive description of <ShotID>S76 from <ShotID>S9 not repeated.
<?xml version="1.0" encoding="UTF-8"?>
<rfd:rdm xmlns:rfd="file://XML\SEMI_Samples\SemiSEMI" xmlns:xsi="http://www.w3.org/2001/XMLSchema-
instance" xsi:schemaLocation="file://XML\SEMI_Samples\SemiSEMI
C:\XML\SEMI_Samples\SEMIReticleFlameData.xsd">
<FormulationInformation>
<Date>2003-12-03T13:20:00+08:00</Date>
<Person>H.HIGASHINO</Person>
</FormulationInformation>
<UseExposureMachine>
<MachineTypeInformation>NSR-xxxxxx</MachineTypeInformation>
</UseExposureMachine>
<ShotMap>
<WaferInformation>
<WaferType>SEMI/notch</WaferType>
<WaferSize>
<Size>8</Size>
<UnitType>inch</UnitType>
</WaferSize>
<EdgeClearance>
<Clearance>3</Clearance>
<UnitType>mm</UnitType>
</EdgeClearance>
<WaferThickness>
<Thickness>725</Thickness>
<UnitType>um</UnitType>
</WaferThickness>
<WaferRotation>0</WaferRotation>