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SEMI P10-0705 © SEMI 1990, 2005 141 8.1.578 REGISTR_TOLERANCE — Maximum acceptable de viation of t he mean registration error of all measured registration marks, in both axes, relative to th e REGISTR_REF_MASK_ID or the …

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SEMI P10-0705 © SEMI 1990, 2005 140
8.1.562 REGISTR_REF_MASK_SET_NAME — To be used in place of REGISTR_-REF_MASK_SET_ID only
to refer to those mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.563 REGISTR_REF_MASK_SET_VERSION — To be used in addition to REGISTR_-
REF_MASK_SET_NAME only to refer to those mask sets which were built outside the SEMI order standard and
have no MASK_SET_ID.
8.1.564 REGISTR_REF_METHOD_REQD — Alphanumeric description of the method and/or reference marks to
use for measuring REGISTR_-ERROR and REGISTR_ORTHO (e.g., using a previously established reference, or
the REGISTR_-EQUIP_REQD grid).
8.1.565 REGISTR_REF_METHOD_USED — Alphanumeric description of the method and/or reference marks
used by the vendor for measuring REGISTR_ERROR and REGISTR_ORTHO.
8.1.566 REGISTR_RELATIVE — If present, indicates that the START_REGISTR collection in which
REGISTR_RELATIVE is contained is to be measured relative to another START_REGISTR collection, rather than
to the grid of the registration measurement tool. The alphanumeric data field of REGISTR_RELATIVE must match
the data field of START_REGISTR of the collection to which it is to be compared.
8.1.567 REGISTR_RELATIVE_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_RELATIVE is to
be measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in
its measured value due to mask processing would NOT be cause for mask rejection.
8.1.568 REGISTR_RESIDUAL — (x,y) The maximum acceptable deviation in both axes (in microns) of all
registration measurements relative to the REGISTR_STD_GRID, with REGISTR_SCALE and REGISTR_ORTHO
removed. The mask must be rejected if the residual deviation in either X or Y of any measured registration mark
exceeds REGISTR_RESIDUAL.
8.1.569 REGISTR_RESIDUAL_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_RESIDUAL is to
be measured and the data transmitted to the customer (if requested by SHIP_REGISTR_DATA), but that deviations in
its measured value due to mask processing would NOT be cause for mask rejection.
8.1.570 REGISTR_RESIDUAL_THREE_SIGMA — (x,y) The maximum acceptable 3 sigma deviation in both
axes (in microns) of all registration measurements, with REGISTR_SCALE and REGISTR_ORTHO removed. The
mask must be rejected if the residual 3 sigma deviation in either X or Y exceeds REGISTR_RESIDUAL.
8.1.571 REGISTR_RESIDUAL_THREE_SIGMA_REFERENCE_ONLY — (T or F) If T, indicates that
REGISTR_RESIDUAL_THREE_SIGMA is to be measured and the data transmitted to the customer (if requested
by SHIP_REGISTR_DATA), but that deviations in its measured value due to mask processing would NOT be cause
for mask rejection.
8.1.572 REGISTR_SCALE — (x,y) Maximum acceptable scale error in each axis in parts per million, relative to
the REGISTR_STD_GRID.
8.1.573 REGISTR_SCALE_REFERENCE_ONLY — (T or F) If T, indicates that REGISTR_SCALE is to be
measured and the data transmitted to the customer (if requested by SHIP_REGISTR_DATA), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection.
8.1.574 REGISTR_STD_GRID — (NIST, PTB and others on request) reference standard to be used to correlate
registration measurement. This keyword is not allowed in conjunction with REGISTR_REF_METHOD_REQD on
the same mask.
8.1.575 REGISTR_STD_GRID_USED — (NIST, NBS, and others on request) The reference standard used to
correlate the registration measurements.
8.1.576 REGISTR_THREE_SIGMA — (x,y) The maximum acceptable 3 sigma deviation in both axes (in microns)
of all registration measurements. Both the 3 sigma deviation in x and the 3 sigma deviation in y must be less than
REGISTR_THREE_SIGMA for the mask to be acceptable.
8.1.577 REGISTR_THREE_SIGMA_REFERENCE_ONLY — (T or F) If T, indicates that
REGISTR_THREE_SIGMA is to be measured and the data transmitted to the customer (if requested by
SHIP_REGISTR_DATA), but that deviations in its measured value due to mask processing would NOT be cause for
mask rejection.
SEMI P10-0705 © SEMI 1990, 2005 141
8.1.578 REGISTR_TOLERANCE — Maximum acceptable deviation of the mean registration error of all measured
registration marks, in both axes, relative to the REGISTR_REF_MASK_ID or the reference grid of
REGISTR_EQUIP_REQD. Both the mean in x and the mean in y must be less than REGISTR_TOLERANCE for
the mask to be acceptable.
8.1.579 RELEASE_NUMBER — Alphanumeric release number under BLANKET PO NUMBER.
8.1.580 REPAIR_EQUIP_REQD — Alphanumeric identification of acceptable equipment for repairing mask
defects.
8.1.581 REPAIR_EQUIP_USED — Alphanumeric identification of equipment used for repairing mask defects.
8.1.582 REPAIRS_AUTHORIZED — (T or F) If F, customer approval is required before mask repairs can be
made.
8.1.583 RESIST_THICKNESS — Resist thickness in Angstroms.
8.1.584 RESIST_TYPE — (POSITIVE or NEGATIVE) This data item is needed for <mask_order> only if
overlapping patterns are required. (Overlapping patterns sometimes require the use of “blanking rectangles” to
prevent exposure of areas which are to be exposed by another pattern.)
8.1.585 RESULT_FILE_NAME — (text) Name identifying the result output file for RUNSET_NAME. If this
keyword appears in the <mask_order>, it must be explicitly referenced in a RUNSET_NAME and/or a
PARAMETER_FILE_NAME.
8.1.586 RETROFIT_JOB_LEVEL — Level in RETROFIT_JOB_NAME to which new mask(s) must retrofit.
8.1.587 RETROFIT_JOB_NAME — Name of job file to which mask(s) must retrofit.
8.1.588 RETROFIT_MASK_ID — MASK_ID in RETROFIT_MASK_SET_ID to which new mask(s) must
retrofit.
8.1.589 RETROFIT_MASK_NAME — To be used in place of RETROFIT_MASK_ID only for retrofit to those
mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.590 RETROFIT_MASK_SET_ID — MASK_SET_ID of mask set to which new mask(s) must retrofit.
8.1.591 RETROFIT_MASK_SET_NAME — To be used in place of RETROFIT_MASK_SET_ID only for retrofit
to those mask sets which were built outside the SEMI order standard and have no MASK_SET_ID.
8.1.592 RETROFIT_MASK_SET_VERSION — To be used in addition to RETROFIT_-MASK_SET_NAME only
for retrofit to those mask sets which were built outside the order standard and have no MASK_SET_ID.
8.1.593 REVIEW_REQD — If present, indicates that a review will be required but that it need not be completed
prior to building and/or shipping the masks. The alphanumeric data field describes the items to be reviewed.
8.1.594 ROTATE_TITLE — (0, 90, 180 or 270) Title is to be rotated clockwise the indicated number of degrees,
prior to any mirroring.
8.1.595 ROTATE_TITLE_CHARACTERS — (0, 90, 180 or 270) Characters within the title are to be rotated
clockwise the indicated number of degrees, prior to any mirroring.
8.1.596 ROTATION — (0, 90, 180 or 270) Angle in degrees at which an image is rotated counter-clockwise about
its center, prior to mirroring.
8.1.597 RUNSET_NAME — Name of instruction file (such as .cinc files or DRC run sets). Note that multiple
RUNSET_NAME entries under a SOFTWARE_NAME means that multiple runs with the same software are
required.
8.1.598 RUNSET_REVISION — (text) Revision identification of the RUNSET_NAME.
8.1.599 SCALE_FACTOR — (De)magnification factor to be multiplied with the PATTERN_ADDRESS_SIZE to
get the effective address to be used to write the pattern file. Data value must be positive. 1.0 is assumed unless
specified otherwise. SCALE_FACTOR alters both the size of individual geometries and the size of the pattern file.
SEMI P10-0705 © SEMI 1990, 2005 142
8.1.600 SCRATCH_INSP_AREA — (x1,y1,x2,y2) Unscaled coordinates of window for scratch inspection, lower
left and upper right corners, relative to nominal center of mask (chrome side up).
8.1.601 SCRATCH_INSP_EXCLUDE — (x1, y1, x2, y2) Unscaled coordinates of window to be excluded from
defect inspection, relative to nominal center of mask (chrome side up). (See SCRATCH_INSP_AREA.)
8.1.602 SCRATCH_SIZE_BACK — Maximum dimension of smallest unacceptable scratch on glass side of mask.
8.1.603 SCRATCH_SIZE_FRONT — Maximum dimension of smallest unacceptable scratch on patterned side of
mask.
8.1.604 SCRIBE_INSIDE_CORNERS — (x1,y1,x2,y2) The inner limits of the SCRIBE_-TONE frame to be built
for the dropout by the vendor. It consists of two pairs of coordinates: the lower-left and upper-right and these are
relative to the DROPOUT window center.
8.1.605 SCRIBE_OUTSIDE_CORNERS — (x1,y1,x2,y2) The outer limits of the SCRIBE_-TONE frame to be
built for the dropout by the vendor. It consists of two pairs of coordinates: the lower-left and upper-right and these
are relative to the DROPOUT window center.
8.1.606 SCRIBE_TONE — (CLEAR or DARK) Border surrounding DROPOUT on mask is to be either clear or
dark.
8.1.607 SECURITY_CLASS — (QML, SECRET, TOP_SECRET, CCI, or COMSEC) Security classification of
mask set or individual mask.
8.1.608 SEM_PHOTO_LOCATION — (x,y) Location of SEM photographing location relative to the nominal
center of the mask (chrome side up).
8.1.609 SEM_PHOTO_MATRIX_FILE_NAME — Alphanumeric name of file to be used for SEM photograph
locations. It is not to be used in conjunction with SEM_PHOTO_LOCATION within the same
START_SEM_PHOTO to END_SEM_PHOTO set.
8.1.610 SEM_PHOTO_ROTATION — Angle in degrees at which a SEM Photo Image output is rotated about the
Z axis of the mask. Angles are to be counter-clockwise with zero degrees as the regular orientation of the mask as
written.
8.1.611 SEM_PHOTO_SCALE — Numeric scale of the SEM photograph image.
8.1.612 SEM_PHOTO_SITE_ID — Unique alphanumeric identifier of each SEM photographing location within
MASK_SET_ID to identify individual SEM photo locations when using <mask_data>. If the same coordinates
apply to locations on different masks within the mask set, they may have the same SEM_PHOTO_SITE_ID, but it is
not mandatory.
8.1.613 SEM_PHOTO_TILT — Angle in degrees at which a SEM Photo Image output is tipped away from normal
to the x/y plane of the mask.
8.1.614 SEMI_REVISION — Revision identification of the SEMI standard according to which the <mask_order>
data structure was constructed. This revision is P10-0705.
8.1.615 SEND_FINAL_AUDIT_DATE_TIME — (T or F) If T, requires delivery of
FINAL_AUDIT_DATE_TIME to the customer.
8.1.616 SEND_MASK_SHIPPED_DATE_TIME — (T or F) If T, requires delivery of
MASK_SHIPPED_DATE_TIME to the customer.
8.1.617 SERIAL_NUMBER — (T or F) If T, a mask serial number must be included on the mask.
8.1.618 SEVERITY_CRITERION_REQD — (PASS, WARN, FAIL) Setup parameter required for inspection.
8.1.619 SEVERITY_CRITERION_USED — (PASS, WARN, FAIL) Setup parameter used for inspection.
8.1.620 SHIP_AIM_DATA — (T or F) If T, requires delivery of <wafer_exposure_information>,
<aerial_image_info> and any output of the final inspection using the aerial imaging measurement tool.
8.1.621 SHIP_ARRAY_REGISTR_MAP — (T or F) If T, requires delivery of the registration map of the entire
array to the customer.