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SEMI P10-0705 © SEMI 1990, 2005 118 8.1.100 CD_XY_ REFERENCE_ONLY — (T or F) If T, indicates that the <cd_xy_definition> is to be measured and the data transm itted to the customer (if request ed by SHIP _CD_DATA )…

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SEMI P10-0705 © SEMI 1990, 2005 117
8.1.83 CD_PITCH — Local spacing of the critical dimension from the center of the geometry to the center of
adjacent geometries. This will be designated by the customer as required and reported in <mask_results> for
analysis by the customer.
8.1.84 CD_QUALITY_ID — (text) Customer’s label for a collection of CD quality specifications, to be used only
in addition to explicit quality requirement keywords. This may be used in the data structure in addition to, but not in
place of, explicit quality requirement keywords. This may not be used in combination with QUALITY_GROUP_ID.
Customer and vendor should document the meaning of this quality grade before using it in SEMI P10.
8.1.85 CD_RANGE — Maximum acceptable variation of all measured critical dimensions of same nominal size,
same tone and same orientation, relative to each other. (See Related Information 1 at the end of this standard.)
8.1.86 CD_REFERENCE_ONLY — (T or F) If T, indicates that the CD location, <cd_group> or <cd_set>
is to be
measured and the data transmitted to the customer (if requested by SHIP_CD_DATA_), but that deviations in its
measured value due to mask processing would NOT be cause for mask rejection. (This does not exempt mishandling
of the data in pattern preparation from being a cause for mask rejection.)
8.1.87 CD_SITE_ID — Unique alphanumeric identifier of each critical dimension location within MASK_SET_ID
to identify individual cd locations when using <mask_results>. If the same coordinates apply to locations on
different masks within the mask set, they may have the same CD_SITE_ID, but it is not mandatory. If
CD_SITE_ID is used with a CD_LOCATION within a <pattern_options>, it will be associated with as many mask
locations as the cell has instances. (See MEASURED_CD_SITE_ID for more information.)
8.1.88 CD_STD — (NBS, NIST, ROGER_SHERMAN, CUSTOMER, and others on request) reference standard to
be used to correlate critical dimension measurements.
8.1.89 CD_TARGET — Desired final size of critical dimension feature on mask. (See Related Information 1 at the
end of this standard.)
8.1.90 CD_THREE_SIGMA — Maximum acceptable 3-sigma deviation of all measured critical dimensions to the
mean of all measured critical dimensions. (See Related Information 1 at the end of this standard.)
8.1.91 CD_TOLERANCE — Maximum acceptable deviation of the mean of all measured critical dimensions to the
CD_TARGET. (See Related Information 1 at the end of this standard.)
8.1.92 CD_TONE_CLEAR — (T or F) If T, critical dimension feature on mask is clear.
8.1.93 CD_VERTICAL_ID — CD_SITE_ID of CD_VERTICAL_ID.
8.1.94 CD_VERTICAL_LOCATION — (x,y) Location of critical dimension feature. The CD_ORIENTATION of
the feature must be VERTICAL. If CD_VERTICAL_LOCATION appears in <mask_options>, then the (x,y)
coordinates are relative to the nominal center of the mask (chrome side up). If CD_VERTICAL_LOCATION
appears in <pattern_options>, then the (x,y) coordinates are relative to the center of the pattern or cell, before
mirroring or scaling. If CD_VERTICAL_LOCATION appears in <mask_results>, then the (x,y) coordinates are
relative to the nominal center of the mask (chrome side up), even if the original CD_VERTICAL_LOCATION was
in <pattern_options>.
8.1.95 CD_VERTICAL_MORPHOGRAPHY — CD_MORPHOGRAPHY of the individual CD_VERTICAL_ID
feature.
8.1.96 CD_VERTICAL_TONE_CLEAR — CD_TONE_CLEAR of the individual CD_VERTICAL_ID feature.
8.1.97 CD_X_GROUP — Identifies a <cd_group> for use in comparing horizontally scanned critical dimensions to
a vertically scanned critical dimensions. Data field must match data field of a START_CD in a <cd_group>. The
<cd_group> must contain CD_ORIENTATION with data value HORIZONTAL.
8.1.98 CD_Y_GROUP — Identifies a <cd_group> for use in comparing horizontally scanned critical dimensions to
a vertically scanned critical dimensions. Data field must match data field of a START_CD in a <cd_group>. The
<cd_group> must contain CD_ORIENTATION with data value VERTICAL.
8.1.99 CD_XY_DEVIATION — Maximum deviation, on a site-by-site basis, of a horizontally scanned critical
dimension to a vertically scanned critical dimension within a <cd_xy_definition>. The two critical dimensions at
each <cd_xy_site> site must be the same size in the pattern data and the same tone on the mask. (See Related
Information 1 at the end of this standard.)
SEMI P10-0705 © SEMI 1990, 2005 118
8.1.100 CD_XY_REFERENCE_ONLY — (T or F) If T, indicates that the <cd_xy_definition> is to be measured
and the data transmitted to the customer (if requested by SHIP_CD_DATA), but that deviations in its measured
value due to mask processing would NOT be cause for mask rejection. (This does not exempt mishandling of the
data in pattern preparation from being a cause for mask rejection.)
8.1.101 CD_XY_TOLERANCE — Maximum acceptable deviation of the mean of all measured horizontally
scanned critical dimensions to the mean of all measured vertically scanned critical dimensions within a
<cd_xy_definition> and/or between the sites in {CD_X_GROUP} and the sites in {CD_Y_GROUP}. Critical
dimensions at all sites must be the same size in the pattern data and the same tone on the mask. (See Related
Information 1 at the end of this standard.)
8.1.102 CELL_ID — Name of the cell which follows; must be used in all references within this MASK_SET_ID to
this cell definition.
8.1.103 CELL_INSTANCE — (text) Identifies CELL_ID to be placed by the following location information.
8.1.104 CELL_REGISTR_MARK — (x,y) Location of registration reference mark in <mask_order> data, relative
to center of the cell (before mirroring or scaling).
8.1.105 CENTRALITY — (x,y,rotation)
Maximum misplacement in millimeters and, optionally, microradians of
all patterns as a group, relative to the nominal center of the mask.
8.1.106 CHECKSUM — For <mask_order>, an ASCII 16 bit crc checksum encompassing all records from
START_ORDER through END_ORDER, inclusive. For <mask_results>, an ASCII 16 bit crc checksum
encompassing all records from START_MASK_RESULTS through END_MASK_RESULTS, inclusive. (See
COMPUTING THE CHECKSUM, §9.)
8.1.107 CLEAR_INTERNAL_WINDOW — (x1,y1,x2,y2) Area to have all digitized data removed within the
window described by (x1,y1,x2,y2), relative to the coordinate space of DATA_SOURCE_FILE. The extents of the
output pattern file will be the same as DATA_SOURCE_FILE.
8.1.108 COAT_DATE_TIME – (date) The date and time that the coating was applied by the mask vendor.
8.1.109 COAT_EQUIP_USED – (text) The model identification of the equipment used by the mask vendor to
apply the coating.
8.1.110 COATING_COMPOSITION – (text) The name used to identify the composition of the coating, for
example IP3500, MoSi, AR3, etc., as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or
mask vendor if MASK_VENDOR_APPLIED = T.
8.1.111 COATING_GRADE — Supplier grade of MASK_COATING applied to the substrate to build the
photomask. Text to be agreed by customer/vendor to suit the specific requirement.
8.1.112 COATING_LOT_NUMBER — (text) The lot number supplied by the mask blank vendor for a particular
coating such as the photoresist. Also known as “Resist Lot” or “Bake Lot”.
8.1.113 COATING_MASK_VENDOR_APPLIED — (T or F) If T, the coating was applied by the mask vendor.
8.1.114 COATING_OPTICAL_DENSITY — (number) A measure of the transmittance through the given coating
as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask vendor if
MASK_VENDOR_APPLIED = T. Optical density equals the log to the base 10 of the reciprocal of the
transmittance
8.1.115 COATING_PHASE — (number) The angle in degrees that light is shifted by the given coating as specified
by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask vendor if MASK_VENDOR_APPLIED =
T.
8.1.116 COATING_REFLECTANCE — (number) For a given coating, the ratio of the reflected flux to the incident
flux expressed as a percent, as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask
vendor if MASK_VENDOR_APPLIED = T.
8.1.117 COATING_THICKNESS — (number) The thickness of the coating in Angstroms as specified by the mask
blank vendor if MASK_VENDOR_APPLIED = F, or mask vendor if MASK_VENDOR_APPLIED = T.
SEMI P10-0705 © SEMI 1990, 2005 119
8.1.118 COATING_TRANSMITTANCE — (number) The ratio of the radiant power transmitted by the coating to
the incident radiant power expressed as a percent, as specified by the mask blank vendor if
MASK_VENDOR_APPLIED = F, or mask vendor if MASK_VENDOR_APPLIED = T.
8.1.119 COATING_TYPE – (CHROME, RESIST, ATTENUATOR) The name used to identify the category of
coating being described.
8.1.120 COATING_WAVELENGTH — (number) The wavelength of light in nanometers with which the given
coating is intended to be used as specified by the mask blank vendor if MASK_VENDOR_APPLIED = F, or mask
vendor if MASK_VENDOR_APPLIED = T.
8.1.121 COMPACT_LABEL — Identification of customer-supplied label to use on shipping compact.
8.1.122 CUSTOMER — The name of the company placing the order.
8.1.123 CUSTOMER_SPEC – (text) Customer’s designation for a specific mask manufacturing specification.
CUSTOMER_SPEC may be used in the data structure in addition to, but not in place of, explicit quality requirement
keywords.
8.1.124 CUSTOMER_SPEC_REVISION — (text) Customer designation of the revision of CUSTOMER_SPEC to
be used. This must be explicit and may not default to “latest” or “last used”. “None” is acceptable if no revision
identification applies to the specification. Both CUSTOMER_SPEC and CUSTOMER_SPEC_REVISION are
required if either appears at any level in the hierarchy.
8.1.125 DARK_INTERNAL_WINDOW — (x1,y1,x2,y2) Area to completely digitize within the window described
by (x1,y1,x2,y2), relative to the coordinate space of DATA_SOURCE_FILE. The extents of the output pattern file
will be the same as the DATA_SOURCE_FILE.
8.1.126 DATA_CHECKSUM — (integer) To be used to verify integrity of transmitted data.
8.1.127 DATA_CHECKSUM_TYPE — (text) Algorithm used to generate DATA_CHECKSUM.
8.1.128 DATA_COMPRESSION — (ZIP, ZOO, GZIP, Z, NONE, BINHEX) Compression algorithm used for
transmitted data.
8.1.129 DATA_CONSOLIDATION — (BACKUP, TAR, GNUTAR, ZIP, NONE Consolidation method used for
transmitted data.
8.1.130 DATA_DENSITY — (800BPI, 1600BPI or 6250BPI for 9_TRACK_-TAPE DATA_MEDIUM; HIGH or
LOW for 4MM_DAT or 8MM_DAT DATA_MEDIUM) for magnetic tape density.
8.1.131 DATA_ENCRYPTION — (PGP, NETWIZARD, USER, HARDWARE, NONE) Encryption algorithm
used for transmitted data.
8.1.132 DATA_FILE_NUMBER — For GDS-II OASIS, Mann or Electromask data, this is the file number on the
physical medium.
8.1.133 DATA_FILE_SIZE — Size of the file in bytes.
8.1.134 DATA_FORMAT — (MEBES, RDOS = RDOS dump, VAX = VAX backup, GDS-II = GDS-II stream,
OASIS = Specification for Open Artwork System Interchange Standard, CIF = Cal Tech Intermediate Format, DXF
= Autocad output, APPLICON, MANN_3000, MANN_3600, ELECTROMASK, DOS, UNIX, APPLE, TAR, and
others on request) Physical medium format.
8.1.135 DATA_FUNCTION_PURPOSE — (OPC, PSM, OPC/PSM, DRC, MRC, LVS, LOGICAL, FRACTURE,
OTHER, and additional specific functions on request) Description of software function to be performed.
8.1.136 DATA_ID — The required identifying “name” for a physical volume of data. The name must match the
label visible on the outside of the volume and must be unique among all physical volume names sent by a customer
to a vendor.
8.1.137 DATA_JOB_NAME — For E-beam data, this is the name of the job file to be expected in DATA
MEDIUM.