semi合集-English.pdf - 第5514页

SEMI P10-0705 © SEMI 1990, 2005 9 [ROTATE_TITLE] [ROTATE_TITLE_CHARACTERS] END_TITLE <barcode_data> = START_BARCODE [BARCODE_TYPE] [BARCODE _TEXT] [BARCODE_LOCATION] [BARCODE_ROTATION] END_BARCODE <substrate>…

SEMI P10-0705 © SEMI 1990, 2005 8

[CUSTOMER_SPEC CUSTOMER_SPEC_REVISION]

{TOP_PELLICLE_TYPE [

TOP_PELLICLE_CENTRALITY_ERROR] [PRICE] }

{BOTTOM_PELLICLE_TYPE [

BOTTOM_PELLICLE_CENTRALITY_ERROR] [PRICE]}

[GUIDES_REQD [PRICE] ]

[CENTRALITY]

registration>}

[REGISTR_CLOSURE [REGISTR_CLOSURE_REFERENCE_ONLY]

{REGISTR_CLOSURE_EQUIP_REQD} {EQUIP_SITE_REQD}

[REGISTR_CLOSURE_BEGIN REGISTR_CLOSURE_END] ]

[BUTTING_ERROR [BUTTING_ERROR_METHOD] ]

cd_group>}

cd_set>}

cd_xy_definition>}

cd_iso_dense_definition>}

[MIN_MASK_FEATURE_SIZE] [

MIN_CORNER_TO_CORNER_GAP]

[PERCENT_CLEAR]

opc_definition>}

defect_definition>}

[INSPECTION_REF_LOCATION]

{<surface_definition>}

[INSPECT_THROUGH_PELLICLE <

defect_definition>]

{<sem_photo>}

[QUALITY_GROUP_ID]

[COMPACT_LABEL]

{PACKAGE [MAX_MASKS_IN_PACKAGE] }

{ADDITIONAL_MASK_INFO}

<wafer_exposure_data> = START_WAFER_EXPOSURE_DATA

WAFER_EXPOSURE_NUMERICAL_APERATURE

[WAFER_EXPOSURE_SIGMA]

[WAFER_EXPOSURE_SIGMA_INNER WAFER_EXPOSURE_SIGMA_OUTER]

WAFER_EXPOSURE_ILLUMINATION

END_WAFER_EXPOSURE_DATA

<aerial_image_data> = START_AERIAL_IMAGE_DATA

AIM_WAVELENGTH

[AIM_INTENSITY_VARIATION_DELTA]

[AIM_FLUX_INTENSITY_DELTA]

[AIM_CD_DELTA]

END_AERIAL_IMAGE_DATA

<title_data> = START_TITLE [TITLE_TEXT] [TITLE_TYPE] [

TITLE_FONT] [TITLE_HEIGHT]

[

TITLE_MAG] [TITLE_JUSTIFICATION] [TITLE_LOCATION] [MIRROR_TITLE]

SEMI P10-0705 © SEMI 1990, 2005 9

[ROTATE_TITLE] [ROTATE_TITLE_CHARACTERS] END_TITLE

<barcode_data> = START_BARCODE [BARCODE_TYPE] [BARCODE_TEXT] [BARCODE_LOCATION]

[BARCODE_ROTATION] END_BARCODE

<substrate> = START_SUBSTRATE

[

BLANK_SIZE] [BLANK_TYPE] [BLANK_GRADE] [BLANK_FLATNESS]

[

MASK_COATING] [RESIST_TYPE] [RESIST_THICKNESS]

[BLANK_BIREFRINGENCE_REQD]

[

ATTENUATOR] [COATING_GRADE]

euv_blank_type>]

END_SUBSTRATE

<euv_blank_type> = EUV_BLANK_TYPE

EUV_FLATNESS_FRONT

EUV_FLATNESS_BACK

EUV_MULTILAYER_COMPOSITION

EUV_CAPPING_COMPOSITION

EUV_MMR_WAVELENGTH

EUV_MEAN_PEAK_REFLECTIVITY

EUV_PEAK_REFLECTIVITY_UNIFORMITY

EUV_ABSORBER_COMPOSITION

EUV_ABSORBER_OPTICAL_PROPERTIES

EUV_BLANK_RESISTANCE

EUV_EXPANSION_COEFF

<ship_plot> = START_SHIP_PLOT

PLOT_TYPE PLOT_SCALE QUANTITY [PRICE]

[PLOT_FORMAT] [PATTERN_PLOT_NORMAL_TONE]

[<ship_to>]

END_SHIP_PLOT

<films> = SHIP_FILM [QUANTITY]

[FILM_SCALE] [FILM_SIZE] [FILM_COLOR] [FILM_NORMAL_TONE]

[PRICE] [<

ship_to>] END_SHIP_FILM

<phase_shift> =

START_PHASE_SHIFT [PHASE_SHIFT_QUALITY_ID]

PSM_WAVELENGTH

[TRANSMISSION_TARGET

[TRANSMISSION_REFERENCE_ONLY]

[TRANSMISSION_TOLERANCE]

[TRANSMISSION_RANGE] [TRANSMISSION_ERROR]

{TRANSMISSION_EQUIP_REQD [TRANSMISSION_MODE_REQD] }

{ [

TRANSMISSION_MARK_SITE_ID] TRANSMISSION_MARK_LOCATION }

[

TRANSMISSION_MARK_FEATURE]

[TRANSMISSION_MARK_LOCATION_DRAWING]

SEMI P10-0705 © SEMI 1990, 2005 10

[TRANSMISSION_MARK_DRAWING] ]

[PHASE_ANGLE_TARGET

[PHASE_ANGLE_REFERENCE_ONLY]

[PHASE_ANGLE_TOLERANCE]

[PHASE_ANGLE_RANGE] [PHASE_ANGLE_ERROR]

{PHASE_ANGLE_EQUIP_REQD [PHASE_ANGLE_MODE_REQD] }

{ [

PHASE_ANGLE_SITE_ID] PHASE_ANGLE_MARK_LOCATION }

[

PHASE_ANGLE_MARK_FEATURE]

[

PHASE_ANGLE_MARK_LOCATION_DRAWING]

[

PHASE_ANGLE_MARK_DRAWING] ]

[ETCH_DEPTH_TARGET

[ETCH_DEPTH_REFERENCE_ONLY]

[ETCH_DEPTH_TOLERANCE]

[ETCH_DEPTH_RANGE] [ETCH_DEPTH_ERROR]

{ETCH_DEPTH_EQUIP_REQD [ETCH_DEPTH_MODE_REQD] }

{ [

ETCH_DEPTH_SITE_ID] ETCH_DEPTH_MARK_LOCATION }

[

ETCH_DEPTH_MARK_FEATURE]

[

ETCH_DEPTH_MARK_LOCATION_DRAWING]

[ETCH_DEPTH_MARK_DRAWING] ]

END_PHASE_SHIFT

<registration> = START_REGISTR [

REGISTR_QUALITY_ID]

[REGISTR_ERROR] [REGISTR_SCALE [REGISTR_SCALE_REFERENCE_ONLY] ]

[REGISTR_RESIDUAL [REGISTR_RESIDUAL_REFERENCE_ONLY] ]

[REGISTR_THREE_SIGMA [REGISTR_THREE_SIGMA_REFERENCE_ONLY] ]

[REGISTR_RESIDUAL_THREE_SIGMA

[REGISTR_RESIDUAL_THREE_SIGMA_REFERENCE_ONLY] ]

[REGISTR_TOLERANCE]

[REGISTR_ORTHO [REGISTR_ORTHO_REFERENCE_ONLY] ]

[REGISTR_RELATIVE [REGISTR_RELATIVE_REFERENCE_ONLY] ]

{REGISTR_REF_MASK_ID REGISTR_REF_MASK_SET_ID}

{REGISTR_REF_MASK_NAME REGISTR_REF_MASK_SET_NAME

[REGISTR_REF_MASK_SET_VERSION] }

{REGISTR_EQUIP_REQD} {EQUIP_SITE_REQD}

[REGISTR_STD_GRID] {REGISTR_REF_METHOD_REQD}

[REGISTR_ALGORITHM] [REGISTR_COMPENSATION_TEMPERATURE]

{ [REGISTR_MARK_ID] [MASK_REGISTR_MARK] [

CELL_REGISTR_MARK]

[MEASURE_FILE_NAME]

[

REGISTR_MARK_FEATURE]

[

REGISTR_MARK_LOCATION_DRAWING] [REGISTR_MARK_DRAWING]

[REGISTR_MARK_SEPARATION REGISTR_MARK_COUNT] }