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SEMI P23-0200 © SEMI 1993 , 2000 31 Figure 26 Sensitivity Check Sheet – Wiring Pattern

SEMI P23-0200 © SEMI 1993, 2000 30

1250 um

500 um1250 um

Film Pattern

Glass Pattern

(Vertical Line & Space Pattern)

1 : 1 Line & Space

(Horizontal Line & Space Pattern)

Line Width is Mask Design Rule Size.

Minimum 6000 um

Figure 25

Light Intensity Adjustment Pattern

SEMI P23-0200 © SEMI 1993, 200031

Figure 26

Sensitivity Check Sheet – Wiring Pattern

SEMI P23-0200 © SEMI 1993, 2000 32

Figure 27

Sensitivity Check Sheet – Contact Hole Pattern

NOTICE: SEMI makes no warranties or representations as to the suitability of the guideline set forth herein for any

particular application. The determination of the suitability of the guideline is solely the responsibility of the user.

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literature respecting any materials mentioned herein. These guidelines are subject to change without notice.

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guideline. Users of this guideline are expressly advised that determination of any such patent rights or copyrights,

and the risk of infringement of such rights, are entirely their own responsibility.

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