semi合集-English.pdf - 第4281页
SEMI F80-1103 © SEMI 2003 1 SEMI F80-1103 TEST METHOD FOR DETERMIN ATION OF GAS CHANGE/PURGE EFFICIENCY OF GAS DELIVERY SYSTEM This test method was technicall y approved by the Gl obal Facilities Committee and is the dir…

SEMI F79-0703 © SEMI 2003 17
SEMI Gas # Chemical Name Category Symbol Formula Synonym
13 Nitrogen 11 N2 N
2
26 Nitrogen Dioxide 11 NO2 NO
2
95 Nitrogen Tetroxide 11 N2O4 N
2
O
4
Dinitrogenoxide
78 Nitrogen Trioxide 11 N2O3 N
2
O
3
235 Nitromethane 11 CH3NO2 CH
3
NO
2
141 Nitrosyl Chloride 11 NOCl NOCl
27 Nitrous Oxide 11 N2O N
2
O
293 Propenamine 11 C3H7N C
3
H
7
N Allylamine; UN2334
304 Pyridine 11 C5H5N C
5
H
5
N Azabenzene; Azine
320 Triallylamine 11 C9H15N C
9
H
15
N
310 Triethylamine 11 C6H15N (C
2
H
5
)
3
N UN 1296; Ethanamine;
260 Trifluoroacetonitrile 11 C2F3N F
3
CCN
109 Trimethylamine 11 C3H9N (CH
3
)
3
N Methylamine
165 Trimethylaminealane 11 C3H12AlN (CH
3
)
3
NAlH
3
TMAA
314 Trimethylisoxazole 11 C6H9NO
CH
3
CH=CHCH=C
HCONH
2
3,4,5-Trimethylisoxazole
6.12 Acids 12
283 Acetic acid 12 C2H4O2 CH
3
COOH Ethanoic acid; UN 2789;
289 Acrylic acid 12 C3H4O2 C
3
H
4
O
2
2-Propenoic acid
167 Nitric Acid 12 HNO3 HNO
3
334 Propanoic acid 12 C3H6O2 CH
3
CH
2
CO
2
H Propionic acid
171 Sulfuric Acid 12 H2SO4 H
2
SO
4
259 Trifluoroacetic Acid 12 CF3CO2H CF
3
CO
2
H
294 Trimethyl Ester Phosphoric acid 12 C3H9O4P C
3
H
9
O
4
P Methyl phosphate
6.13 Other 13
329 Mercury 13 Hg Hg UN2809
330 Zinc 13 Zn Zn UN 1383
NOTICE: SEMI makes no warranties or representations as to the suitability of the guidelines set forth herein for
any particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer' s instructions, product labels, product data sheets, and other relevant
literature, respecting any materials or equipment mentioned herein. These standards are subject to change without
notice.
By publication of this guideline, Semiconductor Equipment and Materials International (SEMI) takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this
guideline. Users of this guideline are expressly advised that determination of any such patent rights or copyrights,
and the risk of infringement of such rights are entirely their own responsibility
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.

SEMI F80-1103 © SEMI 2003 1
SEMI F80-1103
TEST METHOD FOR DETERMINATION OF GAS CHANGE/PURGE
EFFICIENCY OF GAS DELIVERY SYSTEM
This test method was technically approved by the Global Facilities Committee and is the direct responsibility
of the Japanese Facilities Committee. Current edition approved by the Japanese Regional Standards
Committee on August 8, 2003. Initially available at www.semi.org October 2003; to be published November
2003.
1 Purpose
1.1 This document is a guide to a test method to
determine gas change/purge efficiency of gas delivery
system.
2 Scope
2.1 It covers both conventional metal face sealing and
surface mount gas delivery systems.
2.2 The test method applies to all type of high purity
gas delivery systems used in semiconductor
manufacturing facilities and comparable research and
development areas.
NOTICE: This standard does not purport to address
safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish
appropriate safety and health practices and determine
the applicability of regulatory or other limitations prior
to use.
3 Limitations
3.1 All components must meet quality requirements as
established and controlled by manufacturers prior to
testing (e.g., dimensional, functional, etc.).
3.2 Care should be exercised in handling of
components to maintain manufacturer’s specifications.
4 Referenced Standards
None.
5 Terminology
5.1 Abbreviations and Acronyms (See Figure 1.)
5.1.1 APIMS — Atmospheric Pressure Ionization Mass
Spectrometer
5.2 Definitions
5.2.1 purge efficiency — the ratio of process gas
concentration before and after the purge event.
5.2.2 required concentration — a concentration that a
user of the gas delivery system required.
6 Condition
6.1 Test shall be performed at 22° C ± 4° C.
6.2 Test gas shall be used for measuring equipment and
shall not be adsorptive gas. Two gases shall be used as
the test gases. They are indicated as Gas A and Gas B
in this test method.
6.3 APIMS or measuring equipment that has a low
detectable limit and has a good response capability of
gas densitometer.
NOTE 1: APIMS is widely used for this type of
measurement.
NOTE 2: Qmass is not considered as a recommended option
as the following reasons; (1) Special sampling valve needs to
be installed on the testing equipment. (2) Detectable limit of
Qmass is high.
NOTE 3: An oximeter is not considered as a recommended
option because it does not have enough capability of response.
6.4 Flow rate of each gas for this test shall be
determined by a mass flow controller of the System
Under Test and a capability of the measuring
equipment.
7 Procedure
7.1 Case (1) — This is the test method in consideration
of purge line in the gas delivery system.
7.1.1 A recommended test flow schematic is shown in
Figure 2.
7.1.2 The test is to evaluate a purge efficiency of gas
delivery systems by using its process line and purge
line.
7.1.3 Set each component for the following condition
before starting the test. APV1, APV2, APV3, APV4,
and APV5 are closed condition. Rest of the components
in the System Under Test are open condition. Supply
Gas A to the upstream of APV1. Supply Gas B to the
upstream of APV2. (See Figure 2.)
7.1.4 Open APV5 and flow Gas A from Bypass line.
(1) Close PV3, open APV3, and vacuum the System
Under Test. (2) (See Figure 3.)

SEMI F80-1103 © SEMI 2003 2
7.1.5 Open APV2 and flow Gas B from the Purge line. When flowing, close APV3 and fill the line with Gas B up
to PV2. Then, close PV2. Gas B also fills the line downstream of PV2. Open APV3, vacuum inside of the line, and
vent Gas B. Then, close APV3. (3) (See Figure 4.)
7.1.6 (a) Open APV1 and flow Gas A from the Process line. (b) Close PV1, open APV3 and vacuum the process
line. Then, Close APV3, open and close PV1, and open APV3. (c) Repeat this operation (b) 3 times and close APV3
to sufficiently fill process line with Gas A. (4) (See Figure 5.)
7.1.7 Close APV5. Then open APV4 and flow Gas A to the System Under Test. Measure the concentration of Gas
A by measuring equipment. (See Figure 6.)
7.1.8 Close PV1, open PV2 and flow Gas B to the System Under Test. The measuring equipment continuously
monitors the Gas A concentration. Record the time to achieve required concentration for Gas A from the start of
flowing Gas B. (See Figure 7.)
Figure 1
Abbreviations and Symbols
Figure 2
Gas Change/Purge Efficiency Test Schematic Case 1
(1)
(2)
Figure 3
Procedure 7.1.4