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SEMI E100-1104 © SEMI 2000, 2004 13 APPENDIX 1 APPLICATION NOTES NOTICE : The material in this appendix is an official part of SEMI E100 and was appro ved by full letter ballot procedures on Septem ber 3 and Decembe r 15…

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SEMI E100-1104 © SEMI 2000, 2003 12
Table 3 Internal Dimensions Unique to the 230 mm RSP
Symbol Used Figure Value Specified Reference Measured From Feature Measured To
x115 4 75.5 mm (2.972 in.)
minimum
bilateral reference plane edge of pellicle exclusion volume
x116 4 107.5 mm (4.232 in.)
minimum
bilateral reference plane edge of end-effector exclusion
volume
x132 4 84 mm (3.307 in.)
maximum
bilateral reference plane edge of end-effector exclusion
volume
x137 4 124 mm (4.882 in.)
maximum
bilateral reference plane edge of safety rail exclusion
volume
x144 4, 6 115 mm (4.528 in.)
maximum
facial reference plane edge of end-effector exclusion
volume
x146 4, 6 124 mm (4.881 in.)
minimum
facial reference plane edge of end-effector exclusion
volume
y129 6 75.5 mm (2.972 in.)
minimum
facial reference plane edge of transverse pellicle
exclusion volume
y136 6 124 mm (4.882 in.)
minimum
facial reference plane edge of end effector exclusion
volume
y144 6 105 mm (4.134 in.)
maximum
facial reference plane edge of end-effector exclusion
volume
z164 4 48.3 mm (1.902 in.)
maximum
horizontal reference plane top of reticle supports
Table 4 Internal Dimensions Unique to the 6 inch RSP
Symbol Used Figure Value Specified Reference Measured From Feature Measured To
x118
7
71.2 mm (2.803 in.)
minimum
bilateral reference plane edge of end-effector exclusion
volume
x119
7
64.5 mm (2.539 in.)
minimum
bilateral reference plane edge of pellicle exclusion volume
x138 7 85 mm (3.346 in.)
maximum
bilateral reference plane edge of safety rail exclusion
volume
x143 7, 8 76.2 mm (3.000 in.)
maximum
facial reference plane edge of end-effector exclusion
volume
x145 7, 8 85 mm (3.346 in.)
minimum
facial reference plane edge of end-effector exclusion
volume
y130 8 64.5 mm (2.539 in.)
minimum
facial reference plane edge of transverse pellicle
exclusion volume
y143 8 70.2 mm (2.764 in.)
maximum
facial reference plane edge of end-effector exclusion
volume
z165 7 45.6 mm (1.795 in.)
maximum
horizontal reference plane top of reticle supports
SEMI E100-1104 © SEMI 2000, 2004 13
APPENDIX 1
APPLICATION NOTES
NOTICE: The material in this appendix is an official part of SEMI E100 and was approved by full letter ballot
procedures on September 3 and December 15, 1999 by the North American Regional Standards Committee, but the
recommendations in this appendix are optional and are not required to conform to this standard.
A1-1 Edge contact only with the photomask is
preferred when handling, transporting, or storing.
A1-2 Skewness, warp, rock, and stiffness are implicitly
defined in the geometric tolerances.
A1-3 A 6 inch reticle with a 140 mm wide pellicle can
be accommodated in the RSP, but may require
automation which approaches from above the reticle.
A1-4 Features on the RSP which enable stacking may
be required by end users. It is preferred that these
features allowing stacking in only one orientation.
A1-5 Features on the RSP which provide visual
orientation of the RSP top and RSP door may be
required by end users.
A1-6 In order to permit end-effectors, which can
handle both 230 mm and 6 inch reticles, it is recom-
mended to include the 230 mm end-effector exclusion
volumes in RSPs configured for 6 inch reticles.
SEMI E100-1104 © SEMI 2000, 2003 14
APPENDIX 2
ADDITIONAL INFORMATION
NOTICE: The material in this appendix is an official part of SEMI E100 and was approved by full letter ballot
procedures on September 3, 1999 by the North American Regional Standards Committee.
A2-1 Features on the RSP which enable stacking may be standardized in the future pending learning from first
design approaches and standardization of reticle ID location.
NOTICE: SEMI makes no warranties or representations as to the suitability of the standard set forth herein for any
particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant
literature respecting any materials mentioned herein. These standards are subject to change without notice.
The user’s attention is called to the possibility that compliance with this standard may require use of copy-righted
material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of
the contents in whole or in part is forbidden without express written
consent of SEMI.