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SEMI P7-0997 © SEMI 1982, 2003 1 SEMI P7-0997 (Reapproved 1103) METHOD OF VISCOSITY DETERMIN ATION, METHOD A — KI NEMATIC VISCOSITY This method was technically reapproved by th e Gl obal Micropatterning Comm ittee and is…

SEMI P6-88 © SEMI 1988, 1996 4

Figure 3

No Man’s Land

NOTICE: These standards do not purport to address safety issues, if any, associated with their use. It is the

responsibility of the user of these standards to establish appropriate safety and health practices and determine the

applicability of regulatory limitations prior to use. SEMI makes no warranties or representations as to the suitability

of the standards set forth herein for any particular application. The determination of the suitability of the standard is

solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels,

product data sheets, and other relevant literature respecting any materials mentioned herein. These standards are

subject to change without notice.

The user’s attention is called to the possibility that compliance with this standard may require use of copyrighted

material or of an invention covered by patent rights. By publication of this standard, SEMI takes no position

respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this

standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and

the risk of infringement of such rights, are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o

the contents in whole or in part is forbidden without express written

consent of SEMI.

SEMI P7-0997 © SEMI 1982, 2003 1

SEMI P7-0997 (Reapproved 1103)

METHOD OF VISCOSITY DETERMINATION, METHOD A — KINEMATIC

VISCOSITY

This method was technically reapproved by the Global Micropatterning Committee and is the direct

responsibility of the North American Microlithography Committee. Current edition approved by the North

American Regional Standards Committee on July 27, 2003. Initially available on www.semi.org October

2003; to be published November 2003. Originally published in 1982; previously published in September

1997.

1 Scope

1.1 This method, a simplified version of ASTM D 445

and ASTM F 66 is intended for determining the

kinematic viscosity of photoresists by measuring the

time for a volume of liquid to flow under gravity

through a calibrated glass capillary at a fixed

temperature. Efflux time is measured in seconds and

multiplied by the calibration constant of the viscometer

to obtain kinematic viscosity in units of centistokes

(cSt). Optionally, kinematic viscosity may be multiplied

by the density of the photoresist to obtain dynamic

viscosity in units of centipoise (cP). Refer to

ASTM D 445 and F 66 for additional information and

definitions.

NOTICE: This standard does not purport to address

safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish

appropriate safety and health practices and determine

the applicability of regulatory or other limitations prior

to use.

2 Referenced Standards

2.1 ASTM Standard

D 445 — Kinematic Viscosity of Transparent and

Opaque Liquids (and the Calculation of Dynamic

Viscosity)

F 66 — Photoresist Used in Microelectronic

Fabrications

NOTICE: Unless otherwise indicated, all documents

cited shall be the latest published versions.

3 Apparatus

3.1 Calibrated Viscometer — Of the glass capillary

type. (A listing of such viscometers is given in Table 1,

ASTM D 445.)

3.2 Constant Temperature Bath — Equilibrated to

25.0 ± 0.1° C.

1 American Society for Testing and Materials, 100 Barr Harbor

Drive, West Conshohocken, Pennsylvania 19428-2959, USA.

Telephone: 610.832.9585, Fax: 610.832.9555, Website:

www.astm.org

3.3 Viscometer Clamp — Adjustable to achieve

vertical alignment.

3.4 Thermometer — Graduated in 0.1° C intervals and

calibrated (see ASTM D 445 and ASTM F 66).

3.5 Stopwatch — Readable in 0.2 second intervals or

better.

3.6 Chemicals — Acetone, chromic acid, methyl ethyl

ketone, xylene.

4 Procedure

4.1 Confirm that the constant temperature bath is

equilibrated to 25.0 ± 0.1° C.

4.2 Select a clean dry viscometer of appropriate

viscosity range. Choose the proper tube size for the

given viscosity so that the efflux time is greater than or

equal to 200 seconds.

4.3 Charge the viscometer with photoresist in the

manner dictated by the design of the viscometer and

wipe clean.

4.4 Insert the viscometer into the clamp holder in the

constant temperature bath. Vertical alignment of the

viscometer is essential for proper flow measurement.

4.5 Allow 15 minutes for the sample temperature to

equilibrate.

4.6 Use suction or pressure to adjust the level of the

test sample to a position in the capillary arm about 5

mm ahead of the first timing mark.

4.7 With the sample flowing freely, measure the time

for the meniscus to pass from the first timing mark to

the second. Record the time in seconds.

4.8 Repeat the steps in Sections 4.6 and 4.7. (For

reverse flow viscometers, use the same or another

viscometer and begin with the step in Section 4.3 for

the second measurement.)

4.9 The two measurements must agree within 0.5

seconds. If they do not agree, then reject the

measurement results.

4.10 After the measurement, the viscometer should be

flushed several times with a suitable solvent (methyl

ethyl ketone or acetone for typical novolac positive

resists or equivalent and xylene for rubber based

negative resists or equivalent).

4.11 Dry the tube by blowing dry, filtered air through

the viscometer for a few minutes.

4.12 The viscometer should periodically be cleaned

with chromic acid to remove trace organic deposits.

5 Calculation

5.1 Average the flow measurements.

5.2 Kinematic viscosity in cTs = Viscometer constant

× efflux time in seconds.

5.3 Dynamic viscosity in cP = Photoresist density at

25.0° C in g/mL × kinematic viscosity in cSt.

NOTICE: SEMI makes no warranties or

representations as to the suitability of the standards set

forth herein for any particular application. The

determination of the suitability of the standard is solely

the responsibility of the user. Users are cautioned to

refer to manufacturer’s instructions, product labels,

product data sheets, and other relevant literature

respecting any materials mentioned herein. These

standards are subject to change without notice.

The user’s attention is called to the possibility that

compliance with this standard may require use of

copyrighted material or of an invention covered by

patent rights. By publication of this standard, SEMI

takes no position respecting the validity of any patent

rights or copyrights asserted in connection with any

item mentioned in this standard. Users of this standard

are expressly advised that determination of any such

patent rights or copyrights, and the risk of infringement

of such rights, are entirely their own responsibility.

International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o

the contents in whole or in part is forbidden without express written

consent of SEMI.