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SEMI C56-0305 © SEMI 2005 4 NOTICE: SEMI makes no warranties or represen tations as to the suitability o f the standards set forth herein for any particular application. The determination of the suitability of the standa…

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SEMI C56-0305 © SEMI 2005 3
9 Analytical Procedures for Purity of 97% of Dichlorosilane
NOTE 1: The sample is extremely flammable and corrosive. Test for leaks before sampling. Ensure good electrical grounding.
9.1 Other Chlorosilanes — This procedure is for the determination of other chlorosilanes (monochlorosilane,
trichlorosilane and silicon tetrachloride) in dichlorosilane using a gas chromatograph with a thermal conductivity
detector.
9.1.1 Detection Limit — 10 ppm.
9.1.2 Instrument Parameters
9.1.2.1 Column: 3.05 m (10 ft) by 3.2 mm (1/8 in) stainless steel tubing packed with 20% OV-101 on 80/100
Chromosorb W-HP or equivalent.
9.1.2.2 Carrier Flow: 20 mL/min helium.
9.1.2.3 Sample Volume: 0.5 to 1.0 mL.
9.1.2.4 Temperatures:
Detector 350°C
Column 60°C ramped to 325°C at 10°C/min
Inlet 300°C
9.1.3 Operating Procedure
9.1.3.1 Inject a known sample of monochlorosilane, trichlorosilane and silicon tetrachloride in dichorosilane into
the column using a gas sampling valve. Record the retention times and peak areas. The order of elution is
monochlorosilane, dichlorosilane, trichlorosilane, silicon tetrachloride.
9.1.3.2 Inject the sample to be tested in the same manner as in ¶9.1.3.1. Record the areas of the peaks which have
the same retention times as those in ¶9.1.3.1.
9.1.3.3 Repeat ¶9.1.3.1.
9.1.3.4 Calculate the purity of dichlorosilane in the sample, using the equations stated below. The result may not
exceed the specification in Table 1 of this standard.
9.1.4 Calculations
9.1.4.1 Determine the total area of the chlorosilane peaks (A
T
) by adding the areas of the four peaks.
9.1.4.2 Divide the area of the dichlorosilane peak by A
T
. Multiply the result by 100% to obtain the purity of the
dichlorosilane.
10 Analytical Procedures for Purity of 99% of Dichlorosilane (see Note 1 in §9)
10.1.1 Other Chlorosilanes — Follow the procedure in §9 except add the following calculation for
monochlorosilane.
10.1.2 Calculations for monochlorosilane
10.1.2.1 Calculate the percentage the monochlorosilane in the sample using the equation stated below. The result
may not exceed the specification in table 1 of this standard.
10.1.2.2 Divide the area of the monochlorosilane peak by A
T
. Multiply the result by 100% to obtain the percentage
of monochlorosilane.
SEMI C56-0305 © SEMI 2005 4
NOTICE: SEMI makes no warranties or representations as to the suitability of the standards set forth herein for any
particular application. The determination of the suitability of the standard is solely the responsibility of the user.
Users are cautioned to refer to manufacturer's instructions, product labels, product data sheets, and other relevant
literature, respecting any materials or equipment mentioned herein. These standards are subject to change without
notice.
By publication of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position
respecting the validity of any patent rights or copyrights asserted in connection with any items mentioned in this
standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and
the risk of infringement of such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction of
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI C57-0305 © SEMI 2005 1
SEMI C57-0305
SPECIFICATIONS AND GUIDELINES FOR ARGON
This specification was technically approved by the Global Gases Committee and is the direct responsibility of
the North American Gases Committee. Current edition approved by the North American Regional Standards
Committee on December 10, 2005. Initially available at www.semi.org January 2005; to be published March
2005.
NOTICE: This document replaced SEMI C3.1, SEMI C3.42, and SEMI C3.46 in 2005.
1 Purpose
1.1 The purpose of this document is to provide a series of specifications for different grades of Argon (Ar) that are
used in the semiconductor industry.
2 Scope
2.1 This document covers requirements for all grades of Argon used in the semiconductor industry.
2.2 If analytical methods are not complete, the requirements are presented as a guideline.
NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
3 Description
3.1 Argon is the most abundant member of the rare gas family. It is monatomic and is characterized by its extreme
chemical inactivity. Argon is a colorless, odorless and tasteless gas somewhat soluble in water. It is normally
delivered and stored as a cryogenic liquid.
4 Limitations
4.1 None.
5 Referenced Standards
5.1 SEMI Standards
SEMI C1 — Specifications for Reagents
SEMI C3 — Specifications for Gases
NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions
6 Terminology
6.1 Terminology appropriate to this standard is defined in SEMI C3.
7 Requirements
7.1 Purity and other requirements for the various grades of Argon are given in Table 1.