semi合集-English.pdf - 第936页
SEMI E119-1104 © SEMI 2002, 2004 8 Table 1 Internal FOBI T Dimensions (Figures 1 5) Symbol Used Figure Number Value Specified Datum Measured from Boundary or Feature Measured to r 1 1 151 mm (5.94 in.) maximum nominal …

SEMI E119-1104 © SEMI 2002, 2004 7
must not allow a wafer to move outside of a circle of
radius corresponding to the larger bound on r2. There
are two exceptions to this limit on wafer movement.
When the wafer is pushed toward the rear of the
FOBIT, the location of the wafer is defined by the
wafer pick-up volume (see Section 5.7.3). When the
FOBIT is gently tilted forward up to 45°, the wafers
may slide forward, but it is recommended that they not
extend further than y20 from the facial datum plane.
5.7.2 Wafer Extraction Volume — The open space for
the wafer extraction volume includes a cylindrical
section with radius r3 and a main axis parallel to and y1
in front of the nominal wafer centerline. The top of this
cylindrical section is z11 above the nominal wafer-
seating plane and its bottom is z23 above the nominal
wafer-seating plane. The wafer extraction volume also
includes the extrusion out the front of the FOBIT of this
cylindrical section. The implications for wafer
extraction of the definition of dimension r3 (r3 r2 +
1) are as follows; the FOBIT must give an extra 1mm
(0.04 in.) of horizontal clearance once the wafer is
picked up from wherever it ends up (within the bounds
of r2) after transport in the FOBIT.
5.7.3 Wafer Pick-Up Volume — If a wafer is placed in
the wafer set-down volume and is then pushed toward
the rear of the FOBIT, then the entire bottom of the
wafer must be contained in the wafer pick-up volume.
However, if the wafer is not pushed toward the rear of
the FOBIT, then the wafer may only be somewhere
within the wafer extraction volume. The wafer pick-up
volume is defined by a cylindrical section with radius
r1 and a main axis at the nominal wafer centerline. Its
top and bottom are the upper and lower tolerance of z10
around the nominal wafer-seating plane.
z
8 =35
x
3
125
z
12 =6.25
z
12 =6.25
bilateral
datum
plane
horizontal
datum plane
bottom
nom inal
wafer
plane
z
6
28.5
Figure 5
Lower Cross-Section at Facial Datum Plane

SEMI E119-1104 © SEMI 2002, 2004 8
Table 1 Internal FOBIT Dimensions (Figures 15)
Symbol
Used
Figure
Number
Value Specified
Datum Measured from
Boundary or Feature Measured to
r1 1 151 mm (5.94 in.)
maximum
nominal wafer centerline outer edge of wafer pick-up volume
r2 1, 4 152 = + 1/– 0 mm
(5.98 + 0.04 – 0 in.)
y1 in front of nominal
wafer centerline
encroachment of FOBIT side domains on
wafer set-down volume
r3 1, 4 r2 + 1 mm (0.04 in.)
minimum
y1 in front of nominal
wafer centerline
encroachment of FOBIT side domains on
wafer extraction volume
r4 1 170 mm (6.69 in.)
minimum
nominal wafer centerline encroachment of FOBIT on end effector
exclusion zone between front and rear FOBIT
side domains
x1 1, 3 50 mm (1.97 in.)
minimum
bilateral datum plane inside of rear FOBIT side domains
x2 1, 3 75 mm (2.95 in.)
maximum
bilateral datum plane outside of rear FOBIT side domains
x3 1, 3, 4, 5 125 mm (4.92 in.)
minimum
bilateral datum plane inside of front FOBIT side domains
x51 1 140 mm (5.51 in.)
minimum
bilateral datum plane interior of FOBIT sides between y11 and y49
x52 1 170 mm (6.69 in.)
minimum
bilateral datum plane interior of FOBIT sides between y49 and y52
y1 1 3 mm (0.12 in.)
maximum
facial datum plane origin of r2 and r3 on bilateral datum plane
y5 1, 2 120 mm (4.72 in.)
minimum
facial datum plane front of rear FOBIT side domains
y11 1 85 mm (3.35 in.)
maximum
facial datum plane interior of FOBIT sides between x3 and x51
y20
#1
None 158 mm (6.22 in.) facial datum plane maximum protrusion of wafers toward the
front of the FOBIT
y49 1 134 mm (5.28 in.)
maximum
facial datum plane interior of FOBIT sides between x51 and x52
y51 1, 6, 8 140 mm (5.51 in.)
minimum
facial datum plane rear of door
z6 2, 3, 5 28.5 mm (1.12 in.)
maximum
horizontal datum plane top of FOBIT bottom domain
z8 2, 3, 5 35 mm (1.38 in.) horizontal datum plane bottom nominal wafer seating plane
z10 4 0 ± 0.5 mm
(0.00 ± 0.02 in.)
each nominal wafer
seating plane
entire bottom of the wafer
z11 4 2.9 mm (0.11 in.)
minimum
each nominal wafer
seating plane
encroachment of FOBIT side domains on
clearance above the wafer
z12 2, 3, 4, 5 6.25 mm (0.25 in.)
nominal
each nominal wafer
seating plane
adjacent nominal wafer seating planes
z15 2, 3, 4 4.6 mm (0.18 in.)
minimum
top nominal wafer
seating plane
bottom of FOBIT top domain
z23 4 1.5 mm (0.06 in.)
maximum
each nominal wafer
seating plane
bottom of wafer extraction volume
#1
These dimensions are for optional features.
5.8 External Dimensions — Figures 6 through 8 and
Figure 10 show the side, rear, top, and bottom views for
the FOBIT, respectively. Table 2 defines all of these
dimensions. In this and following figures, the heaviest
lines are used for surfaces that have tolerances (not
surfaces that have only maximum or minimum
dimensions). If an identification tag is used, it must be
located at the bottom rear centered on the bilateral
datum plane and must be contained within the
maximum outer dimensions of the FOBIT.

SEMI E119-1104 © SEMI 2002, 2004 9
5.9 Human Handles — All handles for use by humans
must either be contained within the maximum outer
dimensions of the FOBIT, be detached when not in use,
or be retractable into the maximum outer dimensions
when not in use. Although such handles may extend
past x53, they must still be contained within the upper
limits of x50, y40, and r67. Handles for use by humans
(if present) must follow SEMI S8, and they must
require the use of both hands (each using a full wrap-
around grip, given the minimum clearance requirement
in SEMI E15.1). Automation handling features shall not
be considered dual purpose unless they are designed to
meet SEMI S8 guidelines.
5.10 Automation Handling Features — On the top of
the FOBIT, there is an optional robotic handling flange
for manipulating the FOBIT as illustrated in Figure
9n the bottom of the FOBIT, there are optional rails
for use with roller conveyors or forklifts as shown in
Figures 6, 7 and 10. Although they are only required to
extend y58 behind the facial datum plane on both the
left and right sides, it is recommended that they be as
long as possible. Beyond y58, only the lower bound on
z43 applies. These optional conveyor rails (defined by
x56, x57, y58, and z43) are located on the left and right
bottom edges of the front-opening box and also have
vertical cylindrical pin holes for forklift centering
(defined by d65).
y51
140
facial
datum plane
horizontal datum of
box nest or load
port plane
y53
190
y50
130
y46
= 71 ± 1
y44
53
z49
8
z48
15
z47
= 221
± 1
y40
116
human
handle
(optional)
front side
of the
FOBIT
where
wafers
are
accessed
y
58 75
z41
0
d65 = 10 ± 0.5
z65
7
z43 = 2±1
y52 = 165.5 ± 0.5
(at seal zones, etc.)
166 (elsewhere)
Figure 6
Side View of FOBIT