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SEMI C3.57-06 00 © SEMI 2000 1 SEMI C3.57-0600 SPECIFICA TION FOR CARBON DIOXIDE, CO 2 , ELECTRONIC GRA DE IN CYLINDERS This specif ication was technic ally approved by the Global Ga ses Committee and is the direct respo…

SEMI C3.27-1102 © SEMI 1984, 2002 7
stirring speed. The important point is the speed of stirring and
time should be constant for the standards and the samples.
8.5.5.7 Immediately after the stirring is completed,
pour some of the solution into the absorption cell of the
photometer. Record the measured turbidity after 4
minutes.
NOTE 7: If the reading is off the calibration curve, prepare a
new curve with standards in the required range, or take a
smaller portion of sample.
8.5.5.8 Prepare a sample blank using the same
quantities of all reagents except the barium chloride,
which is withheld. Read the blank and obtain the
correction.
8.5.5.9 After proper correction for the blank, determine
the mg of sulfate from the calibration curve.
8.5.6 Calculations
mg SO
4
−
×
1
×
10
6
1000
(B
-
A)
×
F
=
ppm SO
4
−
2
where
:
F is from Section 8.1.4.8
1/8" Steel Pipe
1/8" Steel
Sleeve
1/8" Brass
Needle Valve
Stainless
Steel Needle
1/4" Steel
Coupling
Gas Cylinder
Connection
1/8" to 1/4"
Steel
Bushing
1/4" Steel Pipe
1/4" Tygon Tubing
®
Figure 1
Preparation of Sample Solution in Ice
Figure 2
Modified Gas Collecting Tube
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer’s instructions, product labels,
product data sheets, and other relevant literature
respecting any materials mentioned herein. These
standards are subject to change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.

SEMI C3.57-0600 © SEMI 20001
SEMI C3.57-0600
SPECIFICATION FOR CARBON DIOXIDE, CO
2
, ELECTRONIC GRADE
IN CYLINDERS
This specification was technically approved by the Global Gases Committee and is the direct responsibility of
the European Gases Committee. Current edition approved by the European Regional Standards Committee on
April 4, 2000. Initially available at www.semi.org May 2000; to be published June 2000.
1 Description
1.1 Carbon dioxide is a non-flammable, colorless,
odorless, slightly acidic gas which is stable under
normal conditions.
2 Specifications
Purity: 99.999%
Impurities Maximum Acceptable Level
Nitrogen 4 ppm
Oxygen 1 ppm
Methane 0.5 ppm
Moisture 2 ppm
3 Referenced Standards
3.1 DIN Standard
1
DIN 50457-1
NOTE 1: As listed or revised, all documents cited shall be the
latest publications of adopted standards.
4 Physical Constants (for in formation only)
Formula CO
2
Molecular weight 44
Melting point
-56.6°C
Boiling point
-78.5(s)°C
Critical temperature
30°C
Relative density, gas 1.52 (air=1)
Relative density, liquid 0.82 (water=1)
Vapor pressure 20°C
57.3 bar
Appearance/Color Colorless gas
Odor none
5 Analytical Procedures
5.1 Nitrogen, oxygen and methane — This procedure
is for the determination of nitrogen, oxygen and
methane using a gas chromatograph with discharge
ionization detector and heartcut column switching.
5.1.1 Detection Limit — 100 ppb.
1 Deutches Institut für Normung e.V., BeuthVerlag GmbH,
burggrafenstrasse 4-10, D10787 Berlin, Germany, www.din.de
5.1.2 Instrument Parameters
5.1.2.1 Columns
Column 1: Hayesep Q, 2 meters by 3 mm (Stainless-
steel or nickel rich alloy).
Column 2: Molecular sieve 5A, 3 meters by 3 mm
(Stainless-steel or nickel rich alloy) 80/100 mesh or
equivalent.
5.1.2.2 Carrier Flow: 25 mL/minute helium.
5.1.2.3 Sample Volume: 2 mL.
5.1.2.4 Temperatures:
Detector
110°C
Column Oven
50°C
Injector Ambient
5.1.3 Calibration Standard — 1–10 ppm (mole/mole)
nitrogen, oxygen and methane, balance helium.
5.1.4 Operating Procedure
5.1.4.1 Inject the calibration standard into the gas
chromatograph via the gas sampling valve. Record the
retention times and peak areas for the components
within the standard. The order of elution is: oxygen,
nitrogen, methane.
5.1.4.2 Inject the sample to be tested in the same
manner as the calibration standard. Record the retention
times and peak areas. The carbon dioxide matrix gas is
vented via the heartcut.
5.1.4.3 Repeat 5.1.4.1.
5.1.4.4 Compare the average peak areas of the
calibration standard to that of the unknown carbon
dioxide sample being tested. Calculate the
concentrations of oxygen, nitrogen and methane using
the formula below. The results shall not exceed the
values specified in Section 2 of this standard.
Sample Peak Area
Standard Peak Area
×
Concentration
Standard
=
Concentration
Sample
5.2 Moisture — This procedure is for the determin-
ation of moisture in carbon dioxide using a direct
readout moisture analyzer with a phosphorus pentoxide
electrolytic cell.

SEMI C3.57-0600 © SEMI 2000 2
5.2.1 Detection Limit — 100 ppb.
5.2.2 Instrument Parameters
5.2.2.1 Flow requirements — Zero and span the
analyzer in accordance with the instrument
manufacturers instructions. Set the sample gas flow to
the rate specified by the manufacturer.
5.2.3 Calibration standard — The analyzer shall be
calibrated at the time of use by reference to a standard
gas calibration mixture containing a certified moisture
content close to the expected value of the gas under
test. If the analyzer indicates the certified moisture
content, within the overall measurement uncertainties
stated by the instrument and gas manufacturers, it may
be used without further adjustment or calibration.
NOTE 2: Further Experimental detail may be found in DIN
50450-1.
5.2.4 Sample system
5.2.4.1 Use insulated stainless steel sample lines to
prevent frosting during sampling.
5.2.4.2 Keep sample lines to a minimum length.
5.2.5 Operating Procedure
5.2.5.1 Follow the procedures specified in the
instrument manufacturer’s manual.
5.2.5.2 Allow the system to run until a stable reading
is obtained for 5 minutes.
5.2.5.3 Read and record the concentration of moisture,
in ppm, indicated on the moisture analyzer. The result
obtained shall not exceed the value specified in Section
2 of this standard.
NOTE 3: This specification applies to gaseous phase product
from a cylinder supply.
NOTE 4: It is recommended that the user discontinue use of
the cylinder prior to the complete consumption of the liquid
phase contents. The contents of cylinders containing liquefied
product should be determined by weight and not pressure.
NOTE 5: Adopt a replicate sampling protocol for both
calibration standard and unknown to achieve the required
measurement uncertainty.
NOTICE: SEMI makes no warranties or representa-
tions as to the suitability of the specification set forth
herein for any particular application. The determination
of the suitability of the specification is solely the
responsibility of the user. Users are cautioned to refer
to manufacturer’s instructions, product labels, product
data sheets, and other rele-vant literature respecting any
materials mentioned herein. These specifications are
subject to change without notice.
The user’s attention is called to the possibility that
compliance with this specification may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this specification,
SEMI takes no position respecting the validity of any
patent rights or copyrights asserted in connection with
any item mentioned in this specification. Users of this
specification are expressly advised that determination
of any such patent rights or copyrights, and the risk of
infringement of such rights, are entirely their own
responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.