semi合集-English.pdf - 第4951页
SEMI M11-0704 © SEMI 1988, 2004 8 Figure 6 Double Epi taxial Stacking Fault. Atomic Force Microscope image. Approx imate SSIS event sc attering size 1.05 µm
SEMI M11-0704 © SEMI 1988, 2004 7
Figure 5
Epitaxial Stacking Fault showing four sides and a deep depression on on side of about 20 nm. Atomic Force
Microscope Image. Approximate SSIS scattering event size, 0.30 µm.
SEMI M11-0704 © SEMI 1988, 2004 8
Figure 6
Double Epi taxial Stacking Fault. Atomic Force Microscope image. Approximate SSIS event scattering size
1.05 µm
SEMI M11-0704 © SEMI 1988, 2004 9
Figure 7
The Epitaxial Stacking Fault Cluster classification is used to define a group of ESFs in close proximity on the
wafer surface. The group can either be overlapping or in a line (except when the line appears to be part of a
Pre-Epi Scratch). Magnification 500 times using Nomarski Interference Microscopy. Approximate SSIS
event size, 0.20 µm
20
µ
m