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SEMI E90-0705 © SEMI 1999, 2005 15 Data Identifier Description Form SubstLocID Equipment substrate locatio n on which the substrate has visited. Must be copied from SubstLocID of which th e substrate has visited. (If bat…

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SEMI E90-0705 © SEMI 1999, 2005 14
Attribute Name Definition Access Reqmt Format
SubstLocID Identifier for current equipment substrate location. RO Y Text (If batch process
equipment, this data is
empty while the substrate
belongs to a batch)
SubstPosInBatch Current substrate position in a batch. RO N Text (batch process
equipment only, and empty
if substrate position in a
batch is not informed)
SubstProcState Processing state of the substrate.
“NEEDS PROCESSING”: initial value to indicate that
processing in the equpment is required and has not started.
“IN PROCESS”: processing has started.
“PROCESSED”: processing has completed normally.
“ABORTED”: processing has terminated abnormally.
“STOPPED”: processing has terminated at completion of
certain processing step.
“REJECTED”: the substrate has been identified as needing
special treatment.
“LOST”: the substrate has been removed from the equipment
by an external agent or it is physically missing.
“SKIPPED”: the substrate was not processed.
RO Y Enumerated:
NEEDS PROCESSING
IN PROCESS
PROCESSED
ABORTED
STOPPED
REJECTED
LOST
SKIPPED
SubstSource Identifier of the substrate location on which the substrate has
been initially registered.
When a carrier is used for registering the substrate, the value
shall be the concatenation of carrier identifier (carrier ID)
string and a numeric string representing the substrate position
in the carrier to represent the carrier and position of the
substrate registered.
RO Y Text
SubstState Transport state of the substrate. RO Y Enumerated:
AT SOURCE
AT WORK
AT DESTINATION
SubstType The type of the substrate. It includes wafers, flat panels, CD’s
or masks.
RW N Enumerated:
WAFER
FLAT PANEL
CD
MASK
SubstUsage How the substrate is used, such as “product”, “test”, and
“filler”.
RW N Enumerated:
PRODUCT
TEST
FILLER
Additional types defined
and added by the
equipment.
9.5.2 SubstHistory attribute is a composite data type. The constitute data is defined in Table 3.
Table 3 Attribute Data Definition
Data Identifier Description Form
BatchLocID+“.”+Su
bstPosInBatch
Batch location, on which the group of substrates (e.g., batch) has
visited, with substrate position information in a batch (recorded
while the substrate belongs to a batch).
For example, if BatchLocID = “Chamber-A” and
SubstPosInBatch = “30”, then what is recorded is “Chamber-
A.30”.
Text (batch process equipment only,
and if substrate position in a batch is
not informed “.”+SubstPosInBatch
portion is not recorded).
SEMI E90-0705 © SEMI 1999, 2005 15
Data Identifier Description Form
SubstLocID Equipment substrate location on which the substrate has visited.
Must be copied from SubstLocID of which the substrate has
visited. (If batch process equipment, this data is not recorded
while the substrate belongs to a batch.)
Text
TimeIn Actual arrival time of the substrate on the substrate location. The format of the timestamp defined
by the protocol for implementation.
TimeOut Actual departure time of the substrate from the substrate location. The format of the timestamp defined
by the protocol for implementation.
10 Substrate Location Object Definition
10.1 A Substrate Location Object (SLO) provides a model for identifying substrate locations. Each SLO on an
equipment is assigned a substrate location ID to uniquely identify it. The assignment shall be documented by the
equipment supplier. There are two types of substrate locations: carrier substrate location, which is the location or
position (e.g., slot) in the carrier, and equipment substrate location, which is on the equipment resource. The
equipment substrate location is a persistent object, while the carrier substrate locations are dynamic objects that shall
be created or deleted by the placement or removal of carriers on the equipment.
10.1.1 Source substrate locations and Destination substrate locations are the points at which substrates transfer
to/from the equipment’s internal substrate locations (often locations at which processing occurs). A carrier substrate
location is the Source or Destination substrate location when a carrier is used to transfer the substrate. An equipment
substrate location can be the Source or Destination substrate location when the substrate is transferred directly
(without a carrier).
10.2 Substrate Location State Model
Figure 4 shows the dynamic behavior of the substrate location using the Harel state chart representation.
UNOCCUPIED
OCCUPIED
SUBSTRATE LOCATION
1
2
Figure 4
Dynamic Behavior Model of Substrate Location
A-1.1.1.2
10.3 Substrate Location State Definitions
10.3.1 SUBSTRATE LOCATION — the superstate of UNOCCUPIED and OCCUPIED.
10.3.2 UNOCCUPIED — the state in which the substrate location does not hold or have a substrate.
10.3.3 OCCUPIED — the state in which the substrate location holds a substrate.
10.4 Substrate Location State Transition
Table 4 Substrate Location State Model Transition Table
No. Current State Trigger New State Action Comment
1 UNOCCUPIED Substrate moves onto the substrate location. OCCUPIED None.
2 OCCUPIED Substrate moves off the location. UNOCCUPIED Update substrate
tracking history.
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10.5 Substrate Location Object Attributes
10.5.1 Table 5 defines attributes for substrate location objects. These attributes can be accessed by using GetAttr
and SetAttr messages as defined in SEMI E39 (OSS).
Table 5 Substrate Location Object Attribute Table
Attribute Name Definition Access Reqmt Format
DisableEvents When set to TRUE, the transitions for this
substrate location do not generate events to
the host.
RW Y Boolean
TRUE = Disable
FALSE = Enable
ObjID Object Identifier. RO Y Text equal to the Substrate Location ID
ObjType Object type. RO Y Text = “SubstLoc”
SubstID Substrate Identifier relevant to the location. RO Y Text
SubstLocState Substrate Location state. RO Y Enumerated:
UNOCCUPIED, OCCUPIED
11 Batch Location Object
11.1 A Batch Location Object (BLO) provides a model for identifying a group of substrates (e.g., batch) locations.
Each BLO on an equipment is assigned a batch location ID to uniquely identify it. The assignment shall be
documented by the equipment supplier. The batch location is a persistent object.
11.2 Batch Location State Model
11.2.1 Figure 5 shows the dynamic behavior of the batch location using the Harel state chart representation.
OCCUPIEDUNOCCUPIED
BATCH LOCATION
C
2
1
Figure 5
Dynamic Behavior Model of Batch Location
11.3 Batch Location State Definitions
11.3.1 BATCH LOCATION — the superstate of UNOCCUPIED and OCCUPIED.
11.3.2 UNOCCUPIED — the state in which the batch location does not hold or have any substrate of batch.
11.3.3 OCCUPIED — the state in which the batch location holds one or more substrates of batch.
11.4 Batch Location State Transition
Table 6 Batch Location State Model Transition Table
No. Current State Trigger New State Action Comment
1 UNOCCUPIED A group of substrates (e.g.,
batch), even if they are a part of
group, moves onto the batch
location.
OCCUPIED None.
2 OCCUPIED All substrates of the group (e.g.,
batch) moves off the location.
UNOCCUPIED Update substrate
tracking history.