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SEMI M58-0704 © SEMI 2004 11 Lab: Company ABC Identification of deposition system used: 1 Contact N . P. Teste r Supplier/Model # Dep Sys/45U 2 Address 456 Main Street Syste m S/N 12345 3 Anywhere, CA, U SA Syste m S/W R…

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SEMI M58-0704 © SEMI 2004 10
R2-3.5 Interpretation of Results
R2-3.5.1 A conditional command is used to
automatically grade results for Uncertainty and FWHM.
R2-3.5.1.1 The equation for Bottle B Uncertainty (row
50) is: =IF(J34>0.03," Fail" ," Pass" ), and the others are
similar.
R2-3.5.1.2 The equation for Bottle B FWHM (row 51)
is =IF(J35>0.05," Fail" ," Pass" ), and the others are
similar.
R2-3.5.2 These are the only two requirements of SEMI
M52 verified by this test method. Two additional
comparisons are made for information only:
R2-3.5.2.1 The SSIS Peak diameter is compared with
the corrected deposition system peak diameter (row 52).
For Bottle B the equation is =B52/J37, and the others
are similar.
R2-3.5.3 Finally, the SSIS mean count is compared
with the count from the deposition system (row 53).
The equation for Bottle B is =E52/$ D$ 13, and the
others are similar.
SEMI M58-0704 © SEMI 2004 11
Lab: Company ABC Identification of deposition system used:
1
Contact
N
. P. Teste
r
Supplier/Model # Dep Sys/45U
2
Address
456 Main Street System S/N 12345
3
Anywhere, CA, USA System S/W Revision 3
4
Phone
782-555-5555 Date of Test
5
email nptester@abcco.com
Date of Last Previous Test
N
ot applicable
6
7
Characteristics of Suspensions Used for Test
8
u
B
ottle i
%FWHM
i
9
B
ottle A, Certified
100.7 nm ± 0.5
nm (1
σ
) or
0.5% 2.0%
10
79 nm ± 2.6
nm (1
σ
) or
3.3% 10.0%
11
145 nm ± nominal
nm (1
σ
) or
not available unknown
12
Particles Deposited (
N
)
3000
13
S
upplier
P
art No.
L
ot No.
14
Deposition System Diameters (nm)
B
ottle A
N
IST SRM 1963 ? ?
15
B
ottle A
B
ottle B
B
ottle
C
B
ottle A
B
ottle B ? ? ? ? ? ?
16
D
ay
nm nm nm nm
B
ottle
C
? ? ? ? ? ?
17
1
101.5 79.6 155.6 101.0
18
2
100.5 79.0 153.9 101.0
19
3
101.0 78.2 154.6 102.0 SSIS Data: Bottle C
20
4
102.0 78.5 155.9 102.0
21
5
101.0 78.1 154.3 102.0
22
M
ean
101.2 78.7 154.9 101.6
D
ay
nm nm %
23
s
D
ep
0.6% 0.8% 0.6% 0.5%
1
149.2 3.3 2.21% 2815
24
2
148.9 3.6 2.42% 2548
25
Dep System Sizing Corrections
3
150.9 3.4 2.25% 2720
26
M
ean
A
=
101.4 nm
4
151.1 3.6 2.38% 2716
27
s
D
epA
=
0.6%
5
149.7 3.4 2.27% 2178
28
Cert
A
−
Mean
A
=
-0.7 nm
M
ean
150.0 3.5 2.31% 2595
29
Std Dev 0.994 0.134 0.088%
252.4
30
SSIS Data: Bottle A
31
Analysis
32
B
ottle A
B
ottle B
B
ottle
C
33
D
ay
nm nm %
D
ep Peak Uncertainty
1.5% 1.9% 1.5%
34
1
95.6 2.1 2.20% 2178
F
WHM (SSIS)
2.3% 3.3% 2.3%
35
2
95.9 2.2 2.29% 2418
P
eak (Dep System)
101.4 78.7 154.9
36
3
96.1 2.3 2.39% 2555
P
eak (Dep Sys Corrected)
100.7 78.1 153.8
37
4
96.1 2.2 2.29% 2512
P
eak (SSIS)
96 72 150
38
5
96.2 2.2 2.29% 1929
M
easured Count
2318 2524 2595
39
M
ean
96.0 2.2 2.29% 2318
40
Std Dev 0.239 0.071 0.070% 262.1
Compare Quantity with Limit
41
42
SSIS Data: Bottle B
Uncertainty Limit
43
F
WHM Limi
t
44
SSIS Peak
45
D
ay
nm nm %
SSIS Count
46
1
72.6 2.4 3.31% 2297
47
2
71.6 2.3 3.21% 2690 Interpretation of Results
48
3
72.2 2.3 3.19% 2742
B
ottle A
B
ottle B
B
ottle
C
49
4
72.2 2.3 3.19% 2735
Uncertainty
Pass Pass Pass
50
5
71.2 2.5 3.51% 2156 Pass Pass Pass
51
M
ean
72.0 2.4 3.28% 2524
SSIS/Dep Peak Comp
0.95 0.92 0.98
52
Std Dev 0.555 0.089 0.138%
276.8
SSIS/Dep Count Comp
0.77 0.84 0.87
53
A B C D E F G H I J K
August 20, 2003
B
ottle B
B
ottle
C
S
uspension
P
ea
k
Diameter
M
easured
Peak
F
WHM
on Wafer
R
elative
F
WHM
Count
F
WHM
Dep Sys Corrected Peak (Info only)
5.0% (SEMI M52)
3.0% (SEMI M52)
Dep System Count (Info only)
Count
L
imi
t
F
WHM
on Wafer
M
easured
Peak
R
elative
F
WHM
Quantity
Count
R
elative
F
WHM
M
easured Pea
k
F
WHM on
Wafer
Figure R2-1
Example Test Results
SEMI M58-0704 © SEMI 2004 12
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