semi合集-English.pdf - 第5628页

SEMI P10-0705 © SEMI 1990, 2005 123 8.1.206 END_CD_GROUP_MEAS UREMENTS — (text) must m atch data field of START_CD_GROUP_MEASUREMENTS. 8.1.207 EN D_CD_ISO_DENSE — (text) must match data field of START_CD_ISO_DENSE. 8.1.2…

100%1 / 7923
SEMI P10-0705 © SEMI 1990, 2005 122
8.1.182 DEFECT_SIZE_DK_ISO_REP — Maximum dimension of smallest unacceptable dark, repeating isolated
defect.
8.1.183 DEFECT_TYPE — (PINHOLE, EDGE, PINDOT, CD, SEMI_TRANS, MASSIVE, CLIPPED,
PATTERN, REFL_PATTERN, PAT_PINHOLE, REFL_PINHOLE, CORNER, LINE_END, BASIC, ISO,
MID_SIZE and others on request) Setup parameter for defect inspection.
8.1.184 DEFECTIVE_DIE_DENSITY — Maximum allowable number of die with defects per square centimeter
within the INSPECTION_AREA.
8.1.185 DEFECTIVE_DIE_COUNT — Integer maximum allowable number of die with defects within the
INSPECTION_AREA.
8.1.186 DEFECTIVE_DIE_COUNT_REP — Integer maximum number of repeating defective die within the
INSPECTION_AREA.
8.1.187 DELIVERABLE_MASK — (T or F) If F, the mask is to be held internally by the mask shop for the
production of other deliverable masks. For a MASK_ID with MULTIWRITE, only the final write and process step
MASK_ID within the multiwrite group may have DELIVERABLE_MASK = T.
8.1.188 DELIVERY_PRIORITY — Alphanumeric text, to be agreed between the customer and supplier, describing
urgency for delivery (e.g., rush, standard, slow).
8.1.189 DESIGN_RULE — Numeric data field indicates the nominal minimum dimension of wafer geometries.
8.1.190 DIE_TO_DIE_INSPECTION — (T or F) If T, die-to-die inspection is required.
8.1.191 DIE_TO_DIE_MEASUREMENTS – (T or F) If T, indicates that the defect inspection performed was die-
to-die. If F, indicates defect inspection performed was die-to-database.
8.1.192 DIGITIZED_DATA_DARK — (T or F) If T, the image of digitized data is to be opaque on the mask. If F,
the image of digitized data is to be clear.
8.1.193 DROPOUT — (x,y) Row and column of pattern or cell placement which is to be omitted in the array.
These array coordinates are rectangular (even if the actual written array is non-rectangular), with the origin at the
lower left of the array (chrome side up before mirroring).
8.1.194 DUE_DATE_TIME_COMMITTED — (date,time) For delivery (at customer) committed by vendor.
8.1.195 DUE_DATE_TIME_REQUESTED — (date,time) Requested for delivery (at customer).
8.1.196 DXF_ANGLE — (integer) To be used if DATA_FORMAT is DXF.
8.1.197 DXF_UNIT — (integer) To be used if DATA_FORMAT is DXF.
8.1.198 EDGE_ROUGHNESS — The (numeric) maximum value of edge roughness, based on physical
measurements.
8.1.199 ELAPSED_TIME — Numeric hours between masking steps in the wafer fab. Used in conjunction with
LAYER_PRIORITY, provides scheduled due dates based on the delivery of each previous mask. No mask may
have both ELAPSED_TIME and DUE_DATE_REQUESTED. See LAYER_PRIORITY.
8.1.200 ELAPSED_TIME_COMMITTED — Numeric hours for delivery (at customer) committed by vendor.
8.1.201 ELAPSED_WRITE_TIME — (number) The total time in minutes that the given lithography operation took
to write the mask.
8.1.202 EMAIL_ADDRESS — Internet address.
8.1.203 END_BARCODE — (text) must match data field of START_BARCODE.
8.1.204 END_BILLING_INFORMATION — (text) Indicates the end of the <billing_information> section. Must
match data field of START_BILLING_INFORMATION.
8.1.205 END_CD — Alphanumeric data field must match data field of START_CD.
SEMI P10-0705 © SEMI 1990, 2005 123
8.1.206 END_CD_GROUP_MEASUREMENTS — (text) must match data field of
START_CD_GROUP_MEASUREMENTS.
8.1.207 END_CD_ISO_DENSE — (text) must match data field of START_CD_ISO_DENSE.
8.1.208 END_CD_ISO_DENSE_RESULTS — (text) must match data field of
START_CD_ISO_DENSE_RESULTS
8.1.209 END_CD_MEASUREMENT — Alphanumeric data field must match data field of
START_CD_MEASUREMENT.
8.1.210 END_CD_SET— Alphanumeric data field must match data field of START_CD_SET.
8.1.211 END_CD_SET_RESULTS — Alphanumeric data field must match data field of
START_CD_SET_RESULTS.
8.1.212 END_CD_XY_DEFINITION — Alphanumeric data field must match data field of
START_CD_XY_DEFINITION.
8.1.213 END_CD_XY_RESULTS — Alphanumeric data field must match data field of
START_CD_XY_RESULTS.
8.1.214 END_CELL — Must match data field of CELL_ID for which data is complete.
8.1.215 END_CELL_INSTANCE — (text) must match data field of CELL_INSTANCE.
8.1.216 END_CELL_INSTANCE_OPTIONS — Must match data field of CELL_INSTANCE for which pattern
options are complete.
8.1.217 END_CELL_OPTIONS — Must match data field of CELL_ID for which options are complete.
8.1.218 END_CLOSURE_MEASUREMENTS — Must match START_CLOSURE_MEASUREMENTS data
field.
8.1.219 END_COATING — (text) Indicates the end of the <coating> section. Must match START_COATING
data field.
8.1.220 END_DATA_FRACTURE — Must match START_DATA_FRACTURE data field.
8.1.221 END_DATA_FUNCTION — Must match START_DATA_FRACTURE data field.
8.1.222 END_DATA_MANIPULATION — (text) must match data field of START_DATA_MANIPULATION.
8.1.223 END_DATA_MEDIUM — Must match data field of DATA_MEDIUM for which data is complete.
8.1.224 END_DATA_PATTERN_NAME — Must match data field of DATA_PATTERN_NAME.
8.1.225 END_DATA_SOURCE_FILE — Must match DATA_SOURCE_FILE data field.
8.1.226 END_DEFECT_DEFINITION — (text) must match data field of START_DEFECT_DEFINITION
8.1.227 END_DEFECT_MEASUREMENTS — (text) must match data field of
START_DEFECT_MEASUREMENTS.
8.1.228 END_ETCH_DEPTH_MEASUREMENTS — Must match START_ETCH_DEPTH_MEASUREMENTS
data field.
8.1.229 END_FTP_HOST — Must match data field of FTP_HOST_NAME.
8.1.230 END_LITHO_INFORMATION — Alphanumeric data field must match data field of
START_LITHO_INFORMATION.
8.1.231 END_MASK — Must match data field of MASK_ID for which data is complete.
8.1.232 END_MASK_GROUP — Must match data field of MASK_GROUP_ID for which data is complete.
8.1.233 END_MASK_GROUP_OPTIONS — Must match data field of MASK_GROUP_ID for which options are
complete.
SEMI P10-0705 © SEMI 1990, 2005 124
8.1.234 END_MASK_RESULTS — Must match START_MASK_RESULTS data field.
8.1.235 END_MASK_RESULTS_OPTIONS — Alphanumeric data field must match data field of
START_MASK_RESULTS_OPTIONS
8.1.236 END_MASK_SET — Must match data field of MASK_SET_ID for which data is complete.
8.1.237 END_MASK_SET_OPTIONS — Must match data field of MASK_SET_ID for which options are
complete.
8.1.238 END_MATERIALS_USED — Alphanumeric data field must match data field of
START_MATERIALS_USED.
8.1.239 END_MEASURED_ETCH_DEPTH_SITE — Must match data field of
MEASURED_ETCH_DEPTH_MARK_SITE_ID.
8.1.240 END_MEASURED_PHASE_ANGLE_SITE — Must match data field of
MEASURED_PHASE_ANGLE_MARK_SITE_ID.
8.1.241 END_MEASURED_REGISTR_MARK — Must match data field of
MEASURED_REGISTR_MARK_ID.
8.1.242 END_MEASURED_TRANSMISSION_SITE — Must match data field of
MEASURED_TRANSMISSION_MARK_SITE_ID.
8.1.243 END_OPC — Must match data field of START_OPC.
8.1.244 END_ORDER — Must match data field of START_ORDER for which data is complete.
8.1.245 END_PATTERN_DEFINITION — Must match data field of LEVEL_ID for which data is complete.
8.1.246 END_PATTERN_GROUP — Must match data field of PATTERN_GROUP_ID for which data is
complete.
8.1.247 END_PATTERN_GROUP_INSTANCE — Must match data field of PATTERN_GROUP_INSTANCE.
8.1.248 END_PATTERN_GROUP_OPTIONS — Must match data field of PATTERN_GROUP_ID for which
options are complete.
8.1.249 END_PATTERN_GROUP_RESULTS — Alphanumeric data field must match data field of
START_PATTERN_GROUP_RESULTS.
8.1.250 END_PATTERN_OPTIONS — Must match data field of START_PATTERN_OPTIONS.
8.1.251 END_PHASE_ANGLE_MEASUREMENTS — Must match data field of
START_PHASE_ANGLE_MEASUREMENTS.
8.1.252 END_PHASE_SHIFT — Must match START_PHASE_SHIFT data field.
8.1.253 END_PHASE_SHIFT_MEASUREMENTS — Must match data field of
START_PHASE_SHIFT_MEASUREMENTS.
8.1.254 END_PLACEMENT — Must match data field of START_PLACEMENT.
8.1.255 END_REGISTR — Must match data field of START_REGISTR.
8.1.256 END_REGISTR_MEASUREMENTS — Must match data field of
START_REGISTR_MEASUREMENTS.
8.1.257 END_REPAIR_DEFINITION — Must match data field of START_REPAIR_DEFINITION.
8.1.258 END_SEM_PHOTO — Must match START_SEM_PHOTO data field.
8.1.259 END_SHIP_FILM — Must match data field of SHIP_FILM.
8.1.260 END_SHIP_PLOT — Must match data field of START_SHIP_PLOT.
8.1.261 END_SHIP_TO — Must match data field of START_SHIP_TO.