semi合集-English.pdf - 第5044页
SEMI M18-0704 © SEMI 1990, 2004 30 Line Item EDI Code ID Sub Param ID 8.13 Orange Peel 100099 8.14 Saw Marks 100100 8.15 Dopant Striation Rings 100101 8.16 Stains 100102 9.01 Back Surface Visual Inspection Specifi ed Acc…
SEMI M18-0704 © SEMI 1990, 2004 29
Line Item EDI Code ID Sub Param ID
7.1 Surface Metal Contamination -- Potassium 100053
7.1 Surface Metal Contamination -- Chromium 100054
7.1 Surface Metal Contamination -- Iron 100055
7.1 Surface Metal Contamination -- Nickel 100056
7.1 Surface Metal Contamination -- Copper 100057
7.1 Surface Metal Contamination -- Zinc 100058
7.1 Surface Metal Contamination -- (Producer-User Defined Metal) 100059
7.1 Surface Metal Contamination -- (Producer-User Defined Metal) 100060
7.1 Surface Metal Contamination -- (Producer-User Defined Metal) 100061
7.1 Surface Metal Contamination -- (Producer-User Defined Metal) 100062
7.1 Surface Metal Contamination -- (Producer-User Defined Metal) 100063
7.1 Surface Metal Contamination -- (Producer-User Defined Metal) 100064
7.2 Surface Organics 100065
8.01 Front Surface Visual Inspection Specified According to SEMI M1 Table 1 100066
8.1 Scratches 100067
8.2 Pits 100068
8.3 Haze 100069
8.4 Localized Light Scatterers (LLS) 100070 ≥ 0.50µ
8.4 Localized Light Scatterers (LLS) 100071 ≥ 0.30µ
8.4 Localized Light Scatterers (LLS) 100072 ≥ 0.20µ
8.4 Localized Light Scatterers (LLS) 100073 ≥ 0.19µ
8.4 Localized Light Scatterers (LLS) 100074 ≥ 0.18µ
8.4 Localized Light Scatterers (LLS) 100075 ≥ 0.17µ
8.4 Localized Light Scatterers (LLS) 100076 ≥ 0.16µ
8.4 Localized Light Scatterers (LLS) 100077 ≥ 0.15µ
8.4 Localized Light Scatterers (LLS) 100078 ≥ 0.14µ
8.4 Localized Light Scatterers (LLS) 100079 ≥ 0.13µ
8.4 Localized Light Scatterers (LLS) 100080 ≥ 0.12µ
8.4 Localized Light Scatterers (LLS) 100081 ≥ 0.11µ
8.4 Localized Light Scatterers (LLS) 100082 ≥ 0.10µ
8.4 Localized Light Scatterers (LLS) 100083 ≥ 0.09µ
8.4 Localized Light Scatterers (LLS) 100084 ≥ 0.08µ
8.4 Localized Light Scatterers (LLS) 100085 ≥ 0.07µ
8.4 Localized Light Scatterers (LLS) 100086 ≥ 0.06µ
8.4 Localized Light Scatterers (LLS) 100087 ≥ 0.05µ
8.4 Localized Light Scatterers (LLS) 100088 ≥ 0.04µ
8.4 Localized Light Scatterers (LLS) 100089 ≥ 0.03µ
8.4 Localized Light Scatterers (LLS) 100090 ≥ 0.02µ
8.5 Contamination/Area 100091
8.6 Edge Chips 100092
8.7 Edge Cracks 100093
8.8 Cracks, Crow's Feet 100094
8.9 Craters 100095
8.10 Dimples 100096
8.11 Grooves 100097
8.12 Mounds 100098
SEMI M18-0704 © SEMI 1990, 2004 30
Line Item EDI Code ID Sub Param ID
8.13 Orange Peel 100099
8.14 Saw Marks 100100
8.15 Dopant Striation Rings 100101
8.16 Stains 100102
9.01 Back Surface Visual Inspection Specified According to SEMI M1 Table 1 100103
9.1 Edge Chips 100104
9.2 Cracks, Crow’s Feet 100105
9.3 Contamination/Area 100106
9.4 Saw Marks 100107
9.5 Stains 100108
9.6 Roughness 100109
9.7 Brightness 100110
11.1 Conductivity Type/Structure 100111
11.2 Dopant 100112
11.3 Silicon Source Gas 100113
11.4 Growth Method 100114
11.5 Net Carrier Density (Resistivity) 100115
11.6 Net Carrier Density Variation 100116
11.7 Thickness 100117
11.8 Thickness Variation 100118
11.9 Transition Width 100119
11.10 Flat Zone 100120
11.11 Phantom Layer 100121
12.1 Bow 100122
12.2 Warp Method 100123 SEMI MF657
12.2 Warp Method 100124 SEMI MF1390
12.3 Sori 100125
12.4 Flatness/Global 100126
12.5 Flatness/Site 100127 SF3R
12.5 Flatness/Site 100128 SF3D
12.5 Flatness/Site 100129 SFLR
12.5 Flatness/Site 100130 SFLD
12.5 Flatness/Site 100131 SFQR
12.5 Flatness/Site 100132 SFQD
12.5 Flatness/Site 100134 SBIR
13.01 Epi Front Surface Visual Inspection
Specified According to SEMI M2 Table 1 or SEMI M11 Table 1
100135
13.1 Stacking Faults 100136
13.2 Slip 100137
13.3 Large Point Defects 100138
13.4 Total Points Defects 100139
13.5 Scratches 100140
13.6 Dimples 100141
13.7 Orange Peel 100142
13.8 Cracks/Fractures 100143
13.9 Crow’s Feet 100144
SEMI M18-0704 © SEMI 1990, 2004 31
Line Item EDI Code ID Sub Param ID
13.10 Edge Chips 100145
13.11 Edge Crown 100146
13.12 Haze 100147
13.13 Foreign Matter 100148
14.1 Contamination 100149
16.1 Mask ID 100150
16.2 Alignment Precision 100151
16.3 Pattern Line Width Tolerance 100152
17.1 Dopant 100153
17.2 Diffusion Depth (xj) 100154
17.3 Sheet Resistance 100155
17.4 Pattern Step Height 100156
17.5 Defect Density (Before Epi) 100157
18.1 Pattern Shift Ratio 100158
18.2 Pattern Distortion Ratio 100159
6.14 Flatness/Site 100160 SFSR
12.5 Flatness/Site 100161 SFSR
4.9
Interstitial Oxygen Reduction (∆Oi)
100162
6.15 Fixed Quality Area 100164
10.1 Bulk defects by X-ray topography 100169
12.6 Fixed Quality Area 100172
9.8 Scratches – macro 100165
9.9 Scratches – micro 100166
9.10 Localized Light Scatterers (LLS)
4
100167
9.10 Localized Light Scatterers (LLS)
4
100168
11.01 [ ] Specified According to SEMI M11 Table [ ] 100170
12.01 [ ] Specified According to SEMI M11 Table [ ] 100171
13.14 Localized Light Scatterers (LLS)
4
100173 ≥ 0.50µ
13.14 Localized Light Scatterers (LLS)
4
100174 ≥ 0.30µ
13.14 Localized Light Scatterers (LLS)
4
100175 ≥ 0.20µ
13.14 Localized Light Scatterers (LLS)
4
100176 ≥ 0.19µ
13.14 Localized Light Scatterers (LLS)
4
100177 ≥ 0.18µ
13.14 Localized Light Scatterers (LLS)
4
100178 ≥ 0.17µ
13.14 Localized Light Scatterers (LLS)
4
100179 ≥ 0.16µ
13.14 Localized Light Scatterers (LLS)
4
100180 ≥ 0.15µ
13.14 Localized Light Scatterers (LLS)
4
100181 ≥ 0.14µ
13.14 Localized Light Scatterers (LLS)
4
100182 ≥ 0.13µ
13.14 Localized Light Scatterers (LLS)
4
100183 ≥ 0.12µ
13.14 Localized Light Scatterers (LLS)
4
100184 ≥ 0.11µ
13.14 Localized Light Scatterers (LLS)
4
100185 ≥ 0.10µ
13.14 Localized Light Scatterers (LLS)
4
100186 ≥ 0.09µ
13.14 Localized Light Scatterers (LLS)
4
100187 ≥ 0.08µ
13.14 Localized Light Scatterers (LLS)
4
100188 ≥ 0.07µ
13.14 Localized Light Scatterers (LLS)
4
100189 ≥ 0.06µ
13.14 Localized Light Scatterers (LLS)
4
100190 ≥ 0.05µ
13.14 Localized Light Scatterers (LLS)
4
100191 ≥ 0.04µ