semi合集-English.pdf - 第1499页
SEMI E30.5-0302 © SEMI 2001, 2002 27 14 SEMI E30 Capabil ities 14.1 T he purpose of this section is to specify any SEMI E30 Capabilities req uired by MSEM class equipment. 14.2 Requirement The f o llowing SEMI E3 0 add…
SEMI E30.5-0302 © SEMI 2001, 2002 26
13.4 PP-UPDATE Remote Command Scenario
Host issues the PP-UPDATE remote command.
COMMENTS HOST EQUIPMENT COMMENTS
START S2,F41-->
<--S2,F42 Positive Acknowledge.
<--S6,F11 READY -> LOAD
Positive Acknowledge. S6,F12-->
[WHILE] Not End of Run
1) LOAD->WORKING
2) WORKING->UNLOAD
3) UNLOAD->LOAD
[ENDWHILE]
Sometime during the
[WHILE]:
PAUSE S2,F41-->
<--S2,F42 Positive Acknowledge.
<--S6,F11 Transition to PAUSING
Positive Acknowledge. S6,F12-->
<--S6,F11 PAUSING -> PAUSED
Positive Acknowledge. S6,F12-->
PP-UPDATE S2,F41-->
<--S2,F42 Positive Acknowledge.
<--S6,F11 PAUSED->CHECKING
Positive Acknowledge. S6,F12-->
<--S6,F11 CEID is posted.
[IF] the updates are valid:
Return to the previous process state thru history
[ELSE]
Return to the PAUSED state. The Process Program
remains unchanged.
[ENDIF]
Positive Acknowledge. S6,F12-->
13.5 PP-ASSIGN / PP-UNASSIGN Scenario
Host issues the PP-ASSIGN/PP-UNASSIGN remote commands.
COMMENTS HOST EQUIPMENT COMMENTS
PP-ASSIGN S2,F41-->
<--S2,F42 Positive Acknowledge.
PP-UNASSIGN S2,F41-->
<--S2,F42 Positive Acknowledge.
This may occur during the
STOPPING state.
13.6 The host may setup the material for additional processing without the cassette being removed and replaced on
the equipment.
SEMI E30.5-0302 © SEMI 2001, 200227
14 SEMI E30 Capabilities
14.1 The purpose of this section is to specify any SEMI
E30 Capabilities required by MSEM class equipment.
14.2 Requirement
The following SEMI E30
additional capabilities required by MSEM are:
• Dynamic Event Report Configuration
• Variable Data Collection
• Status Data Collection
• Alarm Management
• Remote Control
• Equipment Constants
• Process Program Management
• Spooling
• Trace Data Collection (optional)
• Control (Host Initiated)
15 Related Documents
Harel, D., “Statecharts: A Visual Formalism for
Complex Systems,” Science of Computer Programming
8 (1987) 231-274.
NOTICE:. SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer’s instructions, product labels,
product data sheets, and other relevant literature
respecting any materials mentioned herein. These
standards are subject to change without notice.
The user’s attention is called to the possibility that
compliance with this standard may require use of
copyrighted material or of an invention covered by
patent rights. By publication of this standard, SEMI
takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any
item mentioned in this standard. Users of this standard
are expressly advised that determination of any such
patent rights or copyrights, and the risk of infringement
of such rights, are entirely their own responsibility.
SEMI E30.5-0302 © SEMI 2001, 2002 28
RELATED INFORMATION 1
SEM UNIQUE CAPABILITIES
NOTE: This related information is not an official part of SEMI E30.5 and was derived from work developed in the Metrology
Specific Equipment Model Task Force in North America. This related information was approved for publication by full letter
ballot on April 30, 2001.
R1-1. Measurement Site Location
Metrology
equipment most often is used to make measurements
and report results at specific sites on a substrate.
Unfortunately, equipment suppliers and users have
adopted different formats for describing measurement
site location information. This has led to three
problems which increase the cost of metrology. First,
metrology equipment suppliers must provide formats
which meet conflicting requirements of their customers,
adding to equipment development costs. Second, users
must transpose information from different systems to
their own format in order to use metrology data. Third,
site location information is often an integral part of
recipe set up, often requiring that an actual product
sample be available for “training” the site location
information on the equipment. For users who
manufacture many different products on common
substrates, multiple metrology “recipes” must be
developed where the only differences are site location
information. This information is known to the user
from product design data, and should not need to be
"learned" uniquely on various metrology equipment.
R1-1.1 In order to avoid these problems, MSEM
defines specific formats for identifying and reporting
site location information on substrates. The
MSEM-required formats are intended to minimize the
number and type of site location format transformations
needing to be supported by both metrology equipment
suppliers and users. All MSEM-required site location
formats involve the use of an MSEM-defined
right-handed Cartesian coordinate system, established
on substrates in an MSEM-defined manner. This
release of MSEM defines these only for silicon wafer
substrates, based on SEMI standard M20. Additional
substrate types may be included in future revisions of
MSEM, if required.
R1-1.2 MSEM requires that equipment have the
capability to use site location information that is based
on the user's product designs, which the user must
provide in the appropriate MSEM-required format. In
other words, equipment shall not require that a sample
substrate be used to “train” site locations when users
can provide this information from product design data.
R1-1.3 MSEM-compliant equipment shall have the
capability to define, locate, measure, and report site
information using only the MSEM-defined
right-handed Cartesian coordinate system formats. This
requirement does not preclude equipment from having
additional capability for defining or reporting site
location information using other formats. One such
additional format is defined in MSEM for patterned
silicon wafer substrates, based on SEMI standard SEMI
M21. MSEM-compliant equipment is not required to
have this “M21” format capability, but must use the
MSEM “M21” format if it is provided.
R1-1.4 Specific MSEM information that defines site
location information includes ; the data items AlignList
and SiteList; the CPNAMEs CP-ALIGNLIST and
CP-SITELIST and the TABLE type named ALIGN-
DEF-LIST and SITE-DEF-LIST. Notice that multiple
sites can first be Defined using the appropriate Process
Program class named ALIGN-DEF-LIST or SITE-
DEF-LIST, then selected by using the ALIGN-NAME
or SITENAME in an MSEM defined remote command
that use CP-ALIGNLIST AND CP-SITELIST. This
information is similarly defined for the “M21”
coordinate system plus an additional CPNAME of
ELEMENTLIST which lists the ElementIDs to be
measured on the silicon wafers.
R1-2 Coordinate Systems For A Silicon Wafer
R1-2.1 Requirements
MSEM defines two
right-handed Cartesian coordinate systems for use on
silicon wafers. These are identified as the “M20” and
“M20P” coordinate systems. Both are based on SEMI
standard M20. The SEMI M20 standard describes how
to map a right-handed Cartesian coordinate system to a
wafer so that its origin is at the center of the wafer, and
its negative y-axis bisects the wafer's primary fiducial.
This coordinate system is defined by MSEM to be the
“M20” coordinate system. MSEM defines the "M20P"
coordinate systems to be one which is aligned to the
pattern on the wafer. Ideally, there is no difference
between the “M20P” and “M20” coordinate system. In
the real world, there is a difference, due to experimental
errors. This is explained further in the following
sections.
R1-2.2 Implementation
The only information
required by equipment in order to establish an “M20”
coordinate system is the wafer size and type of fiducial.
This is provided by way of the MSEM data items
named WaferSize and Fiducial. Another data item
named Orientation provides for control over how the
wafer is loaded on equipment. Note that the SEMI