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SEMI P10-0705 © SEMI 1990, 2005 2 SEMI P21 — Guidelines for Precision and Accu racy Expression for Mask Writing Equipment SEMI P22 — Guideline fo r Photomask Defect Classification And Size Definition SEMI P24 — CD Metrol…

SEMI P10-0705 © SEMI 1990, 2005 1

SEMI P10-0705

SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS

This specification was technically approved by the global Micropatterning Committee. This edition was

approved for publication by the global Audits and Reviews Subcommittee on April 20, 2005. It was

available at www.semi.org in June 2005 and on CD-ROM in July 2005. Originally published in 1990;

previously published July 2004.

1 Purpose

1.1 These data structure specifications are intended to facilitate the transmittal of mask order data between software

systems to allow:

 automated order placement by mask customers and to allow the automatic processing of such orders by mask

shops, and

 automated delivery of actual mask data by mask shops and to allow the automatic processing of such data by

mask customers.

1.2 By using these standardized structures, software written independently for either mask customers or mask shops

should be able to communicate unambiguously with software written by other parties.

2 Scope

2.1 This structure only defines the data format for the transmitted file. No particular database or programming

language is specified by this standard, except that implementation of the Mask Results Data Structure Syntax is also

shown in Extensible Markup Language (XML) Format for those that choose to use it. The data file is to be

transmitted as an ASCII file. As such, it is compatible with the SECS-II standard.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the

responsibility of the users of this standard to establish appropriate safety and health practices and determine the

applicability of regulatory or other limitations prior to use.

3 Limitations

3.1 For a given customer, all pattern file names must be unique. (i.e., Pattern files which are different may not have

the same name.)

3.2 For a given customer, all job file names must be unique. (i.e., Job files which are different may not have the

same name.)

3.3 For a given customer, each mask set must have a unique identification.

3.4 For a given customer, each magnetic tape or other physical media delivered to the mask shop must have a

unique identification.

3.5 All <pattern_data>, <job_data>, FRACTURE_FILE, MEASURE_FILE_NAME and

CD_MATRIX_FILE_NAME files should be introduced through a <data> structure to be used within the

<mask_order>. If such files are referenced in a <mask_order> without identification through <data>, specific

methods to identify and locate such files must be established between the customer and the vendor.

4 Referenced Standards and Documents

4.1 SEMI Standards

SEMI P1 — Specification for Hard Surface Photomask Substrates

SEMI P2 — Specification for Chrome Thin Films for Hard Surface Photomasks

SEMI P4 — Specification for Round Quartz Photomask Substrates

SEMI P5 — Specification for Pellicles

SEMI P6 — Specification for Registration Marks for Photomasks

SEMI P10-0705 © SEMI 1990, 2005 2

SEMI P21 — Guidelines for Precision and Accuracy Expression for Mask Writing Equipment

SEMI P22 — Guideline for Photomask Defect Classification And Size Definition

SEMI P24 — CD Metrology Procedures

SEMI P29 — Guideline for Description of Characteristics Specific to Halftone/Attenuated Phase Shift Masks and

Mask Blanks

SEMI P35 — Terminology for Microlithography Metrology

SEMI P37 — Specification for Extreme Ultraviolet Lithography Mask Substrates

SEMI P38 — Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask

Blanks

SEMI P39 — Specification for Open Artwork System Interchange Standard (OASIS)

SEMI P43 — Photomask Qualification Terminology

4.2 ISO Standards

ISO 4217:2001 — Currency and funds code list

ISO 8601:2000 — Date and time notation

NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.

5 Terminology

5.1 See §8.

6 Instructions and Conventions

6.1 Each record in the file will be composed of a specific keyword identifier followed by one or more data values,

and will be terminated by a carriage return and/or linefeed.

6.2 Only records which are required to specify the order need to be included in the transmitted <mask_order> file,

but each record included must appear in the sequence shown in the syntax specification.

6.3 Subsequent modifications or additions to the mask set require transmittal of all the information for the specific

masks involved, including previously transmitted keywords and data fields if they still apply. Masks previously

ordered which are not affected by the new order transmission may have their <mask_definition>, <mask_group> or

<mask_set> omitted as appropriate.

6.4 Options are specified hierarchically such that those specified at a higher level are the default for all masks

below, unless overridden at a lower level. The hierarchy is such that mask set options are overridden by mask group

options, followed by mask definition, cell definition, cell instance, pattern group definition, and pattern definition.

6.5 Mask groups describe sets of masks which are similarly constructed. In simple cases there will be only one

mask group per mask set. Multiple mask groups will be needed to describe mix-and-match sets, or for situations

within a mask set where different features are required on some masks.

6.6 Pattern group definitions are intended for patterns which are similarly placed on all or most masks within a

mask group (e.g., primary pattern files or test pattern files).

6.7 Cell definitions describe the construction of clusters of pattern groups and/or other cells. The

PLACEMENT_TOP_CELL under a mask group describes the overall layout of the cells on all masks within the

mask group.

1 International Organization for Standardization, ISO Central Secretariat, 1, rue de Varembé, Case postale 56, CH-1211 Geneva 20, Switzerland.

Telephone: 41.22.749.01.11; Fax: 41.22.733.34.30, Website: www.iso.ch

2 http://www.bsi-global.com/Technical+Information/Publications/_Publications/tig90.xalter

3 http://www.cl.cam.ac.uk/~mgk25/iso-time.html

SEMI P10-0705 © SEMI 1990, 2005 3

6.8 Within a given mask set, each mask must have a unique identification (MASK_ID), independent of any titles on

the mask.

6.9 Masks which require multiple writing operations (such as phase shift masks) will find those MASK_ID’s

identified with the same group number by the MULTIWRITE keyword.

6.10 The MASK_ID’s defined under a mask group specify the masks to be built. The MASK_ID’s also identify

which patterns are to appear on the mask. A pattern is placed on the mask if and only if the MASK_ID matches the

LEVEL_ID of a pattern referenced under the mask group’s PLACEMENT_TOP_CELL.

6.11 <cell instance> and <pattern group instance> LOCATION’s position the center of the patterns relative to the

center of the CELL_ID referencing them. The cell referenced by the PLACEMENT_TOP_CELL is positioned at the

center of the mask.

6.12 Job file data may be supplied in place of cell and pattern group data. In this case, the MASK_ID is understood

to correspond to JOB_LEVEL in JOB_NAME.

6.13 For coordinate locations, unless otherwise specified for a given keyword, mask options are relative to the

nominal center of the mask, while cell or pattern options are relative to the center of the cell or pattern. Mask

coordinates are after scaling and mirroring, whereas cell and pattern options are before scaling and mirroring. The

coordinates and directions refer to right-handed, rectangular (Cartesian) coordinates, applied to the substrate being

written. All of these features and the orientation of all other patterns written on the substrate assume that it is from

the perspective of the mask writing tool (i.e., “chrome side up”). The nominal center of the mask is determined using

the bottom and left edges (chrome side up) and assumes nominal substrate dimensions. (See SEMI P1.)

6.14 All data in the structure will be in ASCII. The keyword in each record must include only upper case alphabetic

characters and underscore.

6.15 Records (keyword, data value, comment and new line) may not exceed 256 characters. Some records may be

repeated (e.g., BUSINESS_ADDRESS) in order to allow for longer field requirements; these are explicitly indicated

in the syntax specification.

6.16 Comments may be included in records by preceding them with an exclamation point (!). Any data following an

exclamation point and preceding a carriage return and/or linefeed will be ignored. Such comments are included in

the 256 character record limit. If a record starts with an exclamation point, the entire record will be ignored. Only

printable ASCII characters (plus spaces and tabs) are permitted in comments. Comments are for development and

diagnostic purposes only. In commercial use, comments may always be ignored by the recipient without

consequence. On the other hand, ADDITIONAL_..._INFO records must be evaluated by the recipient and applied to

the masks being ordered, and may justify delay in mask delivery.

6.17 Spaces or tabs preceding the keyword will be ignored. At least one space or tab must precede the data field.

Spaces and tabs imbedded in alphanumeric data fields will be preserved. Spaces or tabs may not be imbedded within

numeric data values, but may be used to separate data values in multi-value data fields. At least one comma must

appear between adjacent data values in multi-value data fields; more than one comma may not appear between

adjacent data values. Spaces or tabs trailing the last data value in a data field will be ignored.

6.18 All numeric record values which require units will be in metric unless otherwise specified in §8. Units of

length or position will be in microns unless otherwise specified.

6.19 Dates will be in the numeric format YYYY-MM-DD. Times will be in the format HH:MM:SSZ or HH:MMZ.

Within the transmitted file, times and dates will always be Coordinated Universal Time (UTC) and times will be

followed by the suffix Z.

6.20 Sizing to achieve a CD_TARGET from a CD_DATA must be applied to all pattern files hierarchically

affected by the CD_TARGET record.

6.21 Binary data manipulation operations expect operands (input pattern files) to align center-to-center. This

requires that DATA_PATTERN_WINDOW be defined for patterns which do not contain an explicit record of file

extents.

6.22 All references to horizontal (or “x”) and vertical (or “y”) correspond to normal Cartesian coordinates and

assume the rotational orientation of the substrate when the mask was written.