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SEMI IN TERNA TIONA L STANDA RDS PROCESS CHEMICA LS Sem iconduct or Equipm ent and Materials Inte rnational
SEMI G86-0303 © SEMI 2003 5
RELATED INFORMATION 1
ADDITIONAL INFORMATION FOR TESTING
NOTICE: This related information is not an official part of SEMI G86 and was derived from the work of the
originating task force. This related information was approved for publication by full letter ballot procedures on
January 10, 2003. It is provided for information purposes.
R1-1 Test Machine
R1-1.1 When the measurement of deflection is based
on the movement of loading edge, the frame
compliance of the test machine should be more than
40 kN/mm.
R1-1.2 The interval of data sampling, such as test force
and movement of the loading edge, should be more than
500 times per second when the test machine records the
data in digital format.
R1-2 Test Specimens
R1-2.1 The number of test specimen is 0.25 of
Acceptance Quality Level, specified in ISO/DIS2859-
1.2，Sampling procedures for inspection by attributes
— Part 1: Sampling schemes indexed by acceptable
quality level (AQL) for lot-by-lot inspection.
R1-2.2 Test specimens should be pulled from a wafer
in every direction without leaning.
R1-2.3 When test results are compared, same test
specimens size (span L and width b) should be used.
R1-2.4 When excessive film is attached to test
specimens, equation (1) in Section 9.1 for stress on a
silicon material may not be applied.
R1-3 Recording the Force
R1-3.1 Not only the force at the break points but also
test force of the specimen under the test should be
recorded. It is recommended that an automatic
recording system is used .
R1-4 Test Report
R1-4.1 Test report should include the failure
characteristics of the failed specimens.
R1-4.2 When possible, the test report should include
failures which occur at any notable defect on the die.
NOTICE: SEMI makes no warranties or
representations as to the suitability of the standards set
forth herein for any particular application. The
determination of the suitability of the standard is solely
the responsibility of the user. Users are cautioned to
refer to manufacturer's instructions, product labels,
product data sheets, and other relevant literature,
respecting any materials or equipment mentioned
herein. These standards are subject to change without
notice.
By publication of this standard, Semiconductor
Equipment and Materials International (SEMI) takes no
position respecting the validity of any patent rights or
copyrights asserted in connection with any items
mentioned in this standard. Users of this standard are
expressly advised that determination of any such patent
rights or copyrights, and the risk of infringement of
such rights are entirely their own responsibility.
Copyright by SEMI® (Semiconductor Equipment and Materials
International), 3081 Zanker Road, San Jose, CA 95134. Reproduction o
f
the contents in whole or in part is forbidden without express written
consent of SEMI.
SEMI INTERNATIONAL STANDARDS
PROCESS CHEMICALS
Semiconductor Equipment and Materials International
SEMI C1-0705 © SEMI 1978, 2005 1
SEMI C1-0705
GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS
This guide was technically approved by the global Liquid Chemicals Committee. This edition was approved
for publication by the global Audits and Reviews Subcommittee on April 7, 2005. It was available at
www.semi.org in June 2005 and on CD-ROM in July 2005. Originally published in 1978; previously
published July 2004.
1 Purpose
1.1 Liquid Chemicals are used extensively during the production of semiconductor devices; their purity has been
shown to affect the device yield during the manufacturing processes.
1.2 Since there is a wide range of semiconductor devices being produced, different levels of purity have been
established as standards and guidelines for each liquid chemical.
1.3 This guide describes the various analytical procedures for standards verification procedures required to meet a
specific liquid chemical specification.
2 Scope
2.1 All liquid chemical standards consist of guidelines, specifications and validated analytical procedures. Suitable
analytical procedures are defined in each standard for each grade of liquid chemical such that their sensitivity meets
the requirements of each of the respective grades of liquid chemicals.
2.2 This guide provides an overview of each of the methods used for liquid chemical certification. Each grade of
liquid chemicals (1–5) that have been validated analytically using the appropriate procedures described in this guide
can be described as “meeting SEMI specifications.”
2.3 Analytical Procedures — The procedures used to establish a liquid chemical specification can be found in §7.
The Analytical Procedures are listed in Table 1.
2.4 Safety — Because of the continuing evolution of safety precautions, it is impossible for this publication to
provide definite statements related to the safe handling of individual liquid chemicals. The user is referred to
product labels, product data sheets, government regulations, and other relevant literature.
NOTICE: This guide does not purport to address safety issues, if any, associated with its use. It is the
responsibility of the users of this guide to establish appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
Table 1 Analytical Procedures
7.1 Acidity and Alkalinity
7.2 Assay by Wide Bore Column Gas Chromatography
7.3 Color
7.4 Residue after Evaporation
7.5 Residue after Ignition
7.6 Trace Arsenic (and Antimony) Determination
7.7 Use of a pH Meter
7.8 Ion Chromatography
7.9 Atomic Absorption Spectrometry (AAS)
7.10 Flame Emission Spectrometry
7.11 Graphite Furnace Atomic Absorption Spectrometry (GFAAS)
7.12 Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES)
7.13 Inductively Coupled Plasma Mass Spectrometry (ICP-MS)
7.14 Calibration and Measurement Method for Particles in Liquids