semi合集-English.pdf - 第5617页

SEMI P10-0705 © SEMI 1990, 2005 112 < / x s : s e q u e n c e > < / x s : c o m p l e x Ty p e > - < x s : c o m p l e x Ty p e n a m e = " X y r T y p e " > - < x s : s e q u e n c e > …

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SEMI P10-0705 © SEMI 1990, 2005 111
< xs: elem ent nam e= "Sur fI nspModeUse d"
type
= " x s:st r ing" m inOccurs= " 0 " / >
< xs: elem ent nam e= "Su rfI nspPixelSizeUsed "
type
= " xs:dou ble" m inOccurs= " 0 " / >
- < xs: sequence m inOccurs= " 0 " m axOccurs= "unbounded">
< xs: elem ent nam e= "Sur fDe fectType"
type
= " xs:st r ing" / >
< xs: elem ent nam e= "Sur fI nspSe nsit ivit yUse d"
type
= " xs:st r ing" / >
- < xs: sequence m inOccurs= " 0 "
m axOccurs
= "u nbounde d">
< xs: elem ent nam e= "BinSize
" type= "x s:st ring"
/ >
< xs: elem ent nam e= "Sever it yCrit er ionUsed"
type
= " x s:st r ing" / >
< / xs: sequence>
< / xs: sequence>
< xs: elem ent nam e= "Sur fI nspSe t u pFile N a m e Used"
type
= " x s:st r ing" m inOccurs= " 0 " / >
< / xs: sequence>
< xs: elem ent nam e= "Mea su re dD efect Cou nt " type= "xs:int "
m inOccurs
= " 0 " / >
< xs: elem ent nam e= "Mea sure dDefe ct Count W it hinSpe c"
type
= " xs:in t " m inOccurs= "0 " / >
< xs: elem ent
nam e= "Me a sure dSu rfI nspFile N am e "
type
= " x s:st r ing" m inOccurs= " 0 " m axOccurs= "unbounded"
/ >
< xs: elem ent nam e= "PrePellI nspe ct ionI d" t ype= "x s:st ring"
m inOccurs
= " 0 " / >
< xs: elem ent nam e= "PrePellI nspe ct ionDa t e Tim e"
type
= " x s:dat eTim e" m inOccurs= " 0 " / >
< xs: elem ent nam e= "Post Pe llI nspect ionI d" type= "xs:st r ing"
m inOccurs
= " 0 " / >
< xs: elem ent nam e= "Post Pe llI nspect ion Dat eTim e "
type
= " x s:dat eTim e" m inOccurs= " 0 " / >
< xs: elem ent
nam e= " Ope rat or" type= " x s:st r in g"
m inOccurs
= " 0 " / >
< / xs: sequence>
< xs: at t ribut e nam e= "groupN am e " t ype= " x s:st ring"
use
= " requir e d" / >
< xs: at t ribut e nam e= "p1 0 St art " type= "x s:string" use= "requ ire d"
fixed
= "St a rt Sur faceI nspM e a sure m ent s" / >
< xs: at t ribut e nam e= "p1 0 End" t ype= "x s:st ring" use= " r equir e d"
fixed
= "En dSu rfa ce I nsp M ea surem e nt s" / >
< / xs: com plexType>
- < xs: com plexType nam e= "W in dow Type">
- < xs: sequence>
< xs: elem ent nam e= "X1 " t ype= "x s:double" / >
< xs: elem ent nam e= "Y1 " type= "xs:double" / >
< xs: elem ent nam e= "X2 " t ype= "x s:double" / >
< xs: elem ent nam e= "Y2 " type= "xs:double" / >
SEMI P10-0705 © SEMI 1990, 2005 112
< / xs: sequence>
< / xs: com plexType>
- < xs: com plexType nam e= "XyrType ">
- < xs: sequence>
< xs: elem ent nam e= "X" t ype= "x s:double" / >
< xs: elem ent nam e= "Y" t ype= "xs:dou ble " / >
< xs: elem ent nam e= "R" type= "xs:double " / >
< / xs: sequence>
< / xs: com plexType>
- < xs: com plexType nam e= "XYCoordType">
- < xs: sequence>
< xs: elem ent nam e= "X" t ype= " x s:double" / >
< xs: elem ent nam e= "Y" t ype= "xs:dou ble " / >
< / xs: sequence>
< / xs: com plexType>
- < xs: com plexType nam e= "D a t e N am eType">
- < xs: sequence>
< xs: elem ent nam e= "Da t e" type= "xs:da t eTim e " / >
< xs: elem ent nam e= "N a m e " t ype= "xs:st rin g" / >
< / xs: sequence>
< / xs: com plexType>
< / xs: schem a>
8 Terminology and Usage
8.1 Values in parentheses indicate the only acceptable alternative data values for the record and must be transmitted
exactly as shown. (x,y) indicates the acceptable data value must be an ordered pair of dimensions, coordinates,
repeat counts, filenames, or other parameters. (x,y,z) indicates an ordered triple. (x1,y1,z1) indicates a window with
two ordered pairs, (x1,y1) and (x2,y2), describing the lower left and upper right corners respectively. Records
without specified alternative values may have any appropriate data value.
8.1.1 ADDITIONAL_MASK_INFO — Any information necessary to specify the overall mask set which cannot be
specified elsewhere in the order structure; must be brought to the attention of mask vendor personnel.
8.1.2 ADDITIONAL_MASK_SET_INFO — Any information necessary to specify the overall mask set which
cannot be specified elsewhere in the order structure; must be brought to the attention of mask vendor personnel.
8.1.3 ADDITIONAL_MILESTONE_INFO — Text for the vendor to supply additional information regarding the
status of the mask.
8.1.4 ADDITIONAL_PATTERN_INFO — Any information necessary to specify the pattern(s) which cannot be
specified elsewhere in the order structure; must be brought to the attention of mask vendor personnel.
8.1.5 ADDITIONAL_RESULTS_INFO — Any information necessary to supply information to the customer which
cannot be specified elsewhere in the <mask_results> structure; must be brought to the attention of customer
personnel.
8.1.6 AIM_CD_DELTA — For aerial imaging metrology, the percentage CD width variation between comparable
non-defective features. Used for CD defect measurement across or between features. If this keyword appears as a
<mask_option>, then AIM_WAVELENGTH, WAFER_EXPOSURE_NUMERICAL_APERATURE,
WAFER_EXPOSURE_SIGMA APERATURE, and WAFER_EXPOSURE_ILLUMINATION must all also appear
under <mask_option>. Appearance of this keyword as a <mask_option> does not require aerial imaging metrology
for the mask, but merely sets the conditions under which it should be used if it its deemed necessary by the mask
maker, based on their negotiated agreements with the customer.
SEMI P10-0705 © SEMI 1990, 2005 113
8.1.7 AIM_FLUX_INTENSITY_DELTA — For aerial imaging metrology, the percentage dimensional area
variation between comparable non-defective areas. Used for contact and via defect measurement. If this keyword
appears as a <mask_option>, then AIM_WAVELENGTH, WAFER_EXPOSURE_NUMERICAL_APERATURE,
WAFER_EXPOSURE_SIGMA APERATURE, and WAFER_EXPOSURE_ILLUMINATION must all also appear
under <mask_option>. Appearance of this keyword as a <mask_option> does not require aerial imaging metrology
for the mask, but merely sets the conditions under which it should be used if it its deemed necessary by the mask
maker, based on their negotiated agreements with the customer.
8.1.8 AIM_INTENSITY_VARIATION_DELTA — For aerial imaging metrology, the percentage intensity
variation between comparable non-defective areas. Used for edge or isolated defect measurement. If this keyword
appears as a <mask_option>, then AIM_WAVELENGTH, WAFER_EXPOSURE_NUMERICAL_APERATURE,
WAFER_EXPOSURE_SIGMA APERATURE, and WAFER_EXPOSURE_ILLUMINATION must all also appear
under <mask_option>. Appearance of this keyword as a <mask_option> does not require aerial imaging metrology
for the mask, but merely sets the conditions under which it should be used if it its deemed necessary by the mask
maker, based on their negotiated agreements with the customer.
8.1.9 AIM_WAVELENGTH — Wavelength in nanometers to be used for <aerial_image_data> measurements This
keyword may appear in addition to PSM_WAVELENGTH for a single MASK_ID, though the values of the two
should usually be the same.
8.1.10 ALL_PATTERNS_APPROVAL_REQD — (T or F)
8.1.11 ALL_PATTERNS_APPROVED — (date) date approval was granted by customer
8.1.12 APPROVAL_REQD — If present, indicates that no mask(s) are to be written until the approval is explicitly
granted by the customer. The alphanumeric data field describes the items to be approved.
8.1.13 APPROVED — (T or F) date approval was granted by customer for APPROVAL_REQD.
8.1.14 ARRAY_CENTER — (x,y) Center of circular array limit, relative to the nominal center of the mask (chrome
side up).
8.1.15 ARRAY_DIAMETER — Diameter of circular array limit to be applied to pattern files.
8.1.16 ARRAY_DIAMETER_INCLUSIVE — (T or F) If T, then die which are at least partially included within
the circular array limit must be included in the array. If F, then only die which are wholly included within the
circular array limit may be included in the array.
8.1.17 ATTENUATOR — Attenuator Mask_Coating used for Embedded Attenuated Phase Shift Masks. (MoSi,
TinSin, ZrSi) or any other material agreed upon between customer/vendor. May be used in conjunction with other
Mask_Coatings.
8.1.18 AUTO_INSPECTION_REQD — (T or F) Automated inspection of the mask for defects is required.
8.1.19 BARCODE_LOCATION — (x,y) Location to place the center of the vendor-generated barcode, relative to
the nominal center of the mask (chrome side up).
8.1.20 BARCODE_ROTATION — (0, 90, 180, or 270) Degrees the barcode is to be rotated counterclockwise
(before mirroring).
8.1.21 BARCODE_TEXT — Text to be used by the vendor to build the barcode.
8.1.22 BARCODE_TYPE — (ASM, ASET, CANON, GCA, NIKON_STD or NIKON_CODE39, UT1X_10,
UT1X_24 and UT_XLS, and others on request) Encoding system to be used by the vendor to build the required
barcode.
8.1.23 BILLING_ADDRESS — Address for billing.
8.1.24 BILLING_CONTACT — Name of person to contact for billing purposes.
8.1.25 BILLING_EMAIL — Internet address for BILLING_CONTACT.
8.1.26 BILLING_FAX — Phone number for facsimile machine of BUSINESS_CONTACT.
8.1.27
BILLING_PHONE — Phone number for BILLING_CONTACT.